FR2857283B1 - Dispositif de nettoyage de plaquettes disposant d'un circuit d'isolation du moniteur de concentration. - Google Patents

Dispositif de nettoyage de plaquettes disposant d'un circuit d'isolation du moniteur de concentration.

Info

Publication number
FR2857283B1
FR2857283B1 FR0308392A FR0308392A FR2857283B1 FR 2857283 B1 FR2857283 B1 FR 2857283B1 FR 0308392 A FR0308392 A FR 0308392A FR 0308392 A FR0308392 A FR 0308392A FR 2857283 B1 FR2857283 B1 FR 2857283B1
Authority
FR
France
Prior art keywords
cleaning device
isolation circuit
concentration monitor
platelet
platelet cleaning
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
FR0308392A
Other languages
English (en)
Other versions
FR2857283A1 (fr
Inventor
Laurent Viravaux
Cecile Delattre
Baptiste Pariente
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Soitec SA
Original Assignee
Soitec SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Soitec SA filed Critical Soitec SA
Priority to FR0308392A priority Critical patent/FR2857283B1/fr
Priority to US10/663,545 priority patent/US20050005953A1/en
Publication of FR2857283A1 publication Critical patent/FR2857283A1/fr
Application granted granted Critical
Publication of FR2857283B1 publication Critical patent/FR2857283B1/fr
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67063—Apparatus for fluid treatment for etching
    • H01L21/67075—Apparatus for fluid treatment for etching for wet etching
    • H01L21/67086—Apparatus for fluid treatment for etching for wet etching with the semiconductor substrates being dipped in baths or vessels
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B08B3/08—Cleaning involving contact with liquid the liquid having chemical or dissolving effect
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H01L21/67057—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing with the semiconductor substrates being dipped in baths or vessels

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Physics & Mathematics (AREA)
  • Power Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
FR0308392A 2003-07-09 2003-07-09 Dispositif de nettoyage de plaquettes disposant d'un circuit d'isolation du moniteur de concentration. Expired - Fee Related FR2857283B1 (fr)

Priority Applications (2)

Application Number Priority Date Filing Date Title
FR0308392A FR2857283B1 (fr) 2003-07-09 2003-07-09 Dispositif de nettoyage de plaquettes disposant d'un circuit d'isolation du moniteur de concentration.
US10/663,545 US20050005953A1 (en) 2003-07-09 2003-09-15 Installation for treating semiconductor wafers

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR0308392A FR2857283B1 (fr) 2003-07-09 2003-07-09 Dispositif de nettoyage de plaquettes disposant d'un circuit d'isolation du moniteur de concentration.

Publications (2)

Publication Number Publication Date
FR2857283A1 FR2857283A1 (fr) 2005-01-14
FR2857283B1 true FR2857283B1 (fr) 2005-09-02

Family

ID=33522893

Family Applications (1)

Application Number Title Priority Date Filing Date
FR0308392A Expired - Fee Related FR2857283B1 (fr) 2003-07-09 2003-07-09 Dispositif de nettoyage de plaquettes disposant d'un circuit d'isolation du moniteur de concentration.

Country Status (2)

Country Link
US (1) US20050005953A1 (fr)
FR (1) FR2857283B1 (fr)

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11154662A (ja) * 1997-11-20 1999-06-08 Seiko Instruments Inc 半導体製造装置
FR2775675B1 (fr) * 1998-03-09 2000-06-09 Soitec Silicon On Insulator Support de plaquettes pour la micro-electronique et procede d'utilisation de ce support
US6318389B1 (en) * 1999-10-29 2001-11-20 Memc Electronic Materials, Inc. Apparatus for cleaning semiconductor wafers
EP1185888B1 (fr) * 2000-02-02 2012-03-14 Koninklijke Philips Electronics N.V. Capteur et procede de fonctionnement relatif
WO2001076779A1 (fr) * 2000-04-07 2001-10-18 L'air Liquide, Societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude Unite d'alimentation en liquide et procede de purge utilise dans l'unite d'alimentation en liquide
US6455395B1 (en) * 2000-06-30 2002-09-24 Integrated Materials, Inc. Method of fabricating silicon structures including fixtures for supporting wafers
JP3896788B2 (ja) * 2000-12-26 2007-03-22 栗田工業株式会社 超純水製造システムの洗浄殺菌方法
US20020129838A1 (en) * 2001-03-15 2002-09-19 Larry Myland Substrate aspiration assembly

Also Published As

Publication number Publication date
FR2857283A1 (fr) 2005-01-14
US20050005953A1 (en) 2005-01-13

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Legal Events

Date Code Title Description
ST Notification of lapse

Effective date: 20100331