FR2849277B1 - Procede de protection de la surface d'un plot de connexion d'une cellule de capteur d'image couleur a semi-conducteur lors d'un processus de colorisation - Google Patents
Procede de protection de la surface d'un plot de connexion d'une cellule de capteur d'image couleur a semi-conducteur lors d'un processus de colorisationInfo
- Publication number
- FR2849277B1 FR2849277B1 FR0216118A FR0216118A FR2849277B1 FR 2849277 B1 FR2849277 B1 FR 2849277B1 FR 0216118 A FR0216118 A FR 0216118A FR 0216118 A FR0216118 A FR 0216118A FR 2849277 B1 FR2849277 B1 FR 2849277B1
- Authority
- FR
- France
- Prior art keywords
- plot
- protecting
- image sensor
- color image
- sensor cell
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000000034 method Methods 0.000 title 2
- 238000004040 coloring Methods 0.000 title 1
- 239000004065 semiconductor Substances 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0216—Coatings
- H01L31/02161—Coatings for devices characterised by at least one potential jump barrier or surface barrier
- H01L31/02162—Coatings for devices characterised by at least one potential jump barrier or surface barrier for filtering or shielding light, e.g. multicolour filters for photodetectors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0232—Optical elements or arrangements associated with the device
- H01L31/02327—Optical elements or arrangements associated with the device the optical elements being integrated or being directly associated to the device, e.g. back reflectors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR0216118A FR2849277B1 (fr) | 2002-12-18 | 2002-12-18 | Procede de protection de la surface d'un plot de connexion d'une cellule de capteur d'image couleur a semi-conducteur lors d'un processus de colorisation |
US10/739,871 US6951772B2 (en) | 2002-12-18 | 2003-12-18 | Process for protection of the surface of a fixed contact for a semiconductor color image sensor cell during a coloring process |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR0216118A FR2849277B1 (fr) | 2002-12-18 | 2002-12-18 | Procede de protection de la surface d'un plot de connexion d'une cellule de capteur d'image couleur a semi-conducteur lors d'un processus de colorisation |
Publications (2)
Publication Number | Publication Date |
---|---|
FR2849277A1 FR2849277A1 (fr) | 2004-06-25 |
FR2849277B1 true FR2849277B1 (fr) | 2005-10-28 |
Family
ID=32406170
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR0216118A Expired - Fee Related FR2849277B1 (fr) | 2002-12-18 | 2002-12-18 | Procede de protection de la surface d'un plot de connexion d'une cellule de capteur d'image couleur a semi-conducteur lors d'un processus de colorisation |
Country Status (2)
Country | Link |
---|---|
US (1) | US6951772B2 (fr) |
FR (1) | FR2849277B1 (fr) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100672698B1 (ko) * | 2004-12-24 | 2007-01-24 | 동부일렉트로닉스 주식회사 | 씨모스 이미지 센서 및 그의 제조방법 |
KR100595329B1 (ko) * | 2005-02-17 | 2006-07-03 | 동부일렉트로닉스 주식회사 | 씨모스 이미지 센서의 제조방법 |
US7295374B2 (en) * | 2005-02-25 | 2007-11-13 | Taiwan Semiconductor Manufacturing Co. Ltd. | Micro-lens and micro-lens fabrication method |
US7285079B2 (en) * | 2005-03-16 | 2007-10-23 | Steven T. Mandell | Exercise device and methods |
US7326503B2 (en) * | 2005-08-22 | 2008-02-05 | Micron Technology, Inc. | Process for color filter array residual pigment removal |
KR100769126B1 (ko) * | 2005-12-29 | 2007-10-22 | 동부일렉트로닉스 주식회사 | Cmos 이미지 센서의 제조방법 |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100215878B1 (ko) * | 1996-12-28 | 1999-08-16 | 구본준 | 컬러 고체 촬상 소자의 제조 방법 |
US6396089B1 (en) * | 1999-04-15 | 2002-05-28 | United Microelectronics Corp. | Semiconductor image sensor |
-
2002
- 2002-12-18 FR FR0216118A patent/FR2849277B1/fr not_active Expired - Fee Related
-
2003
- 2003-12-18 US US10/739,871 patent/US6951772B2/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
US6951772B2 (en) | 2005-10-04 |
FR2849277A1 (fr) | 2004-06-25 |
US20040185598A1 (en) | 2004-09-23 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
TP | Transmission of property | ||
ST | Notification of lapse |
Effective date: 20070831 |