FR2847911B1 - Procede de renforcement du trou debouchant d'un corps creux par une technique de synthese du diamant, reacteur de mise en oeuvre et corps creux obtenu - Google Patents

Procede de renforcement du trou debouchant d'un corps creux par une technique de synthese du diamant, reacteur de mise en oeuvre et corps creux obtenu

Info

Publication number
FR2847911B1
FR2847911B1 FR0215106A FR0215106A FR2847911B1 FR 2847911 B1 FR2847911 B1 FR 2847911B1 FR 0215106 A FR0215106 A FR 0215106A FR 0215106 A FR0215106 A FR 0215106A FR 2847911 B1 FR2847911 B1 FR 2847911B1
Authority
FR
France
Prior art keywords
hollow body
detouching
reactor
reinforcing
implementation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
FR0215106A
Other languages
English (en)
Other versions
FR2847911A1 (fr
Inventor
Grosse Elizabeth Bauer
Ivan Dieguez
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Institut National Polytechnique de Lorraine
Original Assignee
Institut National Polytechnique de Lorraine
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Institut National Polytechnique de Lorraine filed Critical Institut National Polytechnique de Lorraine
Priority to FR0215106A priority Critical patent/FR2847911B1/fr
Publication of FR2847911A1 publication Critical patent/FR2847911A1/fr
Application granted granted Critical
Publication of FR2847911B1 publication Critical patent/FR2847911B1/fr
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/26—Deposition of carbon only
    • C23C16/27—Diamond only
    • C23C16/274—Diamond only using microwave discharges
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/04—Coating on selected surface areas, e.g. using masks
    • C23C16/045—Coating cavities or hollow spaces, e.g. interior of tubes; Infiltration of porous substrates

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Chemical Vapour Deposition (AREA)
FR0215106A 2002-12-02 2002-12-02 Procede de renforcement du trou debouchant d'un corps creux par une technique de synthese du diamant, reacteur de mise en oeuvre et corps creux obtenu Expired - Fee Related FR2847911B1 (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
FR0215106A FR2847911B1 (fr) 2002-12-02 2002-12-02 Procede de renforcement du trou debouchant d'un corps creux par une technique de synthese du diamant, reacteur de mise en oeuvre et corps creux obtenu

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR0215106A FR2847911B1 (fr) 2002-12-02 2002-12-02 Procede de renforcement du trou debouchant d'un corps creux par une technique de synthese du diamant, reacteur de mise en oeuvre et corps creux obtenu

Publications (2)

Publication Number Publication Date
FR2847911A1 FR2847911A1 (fr) 2004-06-04
FR2847911B1 true FR2847911B1 (fr) 2006-04-28

Family

ID=32309883

Family Applications (1)

Application Number Title Priority Date Filing Date
FR0215106A Expired - Fee Related FR2847911B1 (fr) 2002-12-02 2002-12-02 Procede de renforcement du trou debouchant d'un corps creux par une technique de synthese du diamant, reacteur de mise en oeuvre et corps creux obtenu

Country Status (1)

Country Link
FR (1) FR2847911B1 (fr)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CH710472B1 (fr) * 2014-12-15 2019-02-15 Neocoat Sa Equipement de dépôt de diamant en phase vapeur assisté par plasma pour le revêtement de la surface interne de pièces creuses.

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL8302127A (nl) * 1983-06-15 1985-01-02 Philips Nv Werkwijze en inrichting voor de vervaardiging van optische vezels.
JP2842720B2 (ja) * 1991-11-29 1999-01-06 京セラ株式会社 伸線用ダイスおよびその製造方法
DE19726443C2 (de) * 1997-06-23 2003-11-20 Fraunhofer Ges Forschung Verfahren zur Oberflächenvergütung innerer Oberflächen von Hohlkörpern und Vorrichtung zur Durchführung des Verfahrens
JP2000064053A (ja) * 1998-08-14 2000-02-29 Seiko Instruments Inc 水素化アモルファス薄膜形成方法、それに用いる装置、該薄膜を形成した気体動圧軸受、スピンドルモータ及び回転体装置
US20020170495A1 (en) * 2001-05-17 2002-11-21 Ngk Insulators, Ltd. Method for fabricating a thin film and apparatus for fabricating a thin film

Also Published As

Publication number Publication date
FR2847911A1 (fr) 2004-06-04

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Legal Events

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Effective date: 20140829