FR2827422B1 - Machine multifonctionnelle pour le traitement uniforme de substrats par faisceau d'ions d'energie controlee - Google Patents

Machine multifonctionnelle pour le traitement uniforme de substrats par faisceau d'ions d'energie controlee

Info

Publication number
FR2827422B1
FR2827422B1 FR0109320A FR0109320A FR2827422B1 FR 2827422 B1 FR2827422 B1 FR 2827422B1 FR 0109320 A FR0109320 A FR 0109320A FR 0109320 A FR0109320 A FR 0109320A FR 2827422 B1 FR2827422 B1 FR 2827422B1
Authority
FR
France
Prior art keywords
substrates
ion beam
energy ion
uniform processing
multifunctional machine
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
FR0109320A
Other languages
English (en)
Other versions
FR2827422A1 (fr
Inventor
Jean Pierre Lazzari
Gilles Borsoni
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
X Ion SA
Original Assignee
X Ion SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by X Ion SA filed Critical X Ion SA
Priority to FR0109320A priority Critical patent/FR2827422B1/fr
Publication of FR2827422A1 publication Critical patent/FR2827422A1/fr
Application granted granted Critical
Publication of FR2827422B1 publication Critical patent/FR2827422B1/fr
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/05—Electron or ion-optical arrangements for separating electrons or ions according to their energy or mass
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/004—Charge control of objects or beams
    • H01J2237/0041—Neutralising arrangements
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/04—Means for controlling the discharge
    • H01J2237/047—Changing particle velocity
    • H01J2237/0475—Changing particle velocity decelerating
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/20—Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
    • H01J2237/202—Movement
    • H01J2237/20221—Translation
    • H01J2237/20228—Mechanical X-Y scanning

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
FR0109320A 2001-07-12 2001-07-12 Machine multifonctionnelle pour le traitement uniforme de substrats par faisceau d'ions d'energie controlee Expired - Fee Related FR2827422B1 (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
FR0109320A FR2827422B1 (fr) 2001-07-12 2001-07-12 Machine multifonctionnelle pour le traitement uniforme de substrats par faisceau d'ions d'energie controlee

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR0109320A FR2827422B1 (fr) 2001-07-12 2001-07-12 Machine multifonctionnelle pour le traitement uniforme de substrats par faisceau d'ions d'energie controlee

Publications (2)

Publication Number Publication Date
FR2827422A1 FR2827422A1 (fr) 2003-01-17
FR2827422B1 true FR2827422B1 (fr) 2003-10-31

Family

ID=8865450

Family Applications (1)

Application Number Title Priority Date Filing Date
FR0109320A Expired - Fee Related FR2827422B1 (fr) 2001-07-12 2001-07-12 Machine multifonctionnelle pour le traitement uniforme de substrats par faisceau d'ions d'energie controlee

Country Status (1)

Country Link
FR (1) FR2827422B1 (fr)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2849266A1 (fr) * 2002-12-18 2004-06-25 Gilles Borsoni Machine de traitement uniforme de surfaces d'echantillons par projection d'ions multicharges

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5206516A (en) * 1991-04-29 1993-04-27 International Business Machines Corporation Low energy, steered ion beam deposition system having high current at low pressure
JPH0660837A (ja) * 1992-08-06 1994-03-04 Nissin Electric Co Ltd 低エネルギーイオン銃
US5393985A (en) * 1992-11-26 1995-02-28 Shimadzu Corporation Apparatus for focusing an ion beam
JPH11283552A (ja) * 1998-03-31 1999-10-15 Tadamoto Tamai イオン注入装置、イオン注入方法、イオンビーム源、及び可変スリット機構
JP4138946B2 (ja) * 1998-06-11 2008-08-27 株式会社アルバック イオン注入装置

Also Published As

Publication number Publication date
FR2827422A1 (fr) 2003-01-17

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Legal Events

Date Code Title Description
ST Notification of lapse

Effective date: 20060331