FR2826980B1 - Procede de depot par pulverisation cathodique sous tension d'excitation du plasma - Google Patents

Procede de depot par pulverisation cathodique sous tension d'excitation du plasma

Info

Publication number
FR2826980B1
FR2826980B1 FR0109057A FR0109057A FR2826980B1 FR 2826980 B1 FR2826980 B1 FR 2826980B1 FR 0109057 A FR0109057 A FR 0109057A FR 0109057 A FR0109057 A FR 0109057A FR 2826980 B1 FR2826980 B1 FR 2826980B1
Authority
FR
France
Prior art keywords
spraying process
excitation voltage
plasma excitation
cathode spraying
cathode
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
FR0109057A
Other languages
English (en)
Other versions
FR2826980A1 (fr
Inventor
M Hamed Drissi
Mathieu Bourry
Nathalie Coulon
Michel Sarret
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
INST NAT SCIENCES APPLIQ
Original Assignee
INST NAT SCIENCES APPLIQ
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by INST NAT SCIENCES APPLIQ filed Critical INST NAT SCIENCES APPLIQ
Priority to FR0109057A priority Critical patent/FR2826980B1/fr
Publication of FR2826980A1 publication Critical patent/FR2826980A1/fr
Application granted granted Critical
Publication of FR2826980B1 publication Critical patent/FR2826980B1/fr
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C23C14/086—Oxides of zinc, germanium, cadmium, indium, tin, thallium or bismuth

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Surface Treatment Of Glass (AREA)
FR0109057A 2001-07-06 2001-07-06 Procede de depot par pulverisation cathodique sous tension d'excitation du plasma Expired - Fee Related FR2826980B1 (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
FR0109057A FR2826980B1 (fr) 2001-07-06 2001-07-06 Procede de depot par pulverisation cathodique sous tension d'excitation du plasma

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR0109057A FR2826980B1 (fr) 2001-07-06 2001-07-06 Procede de depot par pulverisation cathodique sous tension d'excitation du plasma

Publications (2)

Publication Number Publication Date
FR2826980A1 FR2826980A1 (fr) 2003-01-10
FR2826980B1 true FR2826980B1 (fr) 2004-05-14

Family

ID=8865256

Family Applications (1)

Application Number Title Priority Date Filing Date
FR0109057A Expired - Fee Related FR2826980B1 (fr) 2001-07-06 2001-07-06 Procede de depot par pulverisation cathodique sous tension d'excitation du plasma

Country Status (1)

Country Link
FR (1) FR2826980B1 (fr)

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA2004936C (fr) * 1988-12-14 1999-01-19 Masahiko Sekiya Materiau d'enregistrement optique
US5779802A (en) * 1990-12-10 1998-07-14 Imec V.Z.W. Thin film deposition chamber with ECR-plasma source
JP2000113732A (ja) * 1998-06-25 2000-04-21 Asahi Glass Co Ltd 透明導電膜とその製造方法、透明導電膜付き基板およびタッチパネル
US6329044B1 (en) * 1998-06-25 2001-12-11 Asahi Glass Company Ltd. Transparent conductive film and method of making the film
JP2000238178A (ja) * 1999-02-24 2000-09-05 Teijin Ltd 透明導電積層体

Also Published As

Publication number Publication date
FR2826980A1 (fr) 2003-01-10

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