FR2825298B1 - IMPROVED METHOD FOR COATING A SUPPORT, ASSOCIATED DEVICE AND STRUCTURE - Google Patents

IMPROVED METHOD FOR COATING A SUPPORT, ASSOCIATED DEVICE AND STRUCTURE

Info

Publication number
FR2825298B1
FR2825298B1 FR0107229A FR0107229A FR2825298B1 FR 2825298 B1 FR2825298 B1 FR 2825298B1 FR 0107229 A FR0107229 A FR 0107229A FR 0107229 A FR0107229 A FR 0107229A FR 2825298 B1 FR2825298 B1 FR 2825298B1
Authority
FR
France
Prior art keywords
target entity
support
ion beam
coating
improved method
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
FR0107229A
Other languages
French (fr)
Other versions
FR2825298A1 (en
Inventor
Peter Hoghoj
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
XENOCS
Original Assignee
XENOCS
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by XENOCS filed Critical XENOCS
Priority to FR0107229A priority Critical patent/FR2825298B1/en
Priority to PCT/FR2002/001829 priority patent/WO2002097156A1/en
Publication of FR2825298A1 publication Critical patent/FR2825298A1/en
Application granted granted Critical
Publication of FR2825298B1 publication Critical patent/FR2825298B1/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/46—Sputtering by ion beam produced by an external ion source
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/22—Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof
    • G03F1/24—Reflection masks; Preparation thereof

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Materials Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

The invention relates to a method for covering a support (30) with a layer of particles arising from a target entity (20), said method comprising the implementation of an ion source (10) for directing an ion beam (100) towards said target entity in order to create a particle flux (F) arising from the interaction between the ion beam and the target entity, with a view to depositing at least one part of the particle flux on the support, characterized in that the method involves setting the ion beam into motion between the ion source and the target entity in order to scan the target entity in such a way that coverings are created, said coverings having a controlled thickness according to a desired profile.The invention also relates to a structure and a filter made according to said method.
FR0107229A 2001-06-01 2001-06-01 IMPROVED METHOD FOR COATING A SUPPORT, ASSOCIATED DEVICE AND STRUCTURE Expired - Fee Related FR2825298B1 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
FR0107229A FR2825298B1 (en) 2001-06-01 2001-06-01 IMPROVED METHOD FOR COATING A SUPPORT, ASSOCIATED DEVICE AND STRUCTURE
PCT/FR2002/001829 WO2002097156A1 (en) 2001-06-01 2002-05-31 Advanced method for covering a support, device and structure associated therewith

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR0107229A FR2825298B1 (en) 2001-06-01 2001-06-01 IMPROVED METHOD FOR COATING A SUPPORT, ASSOCIATED DEVICE AND STRUCTURE

Publications (2)

Publication Number Publication Date
FR2825298A1 FR2825298A1 (en) 2002-12-06
FR2825298B1 true FR2825298B1 (en) 2004-06-25

Family

ID=8863887

Family Applications (1)

Application Number Title Priority Date Filing Date
FR0107229A Expired - Fee Related FR2825298B1 (en) 2001-06-01 2001-06-01 IMPROVED METHOD FOR COATING A SUPPORT, ASSOCIATED DEVICE AND STRUCTURE

Country Status (2)

Country Link
FR (1) FR2825298B1 (en)
WO (1) WO2002097156A1 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111005003B (en) * 2019-12-09 2021-07-06 北京师范大学 Antenna preparation method replacing laser direct forming technology

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB8417040D0 (en) * 1984-07-04 1984-08-08 Salford University Of Modifying properties of material
US4793908A (en) * 1986-12-29 1988-12-27 Rockwell International Corporation Multiple ion source method and apparatus for fabricating multilayer optical films
US4923585A (en) * 1988-11-02 1990-05-08 Arch Development Corporation Sputter deposition for multi-component thin films
TW366367B (en) * 1995-01-26 1999-08-11 Ibm Sputter deposition of hydrogenated amorphous carbon film
US6039806A (en) * 1998-04-20 2000-03-21 E-Tek Dynamics, Inc. Precision thickness optical coating system and method of operation thereof
US6013399A (en) * 1998-12-04 2000-01-11 Advanced Micro Devices, Inc. Reworkable EUV mask materials
DE10047042C2 (en) * 2000-09-22 2002-08-01 Forschungszentrum Juelich Gmbh Method and device for producing hydrogen-containing Si¶1¶¶-¶¶x¶C¶x¶: H layers

Also Published As

Publication number Publication date
FR2825298A1 (en) 2002-12-06
WO2002097156A1 (en) 2002-12-05

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Year of fee payment: 16

ST Notification of lapse

Effective date: 20180228