FR2803091B1 - METHOD FOR DOPING THE EXTRINSIC BASE OF A BIPOLAR TRANSISTOR - Google Patents

METHOD FOR DOPING THE EXTRINSIC BASE OF A BIPOLAR TRANSISTOR

Info

Publication number
FR2803091B1
FR2803091B1 FR9916283A FR9916283A FR2803091B1 FR 2803091 B1 FR2803091 B1 FR 2803091B1 FR 9916283 A FR9916283 A FR 9916283A FR 9916283 A FR9916283 A FR 9916283A FR 2803091 B1 FR2803091 B1 FR 2803091B1
Authority
FR
France
Prior art keywords
doping
bipolar transistor
extrinsic base
extrinsic
base
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
FR9916283A
Other languages
French (fr)
Other versions
FR2803091A1 (en
Inventor
Michel Marty
Didier Dutartre
Alain Chantre
Cyril Fellous
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
STMicroelectronics SA
Original Assignee
STMicroelectronics SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by STMicroelectronics SA filed Critical STMicroelectronics SA
Priority to FR9916283A priority Critical patent/FR2803091B1/en
Publication of FR2803091A1 publication Critical patent/FR2803091A1/en
Application granted granted Critical
Publication of FR2803091B1 publication Critical patent/FR2803091B1/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof  ; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/66007Multistep manufacturing processes
    • H01L29/66075Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials
    • H01L29/66227Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials the devices being controllable only by the electric current supplied or the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched, e.g. three-terminal devices
    • H01L29/66234Bipolar junction transistors [BJT]
    • H01L29/66272Silicon vertical transistors
    • H01L29/66287Silicon vertical transistors with a single crystalline emitter, collector or base including extrinsic, link or graft base formed on the silicon substrate, e.g. by epitaxy, recrystallisation, after insulating device isolation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/22Diffusion of impurity materials, e.g. doping materials, electrode materials, into or out of a semiconductor body, or between semiconductor regions; Interactions between two or more impurities; Redistribution of impurities
    • H01L21/223Diffusion of impurity materials, e.g. doping materials, electrode materials, into or out of a semiconductor body, or between semiconductor regions; Interactions between two or more impurities; Redistribution of impurities using diffusion into or out of a solid from or into a gaseous phase
FR9916283A 1999-12-22 1999-12-22 METHOD FOR DOPING THE EXTRINSIC BASE OF A BIPOLAR TRANSISTOR Expired - Fee Related FR2803091B1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
FR9916283A FR2803091B1 (en) 1999-12-22 1999-12-22 METHOD FOR DOPING THE EXTRINSIC BASE OF A BIPOLAR TRANSISTOR

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR9916283A FR2803091B1 (en) 1999-12-22 1999-12-22 METHOD FOR DOPING THE EXTRINSIC BASE OF A BIPOLAR TRANSISTOR

Publications (2)

Publication Number Publication Date
FR2803091A1 FR2803091A1 (en) 2001-06-29
FR2803091B1 true FR2803091B1 (en) 2002-03-08

Family

ID=9553660

Family Applications (1)

Application Number Title Priority Date Filing Date
FR9916283A Expired - Fee Related FR2803091B1 (en) 1999-12-22 1999-12-22 METHOD FOR DOPING THE EXTRINSIC BASE OF A BIPOLAR TRANSISTOR

Country Status (1)

Country Link
FR (1) FR2803091B1 (en)

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA2031253A1 (en) * 1989-12-01 1991-06-02 Kenji Aoki Method of producing bipolar transistor
JP3079575B2 (en) * 1990-12-20 2000-08-21 株式会社日立製作所 Method for manufacturing semiconductor device
US5256162A (en) * 1991-05-01 1993-10-26 Hewlett Packard Company Apparatus for forming shallow electrical junctions

Also Published As

Publication number Publication date
FR2803091A1 (en) 2001-06-29

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Effective date: 20090831