FR2783178B1 - Dispositif de vaporisation de liquide a regulation de debit de vapeur - Google Patents

Dispositif de vaporisation de liquide a regulation de debit de vapeur

Info

Publication number
FR2783178B1
FR2783178B1 FR9811713A FR9811713A FR2783178B1 FR 2783178 B1 FR2783178 B1 FR 2783178B1 FR 9811713 A FR9811713 A FR 9811713A FR 9811713 A FR9811713 A FR 9811713A FR 2783178 B1 FR2783178 B1 FR 2783178B1
Authority
FR
France
Prior art keywords
flow control
steam flow
vaporization device
liquid vaporization
liquid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
FR9811713A
Other languages
English (en)
Other versions
FR2783178A1 (fr
Inventor
Andre Rousset
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
OMICRON TECHNOLOGIES
Original Assignee
OMICRON TECHNOLOGIES
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by OMICRON TECHNOLOGIES filed Critical OMICRON TECHNOLOGIES
Priority to FR9811713A priority Critical patent/FR2783178B1/fr
Publication of FR2783178A1 publication Critical patent/FR2783178A1/fr
Application granted granted Critical
Publication of FR2783178B1 publication Critical patent/FR2783178B1/fr
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D61/00—Processes of separation using semi-permeable membranes, e.g. dialysis, osmosis or ultrafiltration; Apparatus, accessories or auxiliary operations specially adapted therefor
    • B01D61/36—Pervaporation; Membrane distillation; Liquid permeation
    • B01D61/362—Pervaporation
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D1/00—Evaporating
    • B01D1/0082—Regulation; Control
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/4485—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation without using carrier gas in contact with the source material
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B25/00—Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
    • C30B25/02—Epitaxial-layer growth
    • C30B25/14—Feed and outlet means for the gases; Modifying the flow of the reactive gases
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
    • G05D7/00—Control of flow
    • G05D7/06—Control of flow characterised by the use of electric means
    • G05D7/0617—Control of flow characterised by the use of electric means specially adapted for fluid materials
    • G05D7/0629—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means
    • G05D7/0635—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means by action on throttling means

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Water Supply & Treatment (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Mechanical Engineering (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Automation & Control Theory (AREA)
  • Feeding, Discharge, Calcimining, Fusing, And Gas-Generation Devices (AREA)
FR9811713A 1998-09-16 1998-09-16 Dispositif de vaporisation de liquide a regulation de debit de vapeur Expired - Fee Related FR2783178B1 (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
FR9811713A FR2783178B1 (fr) 1998-09-16 1998-09-16 Dispositif de vaporisation de liquide a regulation de debit de vapeur

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR9811713A FR2783178B1 (fr) 1998-09-16 1998-09-16 Dispositif de vaporisation de liquide a regulation de debit de vapeur

Publications (2)

Publication Number Publication Date
FR2783178A1 FR2783178A1 (fr) 2000-03-17
FR2783178B1 true FR2783178B1 (fr) 2000-12-22

Family

ID=9530618

Family Applications (1)

Application Number Title Priority Date Filing Date
FR9811713A Expired - Fee Related FR2783178B1 (fr) 1998-09-16 1998-09-16 Dispositif de vaporisation de liquide a regulation de debit de vapeur

Country Status (1)

Country Link
FR (1) FR2783178B1 (fr)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB0322027D0 (en) * 2003-09-19 2003-10-22 Prototech As Storage of pressurised fluids
EP2026889A4 (fr) * 2006-06-12 2011-09-07 Semequip Inc Injection de vapeur dans des dispositifs à vide
DE102017123233A1 (de) * 2017-10-06 2019-04-11 Aixtron Se Vorrichtung und Verfahren zur Erzeugung eines in einem Trägergas transportierten Dampfes

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4619844A (en) * 1985-01-22 1986-10-28 Fairchild Camera Instrument Corp. Method and apparatus for low pressure chemical vapor deposition
DE3726431A1 (de) * 1987-08-08 1989-02-16 Daimler Benz Ag Verfahren zur abtrennung von organischen daempfen aus einem luftstrom
US5098741A (en) * 1990-06-08 1992-03-24 Lam Research Corporation Method and system for delivering liquid reagents to processing vessels
DE4124018C1 (fr) * 1991-07-19 1992-11-19 Leybold Ag, 6450 Hanau, De

Also Published As

Publication number Publication date
FR2783178A1 (fr) 2000-03-17

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Legal Events

Date Code Title Description
ST Notification of lapse