FR2683395B1 - - Google Patents

Info

Publication number
FR2683395B1
FR2683395B1 FR9113686A FR9113686A FR2683395B1 FR 2683395 B1 FR2683395 B1 FR 2683395B1 FR 9113686 A FR9113686 A FR 9113686A FR 9113686 A FR9113686 A FR 9113686A FR 2683395 B1 FR2683395 B1 FR 2683395B1
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
FR9113686A
Other languages
French (fr)
Other versions
FR2683395A1 (fr
Inventor
Richard Claude
Jean-Francois Daviet
Philippe Montmayeul
Louise Peccoud
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Commissariat a lEnergie Atomique et aux Energies Alternatives CEA
Original Assignee
Commissariat a lEnergie Atomique CEA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Commissariat a lEnergie Atomique CEA filed Critical Commissariat a lEnergie Atomique CEA
Priority to FR9113686A priority Critical patent/FR2683395A1/fr
Priority to EP92402982A priority patent/EP0545748B1/fr
Priority to DE69217187T priority patent/DE69217187T2/de
Publication of FR2683395A1 publication Critical patent/FR2683395A1/fr
Application granted granted Critical
Publication of FR2683395B1 publication Critical patent/FR2683395B1/fr
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01R—ELECTRICALLY-CONDUCTIVE CONNECTIONS; STRUCTURAL ASSOCIATIONS OF A PLURALITY OF MUTUALLY-INSULATED ELECTRICAL CONNECTING ELEMENTS; COUPLING DEVICES; CURRENT COLLECTORS
    • H01R13/00—Details of coupling devices of the kinds covered by groups H01R12/70 or H01R24/00 - H01R33/00
    • H01R13/02—Contact members
    • H01R13/22—Contacts for co-operating by abutting
    • H01R13/24—Contacts for co-operating by abutting resilient; resiliently-mounted
    • H01R13/2407—Contacts for co-operating by abutting resilient; resiliently-mounted characterized by the resilient means
    • H01R13/2421—Contacts for co-operating by abutting resilient; resiliently-mounted characterized by the resilient means using coil springs
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
    • C23C16/4582—Rigid and flat substrates, e.g. plates or discs
    • C23C16/4583—Rigid and flat substrates, e.g. plates or discs the substrate being supported substantially horizontally
    • C23C16/4586—Elements in the interior of the support, e.g. electrodes, heating or cooling devices
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32532—Electrodes
    • H01J37/32577—Electrical connecting means
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/70—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
    • H10P72/72—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using electrostatic chucks
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/20—Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
    • H01J2237/2007—Holding mechanisms

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Multi-Conductor Connections (AREA)
FR9113686A 1991-11-06 1991-11-06 Dispositif d'amende de tension sur une piece conductrice. Granted FR2683395A1 (fr)

Priority Applications (3)

Application Number Priority Date Filing Date Title
FR9113686A FR2683395A1 (fr) 1991-11-06 1991-11-06 Dispositif d'amende de tension sur une piece conductrice.
EP92402982A EP0545748B1 (fr) 1991-11-06 1992-11-04 Dispositif d'amenée de tension sur un porte-substrat
DE69217187T DE69217187T2 (de) 1991-11-06 1992-11-04 Anordnung zur Zuführung einer Spannung auf einen Substrathalter

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR9113686A FR2683395A1 (fr) 1991-11-06 1991-11-06 Dispositif d'amende de tension sur une piece conductrice.

Publications (2)

Publication Number Publication Date
FR2683395A1 FR2683395A1 (fr) 1993-05-07
FR2683395B1 true FR2683395B1 (en:Method) 1995-04-28

Family

ID=9418669

Family Applications (1)

Application Number Title Priority Date Filing Date
FR9113686A Granted FR2683395A1 (fr) 1991-11-06 1991-11-06 Dispositif d'amende de tension sur une piece conductrice.

Country Status (3)

Country Link
EP (1) EP0545748B1 (en:Method)
DE (1) DE69217187T2 (en:Method)
FR (1) FR2683395A1 (en:Method)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2724269B1 (fr) 1994-09-06 1996-10-18 Commissariat Energie Atomique Porte-substrat electrostatique
US6221221B1 (en) 1998-11-16 2001-04-24 Applied Materials, Inc. Apparatus for providing RF return current path control in a semiconductor wafer processing system
US11651986B2 (en) 2021-01-27 2023-05-16 Applied Materials, Inc. System for isolating electrodes at cryogenic temperatures

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3012491C2 (de) * 1980-03-31 1984-10-25 Feinmetall Gmbh, 7033 Herrenberg Kontaktbaustein zum Prüfen von elektrischen Leiterplatten
JPS59188550A (ja) * 1983-04-12 1984-10-25 Fuji Photo Film Co Ltd イオン活量測定装置用電気接続端子アセンブリ−
EP0256541A3 (de) * 1986-08-19 1990-03-14 Feinmetall Gesellschaft mit beschrÀ¤nkter Haftung Kontaktiervorrichtung
US4777908A (en) * 1986-11-26 1988-10-18 Optical Coating Laboratory, Inc. System and method for vacuum deposition of thin films

Also Published As

Publication number Publication date
EP0545748B1 (fr) 1997-01-29
DE69217187D1 (de) 1997-03-13
DE69217187T2 (de) 1997-07-17
FR2683395A1 (fr) 1993-05-07
EP0545748A1 (fr) 1993-06-09

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Legal Events

Date Code Title Description
ST Notification of lapse