FR2663043B1 - METHOD FOR DEPOSITING THIN FILMS OF REFRACTORY METALS. - Google Patents

METHOD FOR DEPOSITING THIN FILMS OF REFRACTORY METALS.

Info

Publication number
FR2663043B1
FR2663043B1 FR9007290A FR9007290A FR2663043B1 FR 2663043 B1 FR2663043 B1 FR 2663043B1 FR 9007290 A FR9007290 A FR 9007290A FR 9007290 A FR9007290 A FR 9007290A FR 2663043 B1 FR2663043 B1 FR 2663043B1
Authority
FR
France
Prior art keywords
thin films
refractory metals
depositing thin
depositing
refractory
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
FR9007290A
Other languages
French (fr)
Other versions
FR2663043A1 (en
Inventor
Roland Madar
Jean Pierre Henri Senateur
Claude Georges Bernard
Joaquin Torres
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
CENTRE NAL RECHERC SCIENTIFIQUE
Original Assignee
CENTRE NAL RECHERC SCIENTIFIQUE
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by CENTRE NAL RECHERC SCIENTIFIQUE filed Critical CENTRE NAL RECHERC SCIENTIFIQUE
Priority to FR9007290A priority Critical patent/FR2663043B1/en
Publication of FR2663043A1 publication Critical patent/FR2663043A1/en
Application granted granted Critical
Publication of FR2663043B1 publication Critical patent/FR2663043B1/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/06—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material
    • C23C16/08—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material from metal halides
    • C23C16/14—Deposition of only one other metal element

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
FR9007290A 1990-06-12 1990-06-12 METHOD FOR DEPOSITING THIN FILMS OF REFRACTORY METALS. Expired - Fee Related FR2663043B1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
FR9007290A FR2663043B1 (en) 1990-06-12 1990-06-12 METHOD FOR DEPOSITING THIN FILMS OF REFRACTORY METALS.

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR9007290A FR2663043B1 (en) 1990-06-12 1990-06-12 METHOD FOR DEPOSITING THIN FILMS OF REFRACTORY METALS.

Publications (2)

Publication Number Publication Date
FR2663043A1 FR2663043A1 (en) 1991-12-13
FR2663043B1 true FR2663043B1 (en) 1994-01-07

Family

ID=9397513

Family Applications (1)

Application Number Title Priority Date Filing Date
FR9007290A Expired - Fee Related FR2663043B1 (en) 1990-06-12 1990-06-12 METHOD FOR DEPOSITING THIN FILMS OF REFRACTORY METALS.

Country Status (1)

Country Link
FR (1) FR2663043B1 (en)

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5989407A (en) * 1982-11-15 1984-05-23 Mitsui Toatsu Chem Inc Formation of amorphous silicon film
US4751101A (en) * 1987-04-30 1988-06-14 International Business Machines Corporation Low stress tungsten films by silicon reduction of WF6

Also Published As

Publication number Publication date
FR2663043A1 (en) 1991-12-13

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Legal Events

Date Code Title Description
ST Notification of lapse