FR2656327A1 - Cleaning composition based on 1,1-dichloro-2,2,2-trifluoroethane and methyl formate - Google Patents

Cleaning composition based on 1,1-dichloro-2,2,2-trifluoroethane and methyl formate Download PDF

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FR2656327A1
FR2656327A1 FR8917078A FR8917078A FR2656327A1 FR 2656327 A1 FR2656327 A1 FR 2656327A1 FR 8917078 A FR8917078 A FR 8917078A FR 8917078 A FR8917078 A FR 8917078A FR 2656327 A1 FR2656327 A1 FR 2656327A1
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sep
methyl formate
composition
trifluoroethane
dichloro
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FR8917078A
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FR2656327B1 (en
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Desbiendras Daniel
Martin Jean-Jacques
Michaud Pascal
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Arkema France SA
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Atochem SA
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    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23GCLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
    • C23G5/00Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents
    • C23G5/02Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents using organic solvents
    • C23G5/028Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents using organic solvents containing halogenated hydrocarbons
    • C23G5/02809Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents using organic solvents containing halogenated hydrocarbons containing chlorine and fluorine
    • C23G5/02825Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents using organic solvents containing halogenated hydrocarbons containing chlorine and fluorine containing hydrogen
    • C23G5/02829Ethanes
    • C23G5/02838C2HCl2F3
    • CCHEMISTRY; METALLURGY
    • C11ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11DDETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/50Solvents
    • C11D7/5004Organic solvents
    • C11D7/5018Halogenated solvents
    • CCHEMISTRY; METALLURGY
    • C11ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11DDETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/50Solvents
    • C11D7/5036Azeotropic mixtures containing halogenated solvents
    • C11D7/5068Mixtures of halogenated and non-halogenated solvents
    • C11D7/5077Mixtures of only oxygen-containing solvents
    • C11D7/5086Mixtures of only oxygen-containing solvents the oxygen-containing solvents being different from alcohols, e.g. mixtures of water and ethers
    • CCHEMISTRY; METALLURGY
    • C11ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11DDETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22Organic compounds
    • C11D7/26Organic compounds containing oxygen
    • C11D7/266Esters or carbonates
    • CCHEMISTRY; METALLURGY
    • C11ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11DDETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22Organic compounds
    • C11D7/28Organic compounds containing halogen
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/22Secondary treatment of printed circuits
    • H05K3/26Cleaning or polishing of the conductive pattern

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Wood Science & Technology (AREA)
  • General Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Detergent Compositions (AREA)

Abstract

To replace cleaning compositions based on 1,1,2-trichloro-1,2,2-trifluoroethane (F113), the invention proposes a composition comprising, by weight, 70 to 80% of 1,1-dichloro-2,2,2-trifluoroethane (F123) and 30 to 20% of methyl formate. These two compounds form a negative azeotrope (B.p. = 33.3 DEG C at normal pressure). The composition, optionally stabilised, can be used for cleaning solid surfaces, in particular for defluxing printed circuits and for degreasing mechanical components.

Description

COMPOSITION NETTOYANTE A BASE DE 1,1-DICHLORO
2,2,2-TRIFLUOROETEANE ET DE FORMIATE DE METHYLE
La présente invention concerne le domaine des hydrocarbures chlorofluorés et a plus particulièrement pour objet une nouvelle composition présentant un azéotrope et utilisable comme agent de nettoyage et de dégraissage de surfaces solides, en particulier dans le défluxage et le nettoyage à froid de circuits imprimés.
CLEANING COMPOSITION BASED ON 1,1-DICHLORO
2,2,2-TRIFLUOROETEANE AND METHYL FORMAT
The present invention relates to the field of chlorofluorocarbons and more particularly to a new composition having an azeotrope and used as a cleaning agent and degreasing of solid surfaces, particularly in the defluxing and cold cleaning of printed circuits.

Le 1,l,2-trichloro-1,2,2-trifîuoroéthane (connu dans le métier sous la désignation F113) est largement utilisé dans l'industrie pour le nettoyage et le dégraissage des surfaces solides. Outre son application en électronique au nettoyage des flux de soudure pour éliminer le flux décapant qui adhère aux circuits imprimés, on peut mentionner ses applications au dégraissage de pièces métalliques lourdes et au nettoyage de pièces mécaniques de haute qualité et de grande précision comme, par exemple, les gyroscopes et le matériel militaire ou aérospatial.Dans ses diverses applications, le F113 est le plus souvent associé à d'autres solvants organiques (par exemple le méthanol), de préférence sous forme de mélanges azéotropiques ou pseudo-azéotropiques qui ne démixent pas et qui, employés au reflux, ont sensiblement la même composition dans la phase vapeur que dans la phase liquide. 1,1,2-Trichloro-1,2,2-trifluoroethane (known in the art as F113) is widely used in the industry for cleaning and degreasing solid surfaces. In addition to its application in electronics to the cleaning of solder fluxes to eliminate the stripping flux that adheres to the printed circuits, one can mention its applications to the degreasing of heavy metal parts and the cleaning of mechanical parts of high quality and high precision as, for example , gyroscopes and military or aerospace material.In its various applications, F113 is most often associated with other organic solvents (eg methanol), preferably in the form of azeotropic or pseudo-azeotropic mixtures that do not demix and which, employed at reflux, have substantially the same composition in the vapor phase as in the liquid phase.

Cependant, le F113 fait partie des chlorofluorocarbures complètement halogénés qui sont actuellement suspectés d'attaquer ou de dégrader l'ozone stratosphérique. However, F113 is one of the fully halogenated chlorofluorocarbons that are currently suspected of attacking or degrading stratospheric ozone.

Pour contribuer à résoudre ce problème, la présente invention propose de remplacer les compositions à base de F113 par une nouvelle composition à base de formiate de méthyle et de 1,1-dichloro-2,2,2-trifluoroéthane. Ce dernier composé, connu dans le métier sous la désignation F123, est pratiquement dépourvu d'effet destructeur vis-à-vis de l'ozone. To help solve this problem, the present invention proposes to replace the compositions based on F113 with a new composition based on methyl formate and 1,1-dichloro-2,2,2-trifluoroethane. The latter compound, known in the trade under the designation F123, is virtually devoid of destructive effect vis-à-vis ozone.

La composition à utiliser selon l'invention comprend de 70 à 80 % en poids de F123 et de 20 à 30 % de formiate de méthyle. Dans ce domaine, il existe un azéotrope dont la tempé rature d'ébullition est de 33,30C à la pression atmosphérique normale (1,013 bar) et la composition selon l'invention a un comportement pseudo-azéotropique, c'est-à-dire que la composition des phases vapeur et liquide est sensiblement la même, ce qui est particulièrement avantageux pour les applications visées. De préférence, la teneur en F123 est choisie entre 72 et 75 % en poids et celle de formiate de méthyle entre 28 et 25 % en poids. The composition to be used according to the invention comprises from 70 to 80% by weight of F123 and from 20 to 30% of methyl formate. In this field, there is an azeotrope whose boiling temperature is 33.30 C at normal atmospheric pressure (1.013 bar) and the composition according to the invention has a pseudo-azeotropic behavior, that is to say that the composition of the vapor and liquid phases is substantially the same, which is particularly advantageous for the intended applications. Preferably, the content of F123 is chosen between 72 and 75% by weight and that of methyl formate between 28 and 25% by weight.

La composition selon l'invention a en outre l'avantage important de ne pas présenter de point éclair dans les conditions standard de détermination (norme ASTM-D 3828) ; la composition est donc ininflammable. The composition according to the invention also has the important advantage of not having a flash point under the standard conditions of determination (ASTM-D 3828 standard); the composition is therefore nonflammable.

L'azéotrope F123/formiate de méthyle est un azéotrope négatif puisque son point d'ébullition (33,30C) est supérieur à ceux des deux constituants (F123 : 27,90C ; formiate de méthyle : 31,70C). Ceci constitue un autre avantage de la composition selon l'invention puisqu'en remontant le point d'ébullition on s'éloigne de la température ambiante ce qui facilite son emploi dans les applications mentionnées précédemment. The azeotrope F123 / methyl formate is a negative azeotrope since its boiling point (33.30C) is higher than those of the two constituents (F123: 27.90C, methyl formate: 31.70C). This is another advantage of the composition according to the invention since going up the boiling point away from the ambient temperature which facilitates its use in the applications mentioned above.

Comme dans les compositions connues à base de F113, la composition selon l'invention peut être avantageusement stabilisée contre l'hydrolyse et/ou les attaques radicalaires susceptibles de survenir dans les processus de nettoyage, en y ajoutant un stabilisant usuel tel que, par exemple, le nitrométhane, l'oxyde de propylène ou un mélange de ces composés, la proportion de stabilisant pouvant aller de 0,01 à 5 % par rapport au poids total : F123 + formiate de méthyle. As in the known compositions based on F113, the composition according to the invention can be advantageously stabilized against hydrolysis and / or radical attacks likely to occur in the cleaning processes, by adding a conventional stabilizer such as, for example , nitromethane, propylene oxide or a mixture of these compounds, the proportion of stabilizer ranging from 0.01 to 5% relative to the total weight: F123 + methyl formate.

La composition selon l'invention peut être utilisée dans les mêmes applications et selon les mêmes techniques que les compositions antérieures à base de F113. The composition according to the invention can be used in the same applications and according to the same techniques as the prior compositions based on F113.

Les exemples suivants illustrent l'invention sans la limiter. The following examples illustrate the invention without limiting it.

EXEMPLE 1 : MISE EN EVIDENCE DE L'AZEOTROPE
Dans le bouilleur d'une colonne à distiller (30 plateaux), on introduit 100 g de formiate de méthyle et 100 g de F123. Le mélange est ensuite mis à reflux total pendant une heure pour amener le système à l'équilibre, puis on recueille deux fractions : la première à 31,40C (env. 50 g) et la seconde à 340C (env. 100 g). Ces deux fractions et la fraction de pied restante sont analysées par chromatographie en phase gazeuse.
EXAMPLE 1: EVIDENCE OF AZEOTROPE
In the boiler of a distillation column (30 trays), 100 g of methyl formate and 100 g of F123 are introduced. The mixture is then refluxed for one hour to bring the system to equilibrium, and two fractions are collected: the first at 31.40 ° C. (about 50 g) and the second at 340 ° C. (about 100 g). These two fractions and the remaining fraction of foot are analyzed by gas chromatography.

L'examen des résultats, consignés dans le tableau suivant, indique la présence d'un azéotrope F123/formiate de méthyle.

Figure img00030001
Examination of the results, recorded in the following table, indicates the presence of a F123 azeotrope / methyl formate.
Figure img00030001

<SEP> #1
<tb> <SEP> COHPOSITION <SEP> (% <SEP> poi8s)
<tb> <SEP> -II
<tb> Première <SEP> fraction <SEP> à <SEP> 31,40C <SEP> 2 <SEP> 98
<tb> Deuxième <SEP> fraction <SEP> à <SEP> 340C <SEP> 72,5 <SEP> 27,5
<tb> Pied <SEP> de <SEP> distillation <SEP> 72,5 <SEP> 27,5
<tb>
EXEMPLE 2 : VERIFICATION DE LA COMPOSITION AZEOTROPIQUE
Dans le bouilleur d'une colonne à distiller adiabatique (30 plateaux), on introduit 200 g d'un mélange comprenant 72,5 % en poids de F123 et 27,5 % en poids de formiate de méthyle. Le mélange est ensuite porté à reflux pendant une heure pour amener le système à l'équilibre, puis on soutire une fraction d'environ 50 g et on procède à son analyse par chromatographie en phase gazeuse ainsi que celle du pied de distillation.Les résultats consignés dans le tableau suivant montrent la présence d'un azéotrope négatif puisque son point d'ébullition est supérieur à ceux des deux constituants purs
F123 et formiate de méthyle.

Figure img00040001
<SEP># 1
<tb><SEP> COHPOSITION <SEP> (% <SEP> poi8s)
<tb><SEP> -II
<tb> First <SEP> fraction <SEP> to <SEP> 31.40C <SEP> 2 <SEP> 98
<tb> Second <SEP> fraction <SEP> to <SEP> 340C <SEP> 72.5 <SEP> 27.5
<tb> Foot <SEP> of <SEP> distillation <SEP> 72.5 <SEP> 27.5
<Tb>
EXAMPLE 2 Verification of the AZEOTROPIC COMPOSITION
In the boiler of an adiabatic distillation column (30 trays) is introduced 200 g of a mixture comprising 72.5% by weight of F123 and 27.5% by weight of methyl formate. The mixture is then refluxed for one hour to bring the system to equilibrium, then a fraction of about 50 g is withdrawn and analyzed by gas chromatography and that of the distillation foot. listed in the following table show the presence of a negative azeotrope since its boiling point is higher than those of the two pure constituents
F123 and methyl formate.
Figure img00040001

<tb><Tb>

<SEP> COXPOSITION <SEP> <SEP> (% <SEP> <SEP> poids)
<tb> <SEP> F123 <SEP> HCOOCH3
<tb> Mélange <SEP> initial <SEP> 72,5 <SEP> 27,5
<tb> Fraction <SEP> recueillie <SEP> 73,7 <SEP> 26,3
<tb> Pied <SEP> de <SEP> distillation <SEP> 72,4 <SEP> 27,6
<tb>
Température du bouilleur : 340C
Température d'ébullition corrigée pour 1,013 bar : 33,30C
L
Cet azéotrope, employé pour le nettoyage de flux de soudure ou en dégraissage de pièces mécaniques, donne d'aussi bons résultats que les compositions à base de F113 et de méthanol.
<SEP> COXPOSITION <SEP><SEP> (% <SEP><SEP> weight)
<tb><SEP> F123 <SEP> HCOOCH3
<tb> Initial <SEP> Blend <SEP> 72.5 <SEP> 27.5
<tb> Fraction <SEP> collected <SEP> 73.7 <SEP> 26.3
<tb> Foot <SEP> of <SEP> distillation <SEP> 72.4 <SEP> 27.6
<Tb>
Temperature of the boiler: 340C
Corrected boiling point for 1,013 bar: 33,30C
The
This azeotrope, used for the cleaning of welding flux or degreasing of mechanical parts, gives as good results as the compositions based on F113 and methanol.

EXEMPLE 3 : COMPOSITION STABILISEE AU NITROXETEANE
Dans une cuve de nettoyage à ultra-sons, on introduit 150 g d'un mélange contenant en poids 72,5 % de F123, 27,4 % de formiate de méthyle, et 0,1 % de nitrométhane comme stabilisant. Après avoir mis le système à reflux pendant une heure, on prélève un aliquat de la phase vapeur. Son analyse par chromatographie en phase gazeuse montre la présence de nitrométhane ce qui indique que le mélange est stabilisé dans la phase vapeur.

Figure img00040002
EXAMPLE 3: COMPOSITION STABILIZED WITH NITROXETANE
In an ultrasonic cleaning tank, 150 g of a mixture containing 72.5% by weight of F123, 27.4% of methyl formate and 0.1% of nitromethane as stabilizer are introduced. After refluxing the system for one hour, an aliquate of the vapor phase is taken. Its analysis by gas chromatography shows the presence of nitromethane indicating that the mixture is stabilized in the vapor phase.
Figure img00040002

<tb><Tb>

<SEP> COMPOSITION <SEP> (% <SEP> I <SEP> poids)
<tb> <SEP> F123 <SEP> HC0OCH3 <SEP> <SEP> CH3NO2 <SEP>
<tb> Mélange <SEP> initial <SEP> 72,5 <SEP> 27,4 <SEP> 0,1
<tb> Phase <SEP> vapeur <SEP> 72,5 <SEP> 27,5 <SEP> 0,04
<tb>
EXEMPLE 4 : COMPOSITION STABILISEE A L'OXYDE DE PROPYLENE
Si on répète l'exemple 3 en remplaçant le nitrométhane par l'oxyde de propylène, on obtient les résultats suivants

Figure img00050001
<SEP> COMPOSITION <SEP> (% <SEP> I <SEP> weight)
<tb><SEP> F123 <SEP> HC0OCH3 <SEP><SEP> CH3NO2 <SEP>
<tb> Initial <SEP> Blend <SEP> 72.5 <SEP> 27.4 <SEP> 0.1
<tb> Phase <SEP> Steam <SEP> 72.5 <SEP> 27.5 <SEP> 0.04
<Tb>
EXAMPLE 4: COMPOSITION STABILIZED WITH PROPYLENE OXIDE
If Example 3 is repeated, replacing nitromethane with propylene oxide, the following results are obtained:
Figure img00050001

<tb> <SEP> COMPOSITION <SEP> (% <SEP> <SEP> poids)
<tb> <SEP> F123 <SEP> HCOOCH3 <SEP> C3H60
<tb> Mélange <SEP> initial <SEP> 72,5 <SEP> 27,4 <SEP> 0,1
<tb> Phase <SEP> vapeur <SEP> 72,5 <SEP> 27,5 <SEP> 0,02
<tb>
EXEMPLE 5 : COMPOSITION BISTABILISEE
On répète l'exemple 3 en utilisant 0,1 % de nitrométhane et 0,1 % d'oxyde de propylène.On obtient les résultats suivants

Figure img00050002
<tb><SEP> COMPOSITION <SEP> (% <SEP><SEP> weight)
<tb><SEP> F123 <SEP> HCOOCH3 <SEP> C3H60
<tb> Initial <SEP> Blend <SEP> 72.5 <SEP> 27.4 <SEP> 0.1
<tb> Phase <SEP> Steam <SEP> 72.5 <SEP> 27.5 <SEP> 0.02
<Tb>
EXAMPLE 5 BISTABILIZED COMPOSITION
Example 3 is repeated using 0.1% nitromethane and 0.1% propylene oxide. The following results are obtained
Figure img00050002

<tb> <SEP> COMPOSITION <SEP> <SEP> (% <SEP> poids)
<tb> <SEP> F123 <SEP> HCOOCH3 <SEP> CH3N02 <SEP> C3H6O
<tb> Mélange <SEP> initial <SEP> 72,5 <SEP> 27,3 <SEP> 0,1 <SEP> 0,1
<tb> Phase <SEP> vapeur <SEP> 72,5 <SEP> 27,5 <SEP> 0,02 <SEP> i <SEP> <SEP> 0,01
<tb>
EXEMPLE 6 : NETTOYAGE DE FLUX DE SOUDURE
Dans une cuve à ultra-sons Annemasse, on introduit 200 g de la composition azéotropique F123/formiate de méthyle, puis on porte le mélange à la température d'ébullition.
<tb><SEP> COMPOSITION <SEP><SEP> (% <SEP> weight)
<tb><SEP> F123 <SEP> HCOOCH3 <SEP> CH3N02 <SEP> C3H6O
<tb> Initial <SEP> Blend <SEP> 72.5 <SEP> 27.3 <SEP> 0.1 <SEP> 0.1
<tb> Phase <SEP> Steam <SEP> 72.5 <SEP> 27.5 <SEP> 0.02 <SEP> i <SEP><SEP> 0.01
<Tb>
EXAMPLE 6: CLEANING OF WELDING FLOW
In an Annemasse ultrasonic tank, 200 g of the azeotropic composition F123 / methyl formate are introduced, and then the mixture is brought to boiling point.

Des plaques de verre, enduites de flux de soudure et recuites à 11 étuve pendant 30 secondes à 2200C, sont plongées durant 3 minutes dans le liquide à l'ébullition sous ultrasons, puis rincées dans la phase vapeur pendant 3 minutes. Glass plates, coated with solder flux and annealed at 11 ° C. for 30 seconds at 2200 ° C., are immersed for 3 minutes in the liquid while boiling under ultrasound, then rinsed in the vapor phase for 3 minutes.

Après séchage à l'air, une visualisation en lumière rasante revèle l'absence totale de résidu de flux de soudure. On a ainsi obtenu le même résultat qu'avec une composition F113méthanol (93,7 %-6,3 %).  After drying in air, a visualization in grazing light reveals the total absence of flux flux residue. The same result was obtained with a F113methanol composition (93.7% -6.3%).

Claims (8)

REVENDICATIONS 1. Composition nettoyante comprenant en poids de 70 à 80 % de 1,1-dichloro-2,2,2-trifluoroéthane et de 30 à 20 % de formiate de méthyle. 1. Cleaning composition comprising by weight 70 to 80% of 1,1-dichloro-2,2,2-trifluoroethane and 30 to 20% of methyl formate. 2. Composition selon la revendication 1 contenant en poids de 72 à 75 % de 1,1-dichloro-2,2,2-trifluoroéthane et de 28 à 25 % de formiate de méthyle. 2. Composition according to claim 1 containing, by weight, 72 to 75% of 1,1-dichloro-2,2,2-trifluoroethane and 28 to 25% of methyl formate. 3. Composition selon la revendication 2 sous forme d'azéotrope bouillant à 33,30C à la pression normale. 3. Composition according to claim 2 in the form of azeotrope boiling at 33.30C at normal pressure. 4. Composition selon l'une des revendications 1 à 3, comprenant en outre au moins un stabilisant. 4. Composition according to one of claims 1 to 3, further comprising at least one stabilizer. 5. Composition selon la revendication 1, dans laquelle le stabilisant est le nitrométhane, l'oxyde de propylène ou un mélange de ces composés. The composition of claim 1, wherein the stabilizer is nitromethane, propylene oxide or a mixture of these compounds. 6. Composition selon la revendication 4 ou 5, dans laquelle la proportion de stabilisant est de 0,01 à 5 % par rapport au poids total de l,l-dichloro-2,2,2-trifluoroéthane et de formiate de méthyle. 6. Composition according to claim 4 or 5, wherein the proportion of stabilizer is 0.01 to 5% relative to the total weight of 1,1-dichloro-2,2,2-trifluoroethane and methyl formate. 7. Application d'une composition selon l'une des revendications 1 à 6 au nettoyage des surfaces solides. 7. Application of a composition according to one of claims 1 to 6 for cleaning solid surfaces. 8. Application selon la revendication 7 au défluxage des circuits imprimés et au dégraissage des pièces mécaniques.  8. Application according to claim 7 defluxing printed circuits and degreasing of mechanical parts.
FR8917078A 1989-12-22 1989-12-22 CLEANING COMPOSITION BASED ON 1,1-DICHLORO-2,2,2-TRIFLUOROETHANE AND METHYL FORMIATE. Expired - Lifetime FR2656327B1 (en)

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FR8917078A FR2656327B1 (en) 1989-12-22 1989-12-22 CLEANING COMPOSITION BASED ON 1,1-DICHLORO-2,2,2-TRIFLUOROETHANE AND METHYL FORMIATE.

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FR8917078A FR2656327B1 (en) 1989-12-22 1989-12-22 CLEANING COMPOSITION BASED ON 1,1-DICHLORO-2,2,2-TRIFLUOROETHANE AND METHYL FORMIATE.

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FR2656327A1 true FR2656327A1 (en) 1991-06-28
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Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5629529A (en) * 1979-08-16 1981-03-24 Tokuyama Soda Co Ltd Stabilization of methylene chloride
US4816175A (en) * 1988-04-25 1989-03-28 Allied-Signal Inc. Azeotrope-like compositions of dichlorotrifluoroethane, methanol, cyclopentane and nitromethane

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5629529A (en) * 1979-08-16 1981-03-24 Tokuyama Soda Co Ltd Stabilization of methylene chloride
US4816175A (en) * 1988-04-25 1989-03-28 Allied-Signal Inc. Azeotrope-like compositions of dichlorotrifluoroethane, methanol, cyclopentane and nitromethane

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
CHEMICAL ABSTRACTS, vol. 95, 1981, page 693, résumé no. 42331a, Columbus, Ohio, US; & JP-A-81 29 529 (TOKUYAMA SODA CO., LTD) 24-03-1981 *

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