FR2637428B1 - FORBIDDEN ELECTRODE FOR SURFACE WAVE DEVICE AND METHOD FOR THE PRODUCTION THEREOF - Google Patents

FORBIDDEN ELECTRODE FOR SURFACE WAVE DEVICE AND METHOD FOR THE PRODUCTION THEREOF

Info

Publication number
FR2637428B1
FR2637428B1 FR898912773A FR8912773A FR2637428B1 FR 2637428 B1 FR2637428 B1 FR 2637428B1 FR 898912773 A FR898912773 A FR 898912773A FR 8912773 A FR8912773 A FR 8912773A FR 2637428 B1 FR2637428 B1 FR 2637428B1
Authority
FR
France
Prior art keywords
forbidden
electrode
production
wave device
surface wave
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
FR898912773A
Other languages
French (fr)
Other versions
FR2637428A1 (en
Inventor
Takumi Suetsugu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Mining and Cement Co Ltd
Original Assignee
Mitsubishi Mining and Cement Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Mining and Cement Co Ltd filed Critical Mitsubishi Mining and Cement Co Ltd
Publication of FR2637428A1 publication Critical patent/FR2637428A1/en
Application granted granted Critical
Publication of FR2637428B1 publication Critical patent/FR2637428B1/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H3/00—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
    • H03H3/007—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
    • H03H3/08—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of resonators or networks using surface acoustic waves
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N30/00—Piezoelectric or electrostrictive devices
    • H10N30/01—Manufacture or treatment
    • H10N30/06—Forming electrodes or interconnections, e.g. leads or terminals

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Acoustics & Sound (AREA)
  • General Physics & Mathematics (AREA)
  • Surface Acoustic Wave Elements And Circuit Networks Thereof (AREA)
  • Photovoltaic Devices (AREA)
FR898912773A 1988-09-30 1989-09-29 FORBIDDEN ELECTRODE FOR SURFACE WAVE DEVICE AND METHOD FOR THE PRODUCTION THEREOF Expired - Fee Related FR2637428B1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP63244272A JPH0294807A (en) 1988-09-30 1988-09-30 Manufacture of surface acoustic wave device

Publications (2)

Publication Number Publication Date
FR2637428A1 FR2637428A1 (en) 1990-04-06
FR2637428B1 true FR2637428B1 (en) 1992-08-28

Family

ID=17116281

Family Applications (1)

Application Number Title Priority Date Filing Date
FR898912773A Expired - Fee Related FR2637428B1 (en) 1988-09-30 1989-09-29 FORBIDDEN ELECTRODE FOR SURFACE WAVE DEVICE AND METHOD FOR THE PRODUCTION THEREOF

Country Status (4)

Country Link
JP (1) JPH0294807A (en)
DE (1) DE3932451A1 (en)
FR (1) FR2637428B1 (en)
GB (1) GB2223329B (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04200007A (en) * 1990-11-29 1992-07-21 Nikko Kyodo Co Ltd Method for forming metallic electrode
US6625855B1 (en) 1999-10-06 2003-09-30 Murata Manufacturing Co., Ltd. Method for producing surface acoustic wave device
CN109842393A (en) * 2018-12-25 2019-06-04 泉州三安半导体科技有限公司 The method of exposure effect and the manufacturing method of interdigital transducer are improved in interdigital transducer manufacturing process
CN111327284A (en) * 2020-02-18 2020-06-23 厦门市三安集成电路有限公司 Preparation method of interdigital electrode
CN112741640B (en) * 2020-12-10 2022-11-04 中国科学院深圳先进技术研究院 Real-time ultrasonic stimulation electric signal recording chip and preparation method thereof

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3639185A (en) * 1969-06-30 1972-02-01 Ibm Novel etchant and process for etching thin metal films
US3944421A (en) * 1973-10-03 1976-03-16 Horizons Incorporated, A Division Of Horizons Research Incorporated Process for simultaneous development and etch of photoresist and substrate
US3944420A (en) * 1974-05-22 1976-03-16 Rca Corporation Generation of permanent phase holograms and relief patterns in durable media by chemical etching
JPS5134651A (en) * 1974-09-19 1976-03-24 Toko Inc HYOMENHAFUIRUTAOYOBISONOSEIZOHOHO
JPS57136321A (en) * 1981-02-18 1982-08-23 Hitachi Ltd Manufacture of resist stencil mask for lift-off
JPS59121987A (en) * 1982-12-28 1984-07-14 Toshiba Corp Manufacture of device using lithium borate crystal
JPH0716141B2 (en) * 1984-06-05 1995-02-22 株式会社東芝 Surface acoustic wave device
JPS60259012A (en) * 1984-06-05 1985-12-21 Toshiba Corp Surface acoustic wave device
JPS63240507A (en) * 1987-03-27 1988-10-06 Nippon Mining Co Ltd Production of device

Also Published As

Publication number Publication date
GB2223329B (en) 1993-03-24
DE3932451A1 (en) 1990-05-10
GB2223329A (en) 1990-04-04
FR2637428A1 (en) 1990-04-06
JPH0294807A (en) 1990-04-05
GB8921245D0 (en) 1989-11-08
JPH0524684B2 (en) 1993-04-08

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Legal Events

Date Code Title Description
ST Notification of lapse