FR2586709B1 - Procede de gravure selective et guide d'onde obtenu par ledit procede - Google Patents

Procede de gravure selective et guide d'onde obtenu par ledit procede

Info

Publication number
FR2586709B1
FR2586709B1 FR8513088A FR8513088A FR2586709B1 FR 2586709 B1 FR2586709 B1 FR 2586709B1 FR 8513088 A FR8513088 A FR 8513088A FR 8513088 A FR8513088 A FR 8513088A FR 2586709 B1 FR2586709 B1 FR 2586709B1
Authority
FR
France
Prior art keywords
selective etching
waveguide obtained
etching method
waveguide
selective
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR8513088A
Other languages
English (en)
Other versions
FR2586709A1 (fr
Inventor
Andre Molaine
Jean Poitevin
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Thales SA
Original Assignee
Thomson CSF SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Thomson CSF SA filed Critical Thomson CSF SA
Priority to FR8513088A priority Critical patent/FR2586709B1/fr
Priority to US06/900,483 priority patent/US4818962A/en
Priority to DE8686401931T priority patent/DE3671647D1/de
Priority to EP86401931A priority patent/EP0216685B1/fr
Publication of FR2586709A1 publication Critical patent/FR2586709A1/fr
Application granted granted Critical
Publication of FR2586709B1 publication Critical patent/FR2586709B1/fr
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01P—WAVEGUIDES; RESONATORS, LINES, OR OTHER DEVICES OF THE WAVEGUIDE TYPE
    • H01P11/00—Apparatus or processes specially adapted for manufacturing waveguides or resonators, lines, or other devices of the waveguide type
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C23F1/02—Local etching
    • C23F1/04—Chemical milling
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/49—Method of mechanical manufacture
    • Y10T29/49002—Electrical device making
    • Y10T29/49016—Antenna or wave energy "plumbing" making

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • ing And Chemical Polishing (AREA)
FR8513088A 1985-09-03 1985-09-03 Procede de gravure selective et guide d'onde obtenu par ledit procede Expired FR2586709B1 (fr)

Priority Applications (4)

Application Number Priority Date Filing Date Title
FR8513088A FR2586709B1 (fr) 1985-09-03 1985-09-03 Procede de gravure selective et guide d'onde obtenu par ledit procede
US06/900,483 US4818962A (en) 1985-09-03 1986-08-26 Waveguide obtained by selective etching method
DE8686401931T DE3671647D1 (de) 1985-09-03 1986-09-02 Verfahren zum selektiven aetzen und durch dieses verfahren erhaltener wellenleiter.
EP86401931A EP0216685B1 (fr) 1985-09-03 1986-09-02 Procédé de gravure sélective et guide d'onde obtenu par ledit procédé

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR8513088A FR2586709B1 (fr) 1985-09-03 1985-09-03 Procede de gravure selective et guide d'onde obtenu par ledit procede

Publications (2)

Publication Number Publication Date
FR2586709A1 FR2586709A1 (fr) 1987-03-06
FR2586709B1 true FR2586709B1 (fr) 1987-11-20

Family

ID=9322594

Family Applications (1)

Application Number Title Priority Date Filing Date
FR8513088A Expired FR2586709B1 (fr) 1985-09-03 1985-09-03 Procede de gravure selective et guide d'onde obtenu par ledit procede

Country Status (4)

Country Link
US (1) US4818962A (fr)
EP (1) EP0216685B1 (fr)
DE (1) DE3671647D1 (fr)
FR (1) FR2586709B1 (fr)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5733283A (en) * 1996-06-05 1998-03-31 Malis; Jerry L. Flat loop bipolar electrode tips for electrosurgical instrument
US5894373A (en) * 1997-09-24 1999-04-13 Jaesent Inc. Method for fabricating mirror systems
US6363605B1 (en) * 1999-11-03 2002-04-02 Yi-Chi Shih Method for fabricating a plurality of non-symmetrical waveguide probes
US6947651B2 (en) * 2001-05-10 2005-09-20 Georgia Tech Research Corporation Optical waveguides formed from nano air-gap inter-layer dielectric materials and methods of fabrication thereof
US8299878B2 (en) * 2009-09-30 2012-10-30 Alcatel Lucent RF circuit substrate comprised of guide portions made of photocurable layers and including a protruding surface features
JP6265833B2 (ja) * 2014-05-27 2018-01-24 三菱電機株式会社 導波管スロットアンテナ、送受信器、導波管スロットアンテナの製造方法及び送受信器の製造方法

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US1434798A (en) * 1922-01-16 1922-11-07 Earl E Stafford Process of making nickel-plated halftone plates
US1915084A (en) * 1932-03-31 1933-06-20 P H Murphy Co Process of making sheets
US2488510A (en) * 1947-05-06 1949-11-15 Lewin Gunnar Erik Werner Scarecrow
US3013267A (en) * 1957-03-20 1961-12-12 Rotman Walter Trough waveguide slow wave antennas and transmission lines
US3287191A (en) * 1963-07-23 1966-11-22 Photo Engravers Res Inc Etching of printed circuit components
US3508108A (en) * 1967-01-16 1970-04-21 Varian Associates Comb-shaped ceramic supports for helix derived slow wave circuits
GB1372849A (en) * 1972-01-12 1974-11-06 Pembroke Packaging Ltd Moulding
US3956814A (en) * 1975-05-21 1976-05-18 Bliss & Laughlin Ind., Inc. Process of making lids for microelectronic circuit gases
US4206536A (en) * 1978-12-28 1980-06-10 Premier Industrial Corporation Repair panel for automobile pinchwelds and method of using same
US4422465A (en) * 1980-10-17 1983-12-27 Shiseido Company, Ltd. Nail file and method for producing the same
GB2110165B (en) * 1981-12-02 1985-09-11 Kenseido Kabushiki Kaisha Thin metal precision apertured sheets
JPS58151477A (ja) * 1982-03-02 1983-09-08 Nippon Tenshiyashi Kk 金属製研磨体の製造方法

Also Published As

Publication number Publication date
FR2586709A1 (fr) 1987-03-06
US4818962A (en) 1989-04-04
EP0216685A1 (fr) 1987-04-01
EP0216685B1 (fr) 1990-05-30
DE3671647D1 (de) 1990-07-05

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Legal Events

Date Code Title Description
ST Notification of lapse