FR2569000B1 - Procede et appareils pour le controle in situ de l'epaisseur de couches ultraminces deposees par pulverisation ionique - Google Patents

Procede et appareils pour le controle in situ de l'epaisseur de couches ultraminces deposees par pulverisation ionique

Info

Publication number
FR2569000B1
FR2569000B1 FR8412697A FR8412697A FR2569000B1 FR 2569000 B1 FR2569000 B1 FR 2569000B1 FR 8412697 A FR8412697 A FR 8412697A FR 8412697 A FR8412697 A FR 8412697A FR 2569000 B1 FR2569000 B1 FR 2569000B1
Authority
FR
France
Prior art keywords
ultramined
thickness
situ control
ion spraying
layers layered
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR8412697A
Other languages
English (en)
Other versions
FR2569000A1 (fr
Inventor
Claude Sella
Vien Tran-Khanh
Jean Friteau
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Centre National de la Recherche Scientifique CNRS
Original Assignee
Centre National de la Recherche Scientifique CNRS
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Centre National de la Recherche Scientifique CNRS filed Critical Centre National de la Recherche Scientifique CNRS
Priority to FR8412697A priority Critical patent/FR2569000B1/fr
Publication of FR2569000A1 publication Critical patent/FR2569000A1/fr
Application granted granted Critical
Publication of FR2569000B1 publication Critical patent/FR2569000B1/fr
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/542—Controlling the film thickness or evaporation rate
    • C23C14/543—Controlling the film thickness or evaporation rate using measurement on the vapor source
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B15/00—Measuring arrangements characterised by the use of electromagnetic waves or particle radiation, e.g. by the use of microwaves, X-rays, gamma rays or electrons
    • G01B15/02—Measuring arrangements characterised by the use of electromagnetic waves or particle radiation, e.g. by the use of microwaves, X-rays, gamma rays or electrons for measuring thickness

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
FR8412697A 1984-08-10 1984-08-10 Procede et appareils pour le controle in situ de l'epaisseur de couches ultraminces deposees par pulverisation ionique Expired FR2569000B1 (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
FR8412697A FR2569000B1 (fr) 1984-08-10 1984-08-10 Procede et appareils pour le controle in situ de l'epaisseur de couches ultraminces deposees par pulverisation ionique

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR8412697A FR2569000B1 (fr) 1984-08-10 1984-08-10 Procede et appareils pour le controle in situ de l'epaisseur de couches ultraminces deposees par pulverisation ionique

Publications (2)

Publication Number Publication Date
FR2569000A1 FR2569000A1 (fr) 1986-02-14
FR2569000B1 true FR2569000B1 (fr) 1989-01-27

Family

ID=9306981

Family Applications (1)

Application Number Title Priority Date Filing Date
FR8412697A Expired FR2569000B1 (fr) 1984-08-10 1984-08-10 Procede et appareils pour le controle in situ de l'epaisseur de couches ultraminces deposees par pulverisation ionique

Country Status (1)

Country Link
FR (1) FR2569000B1 (fr)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2001040538A1 (fr) * 1999-12-03 2001-06-07 The Regents Of The University Of California Procede et systeme lies au controle de l'epaisseur d'un film depose par evaporation sous vide

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3400066A (en) * 1965-11-15 1968-09-03 Ibm Sputtering processes for depositing thin films of controlled thickness
FR95311E (fr) * 1967-03-24 1970-08-21 Varian Associates Appareil de pulvérisation cathodique pour déposer des pellicules minces sur des surfaces a revetir.
US3654109A (en) * 1968-04-25 1972-04-04 Ibm Apparatus and method for measuring rate in flow processes
US4166783A (en) * 1978-04-17 1979-09-04 Varian Associates, Inc. Deposition rate regulation by computer control of sputtering systems
DE3378508D1 (en) * 1982-09-10 1988-12-22 Nippon Telegraph & Telephone Plasma deposition method and apparatus

Also Published As

Publication number Publication date
FR2569000A1 (fr) 1986-02-14

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Legal Events

Date Code Title Description
ER Errata listed in the french official journal (bopi)

Free format text: 07/86

ST Notification of lapse