FR2532112A1 - Procede pour faire varier en fonction du temps la trajectoire d'un faisceau de particules chargees - Google Patents

Procede pour faire varier en fonction du temps la trajectoire d'un faisceau de particules chargees Download PDF

Info

Publication number
FR2532112A1
FR2532112A1 FR8214204A FR8214204A FR2532112A1 FR 2532112 A1 FR2532112 A1 FR 2532112A1 FR 8214204 A FR8214204 A FR 8214204A FR 8214204 A FR8214204 A FR 8214204A FR 2532112 A1 FR2532112 A1 FR 2532112A1
Authority
FR
France
Prior art keywords
volume
induction
deflection
axis
path
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR8214204A
Other languages
English (en)
French (fr)
Other versions
FR2532112B1 (OSRAM
Inventor
Michel Bruel
Jean-Francois Michaud
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Commissariat a lEnergie Atomique et aux Energies Alternatives CEA
Original Assignee
Commissariat a lEnergie Atomique CEA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Commissariat a lEnergie Atomique CEA filed Critical Commissariat a lEnergie Atomique CEA
Priority to FR8214204A priority Critical patent/FR2532112A1/fr
Priority to US06/517,394 priority patent/US4564763A/en
Priority to EP83401633A priority patent/EP0103502A1/fr
Priority to JP58149516A priority patent/JPS5951446A/ja
Publication of FR2532112A1 publication Critical patent/FR2532112A1/fr
Application granted granted Critical
Publication of FR2532112B1 publication Critical patent/FR2532112B1/fr
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
    • H01J37/1472—Deflecting along given lines
    • H01J37/1474—Scanning means
    • H01J37/1475—Scanning means magnetic
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J3/00—Details of electron-optical or ion-optical arrangements or of ion traps common to two or more basic types of discharge tubes or lamps
    • H01J3/26—Arrangements for deflecting ray or beam
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Particle Accelerators (AREA)
  • Electron Tubes For Measurement (AREA)
FR8214204A 1982-08-17 1982-08-17 Procede pour faire varier en fonction du temps la trajectoire d'un faisceau de particules chargees Granted FR2532112A1 (fr)

Priority Applications (4)

Application Number Priority Date Filing Date Title
FR8214204A FR2532112A1 (fr) 1982-08-17 1982-08-17 Procede pour faire varier en fonction du temps la trajectoire d'un faisceau de particules chargees
US06/517,394 US4564763A (en) 1982-08-17 1983-07-26 Process and apparatus for varying the deflection of the path of a charged particle beam
EP83401633A EP0103502A1 (fr) 1982-08-17 1983-08-09 Procédé pour faire varier en fonction du temps la trajectoire d'un faisceau de particules chargées
JP58149516A JPS5951446A (ja) 1982-08-17 1983-08-16 荷電粒子ビ−ムの軌道の偏向を変化させる方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR8214204A FR2532112A1 (fr) 1982-08-17 1982-08-17 Procede pour faire varier en fonction du temps la trajectoire d'un faisceau de particules chargees

Publications (2)

Publication Number Publication Date
FR2532112A1 true FR2532112A1 (fr) 1984-02-24
FR2532112B1 FR2532112B1 (OSRAM) 1985-04-26

Family

ID=9276907

Family Applications (1)

Application Number Title Priority Date Filing Date
FR8214204A Granted FR2532112A1 (fr) 1982-08-17 1982-08-17 Procede pour faire varier en fonction du temps la trajectoire d'un faisceau de particules chargees

Country Status (4)

Country Link
US (1) US4564763A (OSRAM)
EP (1) EP0103502A1 (OSRAM)
JP (1) JPS5951446A (OSRAM)
FR (1) FR2532112A1 (OSRAM)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62295347A (ja) * 1986-04-09 1987-12-22 イクリプス・イオン・テクノロジ−・インコ−ポレイテツド イオンビ−ム高速平行走査装置
US4980562A (en) * 1986-04-09 1990-12-25 Varian Associates, Inc. Method and apparatus for high efficiency scanning in an ion implanter
US4745281A (en) * 1986-08-25 1988-05-17 Eclipse Ion Technology, Inc. Ion beam fast parallel scanning having dipole magnetic lens with nonuniform field
NL8801208A (nl) * 1988-05-09 1989-12-01 Philips Nv Geladen deeltjes bundel apparaat.
US5053627A (en) * 1990-03-01 1991-10-01 Ibis Technology Corporation Apparatus for ion implantation
US5311028A (en) * 1990-08-29 1994-05-10 Nissin Electric Co., Ltd. System and method for producing oscillating magnetic fields in working gaps useful for irradiating a surface with atomic and molecular ions
US6677599B2 (en) * 2000-03-27 2004-01-13 Applied Materials, Inc. System and method for uniformly implanting a wafer with an ion beam
AU2001270133A1 (en) 2000-06-22 2002-01-02 Proteros, Llc Ion implantation uniformity correction using beam current control
JP4987554B2 (ja) * 2007-04-26 2012-07-25 株式会社ニューフレアテクノロジー 荷電粒子ビーム描画装置及び荷電粒子ビーム描画方法
FR2978600B1 (fr) 2011-07-25 2014-02-07 Soitec Silicon On Insulator Procede et dispositif de fabrication de couche de materiau semi-conducteur

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0002990A1 (fr) * 1977-12-23 1979-07-11 ANVAR Agence Nationale de Valorisation de la Recherche Implanteur d'ions à fort courant comprenant des plaques de déflexion électrostatique et des moyens de refocalisation magnétique

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3021445A (en) * 1959-07-24 1962-02-13 Bbc Brown Boveri & Cie Electron lens
FR2043973A5 (OSRAM) * 1969-05-05 1971-02-19 Thomson Csf
US3671737A (en) * 1969-05-07 1972-06-20 Bell & Howell Co Method for focusing a double focusing mass spectrometer
SU693474A1 (ru) * 1976-09-27 1979-10-25 Предприятие П/Я М-5174 Магнитостатическа линза

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0002990A1 (fr) * 1977-12-23 1979-07-11 ANVAR Agence Nationale de Valorisation de la Recherche Implanteur d'ions à fort courant comprenant des plaques de déflexion électrostatique et des moyens de refocalisation magnétique

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
IBM TECHNICAL DISCLOSURE BULLETIN, vol. 19, no. 9, février 1977 (ARMONK, N.Y., US) J.R. WINNARD: "Ion-beam scanning by magnetic means", pages 3411-3412 *
NUCLEAR INSTRUMENTS AND METHODS, vol. 189, no. 1, octobre 1981 (AMSTERDAM, NL) P.R. HANLEY: "Electromagnetic scanningsystems", pages 227-237 *

Also Published As

Publication number Publication date
JPS5951446A (ja) 1984-03-24
US4564763A (en) 1986-01-14
FR2532112B1 (OSRAM) 1985-04-26
EP0103502A1 (fr) 1984-03-21

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