FR2489007B1 - Sensibilisateurs de la classe des bisquinones et compositions photoreactives les contenant - Google Patents

Sensibilisateurs de la classe des bisquinones et compositions photoreactives les contenant

Info

Publication number
FR2489007B1
FR2489007B1 FR8115849A FR8115849A FR2489007B1 FR 2489007 B1 FR2489007 B1 FR 2489007B1 FR 8115849 A FR8115849 A FR 8115849A FR 8115849 A FR8115849 A FR 8115849A FR 2489007 B1 FR2489007 B1 FR 2489007B1
Authority
FR
France
Prior art keywords
bisquinone
sensitizers
class
compositions containing
containing same
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR8115849A
Other languages
English (en)
French (fr)
Other versions
FR2489007A1 (fr
Inventor
Robert Curtis Daly
Danny Ray Thompson
Samir Yacoub Farid
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Eastman Kodak Co
Original Assignee
Eastman Kodak Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Eastman Kodak Co filed Critical Eastman Kodak Co
Publication of FR2489007A1 publication Critical patent/FR2489007A1/fr
Application granted granted Critical
Publication of FR2489007B1 publication Critical patent/FR2489007B1/fr
Expired legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031Organic compounds not covered by group G03F7/029
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055Radiation sensitive composition or product or process of making
    • Y10S430/114Initiator containing
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055Radiation sensitive composition or product or process of making
    • Y10S430/114Initiator containing
    • Y10S430/115Cationic or anionic
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055Radiation sensitive composition or product or process of making
    • Y10S430/114Initiator containing
    • Y10S430/116Redox or dye sensitizer
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055Radiation sensitive composition or product or process of making
    • Y10S430/114Initiator containing
    • Y10S430/117Free radical

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Polymerisation Methods In General (AREA)
FR8115849A 1980-08-21 1981-08-18 Sensibilisateurs de la classe des bisquinones et compositions photoreactives les contenant Expired FR2489007B1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US06/180,211 US4302527A (en) 1980-08-21 1980-08-21 Photoreactive compositions comprising a light sensitive compound and another compound with reactive site

Publications (2)

Publication Number Publication Date
FR2489007A1 FR2489007A1 (fr) 1982-02-26
FR2489007B1 true FR2489007B1 (fr) 1987-09-04

Family

ID=22659631

Family Applications (1)

Application Number Title Priority Date Filing Date
FR8115849A Expired FR2489007B1 (fr) 1980-08-21 1981-08-18 Sensibilisateurs de la classe des bisquinones et compositions photoreactives les contenant

Country Status (7)

Country Link
US (1) US4302527A (de)
JP (1) JPS5772137A (de)
BE (1) BE890044A (de)
CA (1) CA1154029A (de)
DE (1) DE3131949A1 (de)
FR (1) FR2489007B1 (de)
GB (1) GB2082183B (de)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4422972A (en) * 1980-08-21 1983-12-27 Eastman Kodak Company Novel light-sensitive compounds and photoreactable compositions comprising same
DE3934363A1 (de) * 1989-10-14 1991-04-25 Rheinmetall Gmbh Vorrichtung zur erzeugung von referenzimpulsen
US5597890A (en) * 1993-11-01 1997-01-28 Research Corporation Technologies, Inc. Conjugated polymer exciplexes and applications thereof

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2670286A (en) * 1951-01-20 1954-02-23 Eastman Kodak Co Photosensitization of polymeric cinnamic acid esters
US2875047A (en) * 1955-01-19 1959-02-24 Oster Gerald Photopolymerization with the formation of coherent plastic masses
NL132290C (de) * 1959-09-11
DE1772271B1 (de) * 1967-04-26 1971-06-09 Time Inc Lichtvernetzbare,ein lineares Polyamid enthaltende Gemische
US4035189A (en) * 1972-02-25 1977-07-12 Hitachi Chemical Company, Ltd. Image forming curable resin compositions
US3748132A (en) 1972-03-24 1973-07-24 Eastman Kodak Co Photopolymerizable compositions and elements and uses thereof
CH604208A5 (de) 1974-06-11 1978-08-31 Ciba Geigy Ag
US4084970A (en) * 1974-08-19 1978-04-18 Rca Corporation Organic volume phase holographic recording media using sucrose benzoate
US4046577A (en) * 1975-06-09 1977-09-06 The Richardson Company Photoreactive compositions comprising polymers containing alkoxyaromatic glyoxy groups
US4012302A (en) * 1976-02-17 1977-03-15 Eastman Kodak Company Photocurable compositions containing s-aryl arylcarbothioic acid esters as photoinitiators
US4040923A (en) * 1976-06-03 1977-08-09 Eastman Kodak Company Photopolymerizable polymeric compositions containing halogen containing aromatic ketones

Also Published As

Publication number Publication date
FR2489007A1 (fr) 1982-02-26
JPS5772137A (en) 1982-05-06
BE890044A (fr) 1982-02-22
GB2082183A (en) 1982-03-03
GB2082183B (en) 1984-08-08
US4302527A (en) 1981-11-24
DE3131949A1 (de) 1982-04-15
CA1154029A (en) 1983-09-20

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Legal Events

Date Code Title Description
ST Notification of lapse