FR2480448B1 - - Google Patents

Info

Publication number
FR2480448B1
FR2480448B1 FR8007972A FR8007972A FR2480448B1 FR 2480448 B1 FR2480448 B1 FR 2480448B1 FR 8007972 A FR8007972 A FR 8007972A FR 8007972 A FR8007972 A FR 8007972A FR 2480448 B1 FR2480448 B1 FR 2480448B1
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR8007972A
Other languages
French (fr)
Other versions
FR2480448A1 (fr
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
INST KHIM AKADEMII NAUK SS
Original Assignee
INST KHIM AKADEMII NAUK SS
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by INST KHIM AKADEMII NAUK SS filed Critical INST KHIM AKADEMII NAUK SS
Priority to FR8007972A priority Critical patent/FR2480448A1/fr
Publication of FR2480448A1 publication Critical patent/FR2480448A1/fr
Application granted granted Critical
Publication of FR2480448B1 publication Critical patent/FR2480448B1/fr
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement

Landscapes

  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
FR8007972A 1980-04-09 1980-04-09 Photo- et electron-resist Granted FR2480448A1 (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
FR8007972A FR2480448A1 (fr) 1980-04-09 1980-04-09 Photo- et electron-resist

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR8007972A FR2480448A1 (fr) 1980-04-09 1980-04-09 Photo- et electron-resist

Publications (2)

Publication Number Publication Date
FR2480448A1 FR2480448A1 (fr) 1981-10-16
FR2480448B1 true FR2480448B1 (enExample) 1985-03-22

Family

ID=9240685

Family Applications (1)

Application Number Title Priority Date Filing Date
FR8007972A Granted FR2480448A1 (fr) 1980-04-09 1980-04-09 Photo- et electron-resist

Country Status (1)

Country Link
FR (1) FR2480448A1 (enExample)

Also Published As

Publication number Publication date
FR2480448A1 (fr) 1981-10-16

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Legal Events

Date Code Title Description
ST Notification of lapse