FR2473559A1 - Appareil pour le placage electrolytique d'un materiau en bande sans dispersion de courant - Google Patents

Appareil pour le placage electrolytique d'un materiau en bande sans dispersion de courant Download PDF

Info

Publication number
FR2473559A1
FR2473559A1 FR8100327A FR8100327A FR2473559A1 FR 2473559 A1 FR2473559 A1 FR 2473559A1 FR 8100327 A FR8100327 A FR 8100327A FR 8100327 A FR8100327 A FR 8100327A FR 2473559 A1 FR2473559 A1 FR 2473559A1
Authority
FR
France
Prior art keywords
conductive strip
solution
cathode
sealing
insoluble anode
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR8100327A
Other languages
English (en)
French (fr)
Other versions
FR2473559B1 (OSRAM
Inventor
Glenn R Schaer
Tasuku Touyama
Tatsuo Wada
Teruaki Yamamoto
Keisuke Honda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Koito Manufacturing Co Ltd
Original Assignee
Koito Manufacturing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Koito Manufacturing Co Ltd filed Critical Koito Manufacturing Co Ltd
Publication of FR2473559A1 publication Critical patent/FR2473559A1/fr
Application granted granted Critical
Publication of FR2473559B1 publication Critical patent/FR2473559B1/fr
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/08—Electroplating with moving electrolyte e.g. jet electroplating
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D7/00—Electroplating characterised by the article coated
    • C25D7/06—Wires; Strips; Foils
    • C25D7/0614—Strips or foils
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
    • H05K3/20—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern by affixing prefabricated conductor pattern
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/22—Secondary treatment of printed circuits
    • H05K3/24—Reinforcing of the conductive pattern
    • H05K3/241—Reinforcing of the conductive pattern characterised by the electroplating method; means therefor, e.g. baths or apparatus

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating Methods And Accessories (AREA)
FR8100327A 1980-01-12 1981-01-09 Appareil pour le placage electrolytique d'un materiau en bande sans dispersion de courant Granted FR2473559A1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP55002242A JPS5841358B2 (ja) 1980-01-12 1980-01-12 メツキ装置

Publications (2)

Publication Number Publication Date
FR2473559A1 true FR2473559A1 (fr) 1981-07-17
FR2473559B1 FR2473559B1 (OSRAM) 1983-02-11

Family

ID=11523880

Family Applications (1)

Application Number Title Priority Date Filing Date
FR8100327A Granted FR2473559A1 (fr) 1980-01-12 1981-01-09 Appareil pour le placage electrolytique d'un materiau en bande sans dispersion de courant

Country Status (5)

Country Link
US (1) US4323441A (OSRAM)
JP (1) JPS5841358B2 (OSRAM)
DE (1) DE3100634C2 (OSRAM)
FR (1) FR2473559A1 (OSRAM)
GB (1) GB2067223B (OSRAM)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58107498A (ja) * 1981-12-18 1983-06-27 Fuji Photo Film Co Ltd 帯状金属板の電解処理方法および装置
JPS59211597A (ja) * 1983-05-14 1984-11-30 Kawasaki Steel Corp 合金めつき鋼板の製造方法および装置
JPS63140100A (ja) * 1986-12-02 1988-06-11 Kawasaki Steel Corp 電解処理槽
DE3864850D1 (de) * 1987-02-13 1991-10-24 Centre Rech Metallurgique Anlage zur kontinuierlichen herstellung einer sehr duennen metallfolie durch elektrolytische abscheidung.
US4871435A (en) * 1988-10-14 1989-10-03 Charles Denofrio Electroplating apparatus
US4915796A (en) * 1988-10-14 1990-04-10 Charles Denofrio Electroplating process
US5344538A (en) * 1993-01-11 1994-09-06 Gould Inc. Thin plate anode
FR2725215B1 (fr) * 1994-09-29 1996-11-22 Lorraine Laminage Cellule d'electrodeposition en continu d'alliages metalliques
US20040200061A1 (en) * 2003-04-11 2004-10-14 Coleman James P. Conductive pattern and method of making
US7930815B2 (en) 2003-04-11 2011-04-26 Avery Dennison Corporation Conductive pattern and method of making
US20060037865A1 (en) * 2004-08-19 2006-02-23 Rucker Michael H Methods and apparatus for fabricating gas turbine engines
US20090078579A1 (en) * 2007-09-20 2009-03-26 Weibezahn Karl S Systems And Methods For Electroplating Embossed Features On Substrates
EP2729603A1 (en) 2011-07-07 2014-05-14 NV Bekaert SA Distribution plate in electrolyte bath
DE102020107907B4 (de) * 2020-03-23 2023-10-26 Jacob Zimmermann Vorrichtung zur elektrochemischen Herstellung dünner Folien und Verfahren zur elektrochemischen Herstellung dünner Folien

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2244423A (en) * 1938-06-28 1941-06-03 Hanson Van Winkle Munning Co Apparatus for strip plating
US4119516A (en) * 1976-10-16 1978-10-10 Koito Manufacturing Company Limited Continuous electroplating apparatus

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4030999A (en) * 1975-10-06 1977-06-21 National Semiconductor Corporation Stripe on strip plating apparatus

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2244423A (en) * 1938-06-28 1941-06-03 Hanson Van Winkle Munning Co Apparatus for strip plating
US4119516A (en) * 1976-10-16 1978-10-10 Koito Manufacturing Company Limited Continuous electroplating apparatus

Also Published As

Publication number Publication date
DE3100634A1 (de) 1982-02-04
JPS5841358B2 (ja) 1983-09-12
GB2067223A (en) 1981-07-22
JPS56102597A (en) 1981-08-17
FR2473559B1 (OSRAM) 1983-02-11
GB2067223B (en) 1983-06-02
US4323441A (en) 1982-04-06
DE3100634C2 (de) 1984-11-22

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