FR2463946B1 - - Google Patents

Info

Publication number
FR2463946B1
FR2463946B1 FR7920858A FR7920858A FR2463946B1 FR 2463946 B1 FR2463946 B1 FR 2463946B1 FR 7920858 A FR7920858 A FR 7920858A FR 7920858 A FR7920858 A FR 7920858A FR 2463946 B1 FR2463946 B1 FR 2463946B1
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR7920858A
Other languages
French (fr)
Other versions
FR2463946A1 (fr
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Laboratoires dElectronique Philips SAS
Original Assignee
Laboratoires dElectronique et de Physique Appliquee
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Laboratoires dElectronique et de Physique Appliquee filed Critical Laboratoires dElectronique et de Physique Appliquee
Priority to FR7920858A priority Critical patent/FR2463946A1/fr
Publication of FR2463946A1 publication Critical patent/FR2463946A1/fr
Application granted granted Critical
Publication of FR2463946B1 publication Critical patent/FR2463946B1/fr
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/50Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
FR7920858A 1979-08-17 1979-08-17 Procede de realisation simultanee de plusieurs masques complementaires ou identiques a haute definition Granted FR2463946A1 (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
FR7920858A FR2463946A1 (fr) 1979-08-17 1979-08-17 Procede de realisation simultanee de plusieurs masques complementaires ou identiques a haute definition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR7920858A FR2463946A1 (fr) 1979-08-17 1979-08-17 Procede de realisation simultanee de plusieurs masques complementaires ou identiques a haute definition

Publications (2)

Publication Number Publication Date
FR2463946A1 FR2463946A1 (fr) 1981-02-27
FR2463946B1 true FR2463946B1 (show.php) 1981-08-28

Family

ID=9228909

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7920858A Granted FR2463946A1 (fr) 1979-08-17 1979-08-17 Procede de realisation simultanee de plusieurs masques complementaires ou identiques a haute definition

Country Status (1)

Country Link
FR (1) FR2463946A1 (show.php)

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1546592A1 (de) * 1965-03-30 1970-10-08 Telefunken Patent Verfahren zum doppelseitigen Aufbringen von Mustern auf Koerper,vorzugsweise Halbleiterkoerper
JPS6032173B2 (ja) * 1974-12-28 1985-07-26 富士写真フイルム株式会社 画像形成法

Also Published As

Publication number Publication date
FR2463946A1 (fr) 1981-02-27

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Legal Events

Date Code Title Description
ST Notification of lapse