FR2456339A1 - POLYMERIZATION OF POLYAMIC ACIDS OR THEIR SALTS BY THE ACTION OF ULTRAVIOLET - Google Patents

POLYMERIZATION OF POLYAMIC ACIDS OR THEIR SALTS BY THE ACTION OF ULTRAVIOLET

Info

Publication number
FR2456339A1
FR2456339A1 FR8010372A FR8010372A FR2456339A1 FR 2456339 A1 FR2456339 A1 FR 2456339A1 FR 8010372 A FR8010372 A FR 8010372A FR 8010372 A FR8010372 A FR 8010372A FR 2456339 A1 FR2456339 A1 FR 2456339A1
Authority
FR
France
Prior art keywords
polymerization
film
ultraviolet
salts
action
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR8010372A
Other languages
French (fr)
Other versions
FR2456339B1 (en
Inventor
Rama P Samudrala
Robert R Rohloff
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
3M Co
Original Assignee
Minnesota Mining and Manufacturing Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US06/038,061 external-priority patent/US4242437A/en
Priority claimed from US06/120,710 external-priority patent/US4331705A/en
Application filed by Minnesota Mining and Manufacturing Co filed Critical Minnesota Mining and Manufacturing Co
Publication of FR2456339A1 publication Critical patent/FR2456339A1/en
Application granted granted Critical
Publication of FR2456339B1 publication Critical patent/FR2456339B1/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0387—Polyamides or polyimides

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)

Abstract

L'INVENTION CONCERNE L'INDUSTRIE DES POLYMERES. ON POLYMERISE UNE PELLICULE D'ACIDE POLYAMIQUE, OBTENU PAR REACTION D'UN DIANHYDRIDE ORGANIQUE AVEC UNE DIAMINE ORGANIQUE, EN POLYIMIDE CORRESPONDANT, SANS APPLICATION EXTERNE DE CHALEUR, PAR EXPOSITION DE LA PELLICULE AU RAYONNEMENT ULTRAVIOLET, LA PELLICULE POUVANT EVENTUELLEMENT CONTENIR UN PHOTOINITIATEUR. APPLICATION A LA REPRODUCTION D'IMAGE PAR IRRADIATION ET POLYMERISATION SELECTIVE A TRAVERS UN MASQUE, AVEC ELIMINATION DES PORTIONS NON POLYMERISEES DE LA PELLICULE ET FORMATION D'UNE IMAGE DE POLYIMIDE.THE INVENTION CONCERNS THE POLYMER INDUSTRY. A POLYAMIC ACID FILM, OBTAINED BY REACTION OF AN ORGANIC DIANHYDRIDE WITH AN ORGANIC DIAMINE, IN THE CORRESPONDING POLYIMIDE, WITHOUT EXTERNAL APPLICATION OF HEAT, IS POLYMERIZED BY EXPOSURE OF THE FILM TO ULTRAVIOLE RADIATION, THE PHOTOGRAPHY CONTENENT A POUVENTO. APPLICATION TO IMAGE REPRODUCTION BY IRRADIATION AND SELECTIVE POLYMERIZATION THROUGH A MASK, WITH THE REMOVAL OF UNPOLYMERIZED PORTIONS OF THE FILM AND FORMATION OF A POLYIMIDE IMAGE.

FR8010372A 1979-05-11 1980-05-09 POLYMERIZATION OF POLYAMIC ACIDS OR THEIR SALTS BY THE ACTION OF ULTRAVIOLET Expired FR2456339B1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US3806079A 1979-05-11 1979-05-11
US06/038,061 US4242437A (en) 1979-05-11 1979-05-11 Photosensitized polyamic acids curable by exposure to actinic radiation
US06/120,710 US4331705A (en) 1979-05-11 1980-02-11 Curing of polyamic acids or salts thereof by ultraviolet exposure

Publications (2)

Publication Number Publication Date
FR2456339A1 true FR2456339A1 (en) 1980-12-05
FR2456339B1 FR2456339B1 (en) 1986-11-28

Family

ID=27365331

Family Applications (1)

Application Number Title Priority Date Filing Date
FR8010372A Expired FR2456339B1 (en) 1979-05-11 1980-05-09 POLYMERIZATION OF POLYAMIC ACIDS OR THEIR SALTS BY THE ACTION OF ULTRAVIOLET

Country Status (6)

Country Link
AU (1) AU534941B2 (en)
BR (1) BR8002860A (en)
DE (1) DE3018069A1 (en)
FR (1) FR2456339B1 (en)
GB (2) GB2053941B (en)
IT (1) IT1144060B (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2496111A1 (en) * 1980-12-17 1982-06-18 Hitachi Ltd POLYMERIC COMPOSITION SENSITIVE TO LIGHT OR RADIATION, USE THEREOF FOR FORMING RELIEFED DRAWINGS, AND COMPOUNDS IN THIS COMPOSITION
EP0092524A2 (en) * 1982-04-21 1983-10-26 Ciba-Geigy Ag Radiation-sensible coating composition and its use
EP0134752A1 (en) * 1983-05-18 1985-03-20 Ciba-Geigy Ag Layered material and its use
EP0315216A2 (en) * 1983-05-18 1989-05-10 Ciba-Geigy Ag Polyimides, process for their preparation and their use

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4696890A (en) * 1985-04-11 1987-09-29 Ciba-Geigy Corporation Processes for preparing protective coatings and relief structures
EP0200680A3 (en) * 1985-04-11 1988-10-05 Ciba-Geigy Ag Coated material and its use
US7274854B2 (en) 2002-06-27 2007-09-25 Pirelli & C. S.P.A. Polyimide optical waveguides and method for the preparation thereof

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1316976A (en) * 1969-07-22 1973-05-16 Western Electric Co Photoresists and methods of preparing photoresists
GB1463286A (en) * 1974-04-10 1977-02-02 Du Pont Short wavelength ultraviolet irradiation treatment of polymeric surfaces
US4115231A (en) * 1975-12-19 1978-09-19 Ciba-Geigy Corporation Crosslinkable mixtures of oligomers or polymers and diamines
FR2409535A1 (en) * 1977-11-17 1979-06-15 Asahi Chemical Ind HEAT-RESISTANT "PHOTORESIST" COMPOSITION AND METHOD FOR PREPARING THE SAME
WO1980000706A1 (en) * 1978-09-29 1980-04-17 Hitachi Ltd Light-sensitive polymer composition

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1316976A (en) * 1969-07-22 1973-05-16 Western Electric Co Photoresists and methods of preparing photoresists
GB1463286A (en) * 1974-04-10 1977-02-02 Du Pont Short wavelength ultraviolet irradiation treatment of polymeric surfaces
US4115231A (en) * 1975-12-19 1978-09-19 Ciba-Geigy Corporation Crosslinkable mixtures of oligomers or polymers and diamines
FR2409535A1 (en) * 1977-11-17 1979-06-15 Asahi Chemical Ind HEAT-RESISTANT "PHOTORESIST" COMPOSITION AND METHOD FOR PREPARING THE SAME
WO1980000706A1 (en) * 1978-09-29 1980-04-17 Hitachi Ltd Light-sensitive polymer composition

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
POLYMER ENGINEERING AND SCIENCE, vol. 11, no. 1, septembre 1971 *
SIEMENS FORSCH. - u. ENTWICKL. - BER., vol. 5, no. 4, 1976, Springer-Verlag, Berlin (DE) *

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2496111A1 (en) * 1980-12-17 1982-06-18 Hitachi Ltd POLYMERIC COMPOSITION SENSITIVE TO LIGHT OR RADIATION, USE THEREOF FOR FORMING RELIEFED DRAWINGS, AND COMPOUNDS IN THIS COMPOSITION
EP0092524A2 (en) * 1982-04-21 1983-10-26 Ciba-Geigy Ag Radiation-sensible coating composition and its use
EP0092524A3 (en) * 1982-04-21 1985-05-29 Ciba-Geigy Ag Radiation-sensible coating composition and its use
EP0134752A1 (en) * 1983-05-18 1985-03-20 Ciba-Geigy Ag Layered material and its use
EP0315216A2 (en) * 1983-05-18 1989-05-10 Ciba-Geigy Ag Polyimides, process for their preparation and their use
EP0315216A3 (en) * 1983-05-18 1991-02-06 Ciba-Geigy Ag Polyimides, process for their preparation and their use

Also Published As

Publication number Publication date
DE3018069A1 (en) 1980-11-20
IT1144060B (en) 1986-10-29
GB2053941B (en) 1983-11-16
GB2120799B (en) 1984-05-23
BR8002860A (en) 1980-12-23
AU534941B2 (en) 1984-02-23
AU5824980A (en) 1980-11-13
GB2053941A (en) 1981-02-11
GB8302448D0 (en) 1983-03-02
IT8048637A0 (en) 1980-05-09
GB2120799A (en) 1983-12-07
FR2456339B1 (en) 1986-11-28

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Legal Events

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