FR2415653B3 - - Google Patents
Info
- Publication number
- FR2415653B3 FR2415653B3 FR7902220A FR7902220A FR2415653B3 FR 2415653 B3 FR2415653 B3 FR 2415653B3 FR 7902220 A FR7902220 A FR 7902220A FR 7902220 A FR7902220 A FR 7902220A FR 2415653 B3 FR2415653 B3 FR 2415653B3
- Authority
- FR
- France
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/016—Diazonium salts or compounds
- G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
- G03F7/0212—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the diazo resins or the polymeric diazonium compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S522/00—Synthetic resins or natural rubbers -- part of the class 520 series
- Y10S522/904—Monomer or polymer contains initiating group
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Paints Or Removers (AREA)
- Inks, Pencil-Leads, Or Crayons (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US05/873,383 US4186069A (en) | 1978-01-30 | 1978-01-30 | Photopolymerizable latex systems |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| FR2415653A1 FR2415653A1 (fr) | 1979-08-24 |
| FR2415653B3 true FR2415653B3 (US20080293856A1-20081127-C00150.png) | 1982-02-05 |
Family
ID=25361535
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| FR7902220A Granted FR2415653A1 (fr) | 1978-01-30 | 1979-01-29 | Composition de revetement photosensible a base de latex et son application au revetement d'un substrat |
Country Status (6)
Families Citing this family (39)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS55527A (en) * | 1978-06-16 | 1980-01-05 | Fuji Photo Film Co Ltd | Photosensitive planographic plate |
| DE2834059A1 (de) * | 1978-08-03 | 1980-02-14 | Hoechst Ag | Lichtempfindliches kopiermaterial und verfahren zu seiner herstellung |
| JPS58140737A (ja) * | 1982-02-15 | 1983-08-20 | Toyobo Co Ltd | 感光性樹脂組成物 |
| US4542088A (en) * | 1982-03-18 | 1985-09-17 | Konishiroku Photo Industry Co., Ltd. | Photopolymerizable compositions and image-forming materials using said compositions |
| US4668604A (en) * | 1982-04-22 | 1987-05-26 | E.I. Du Pont De Nemours And Company | Positive-working photosensitive elements containing crosslinked beads and process of use |
| US4551415A (en) * | 1982-04-22 | 1985-11-05 | E. I. Du Pont De Nemours And Company | Photosensitive coatings containing crosslinked beads |
| US4601970A (en) * | 1982-04-22 | 1986-07-22 | E. I. Du Pont De Nemours And Company | Dry photosensitive film containing crosslinked beads |
| DE3328019A1 (de) * | 1982-09-21 | 1984-03-22 | Polychrome Corp., 10702 Yonkers, N.Y. | Mit wasser entwickelbare druckplatte |
| JPS5988732A (ja) * | 1982-11-13 | 1984-05-22 | Nippon Paint Co Ltd | 感光性樹脂組成物 |
| US4511640A (en) * | 1983-08-25 | 1985-04-16 | American Hoechst Corporation | Aqueous developable diazo lithographic printing plates with admixture of polyvinyl acetate and styrene maleic acid ester copolymer |
| US4539285A (en) * | 1984-03-14 | 1985-09-03 | American Hoechst Corporation | Photosensitive negative diazo composition with two acrylic polymers for photolithography |
| US4614701A (en) * | 1984-09-28 | 1986-09-30 | Sekisui Fine Chemical Co., Ltd. | Photocurable diazo or azide composition with acrylic copolymer having hydroxy and amino groups on separate acrylic monomer units |
| JPS61162501A (ja) * | 1985-01-10 | 1986-07-23 | Nippon Paint Co Ltd | 高エネルギ−線硬化樹脂組成物 |
| GB2213487B (en) * | 1987-12-08 | 1992-01-08 | Kansai Paint Co Ltd | Method of forming a cured coating film |
| JP2660000B2 (ja) * | 1988-06-17 | 1997-09-30 | 理想科学工業株式会社 | 孔版印刷用紫外線硬化型インク |
| US5219705A (en) * | 1988-07-04 | 1993-06-15 | Fuji Photo Film Co., Ltd. | Lithographic printing plate precursor of direct image type |
| US5045435A (en) * | 1988-11-25 | 1991-09-03 | Armstrong World Industries, Inc. | Water-borne, alkali-developable, photoresist coating compositions and their preparation |
| NZ237919A (en) * | 1990-04-26 | 1994-09-27 | Grace W R & Co | Photocurable element comprising photocurable base layer and a photocurable printing layer which comprises two incompatible elastomeric polymers and a photopolymerisable monomer, base layer comprising elastomer, monomer and photoinitiator; relief printing plates |
| KR100187942B1 (ko) * | 1990-06-27 | 1999-06-01 | 배트 이안 지 | 영상 형성 방법 |
| GB9105561D0 (en) * | 1991-03-15 | 1991-05-01 | Coates Brothers Plc | Image formation |
| JPH07325399A (ja) * | 1994-05-30 | 1995-12-12 | Shinsei:Kk | 感光乳剤 |
| US5512607A (en) * | 1995-06-06 | 1996-04-30 | W. R. Grace & Co.-Conn. | Unsaturated epoxy ester with quaternary ammonium and phosphate groups |
| WO1996041240A1 (en) * | 1995-06-07 | 1996-12-19 | W.R. Grace & Co.-Conn. | Water photoresist emulsions and methods of preparation thereof |
| EP0811878A1 (en) * | 1996-06-06 | 1997-12-10 | Agfa-Gevaert N.V. | A diazo based imaging element having increased sensitivity |
| US5688627A (en) * | 1996-07-02 | 1997-11-18 | Precision Lithograining Corp. | Light sensitive diazonium compounds having both bisulfate and zincate parts, method of making the compounds and compositions utilizing them |
| US5811220A (en) * | 1996-10-10 | 1998-09-22 | Polaroid Corporation | On-press lithographic development methodology facilitated by the use of a disperse hydrophilic microgel |
| US6315916B1 (en) | 2000-05-08 | 2001-11-13 | Pisces-Print Image Sciences, Inc. | Chemical imaging of a lithographic printing plate |
| US20040154489A1 (en) * | 2000-05-08 | 2004-08-12 | Deutsch Albert S. | Chemical imaging of a lithographic printing plate |
| US6691618B2 (en) | 2000-05-08 | 2004-02-17 | Pisces-Print Imaging Sciences, Inc. | Chemical imaging of a lithographic printing plate |
| EP2548739B1 (en) * | 2000-06-02 | 2015-12-16 | Fujifilm Corporation | Lithographic printing plate precursor |
| US6352805B1 (en) | 2000-09-25 | 2002-03-05 | Eastman Kodak Company | Photocrosslinkable latex protective overcoat for imaging elements |
| US6395459B1 (en) | 2000-09-29 | 2002-05-28 | Eastman Kodak Company | Method of forming a protective overcoat for imaged elements and related articles |
| JP2004163904A (ja) * | 2002-09-30 | 2004-06-10 | Rohm & Haas Electronic Materials Llc | 改善された光開始剤 |
| US7323290B2 (en) * | 2002-09-30 | 2008-01-29 | Eternal Technology Corporation | Dry film photoresist |
| JP2004151691A (ja) * | 2002-09-30 | 2004-05-27 | Rohm & Haas Electronic Materials Llc | 改良フォトレジスト |
| US7148265B2 (en) * | 2002-09-30 | 2006-12-12 | Rohm And Haas Electronic Materials Llc | Functional polymer |
| US20040224259A1 (en) * | 2002-12-12 | 2004-11-11 | Shipley Company, L.L.C. | Functionalized polymer |
| AT502764B1 (de) * | 2005-09-12 | 2010-11-15 | Semperit Ag Holding | Mischung und verfahren zur herstellung eines vernetzten elastomers sowie vorrichtung zur herstellung eines tauchartikels |
| US8399533B2 (en) * | 2010-11-15 | 2013-03-19 | Eastman Kodak Company | Photocurable compositions containing N-oxyazinium salt photoinitiators |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3898143A (en) * | 1971-06-11 | 1975-08-05 | Union Carbide Corp | Process for cocrosslinking water soluble polymers and products thereof |
| US3905815A (en) * | 1971-12-17 | 1975-09-16 | Minnesota Mining & Mfg | Photopolymerizable sheet material with diazo resin layer |
| JPS4938987A (US20080293856A1-20081127-C00150.png) * | 1972-08-18 | 1974-04-11 | ||
| US3926642A (en) * | 1972-11-09 | 1975-12-16 | Hercules Inc | Photopolymer lithographic plate element |
| JPS568645B2 (US20080293856A1-20081127-C00150.png) * | 1974-09-05 | 1981-02-25 | ||
| JPS51120804A (en) * | 1975-04-14 | 1976-10-22 | Dainippon Printing Co Ltd | Plate for lithographic printing |
-
1978
- 1978-01-30 US US05/873,383 patent/US4186069A/en not_active Expired - Lifetime
-
1979
- 1979-01-29 CA CA320,410A patent/CA1114974A/en not_active Expired
- 1979-01-29 FR FR7902220A patent/FR2415653A1/fr active Granted
- 1979-01-29 GB GB7902985A patent/GB2013918B/en not_active Expired
- 1979-01-30 DE DE19792903454 patent/DE2903454A1/de not_active Withdrawn
- 1979-01-30 JP JP960379A patent/JPS54117539A/ja active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| JPS54117539A (en) | 1979-09-12 |
| US4186069A (en) | 1980-01-29 |
| GB2013918A (en) | 1979-08-15 |
| FR2415653A1 (fr) | 1979-08-24 |
| CA1114974A (en) | 1981-12-22 |
| DE2903454A1 (de) | 1979-08-02 |
| GB2013918B (en) | 1983-01-12 |
