FR2411897B2 - - Google Patents

Info

Publication number
FR2411897B2
FR2411897B2 FR7737465A FR7737465A FR2411897B2 FR 2411897 B2 FR2411897 B2 FR 2411897B2 FR 7737465 A FR7737465 A FR 7737465A FR 7737465 A FR7737465 A FR 7737465A FR 2411897 B2 FR2411897 B2 FR 2411897B2
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR7737465A
Other languages
French (fr)
Other versions
FR2411897A2 (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Alsthom Atlantique SA
Original Assignee
Alsthom Atlantique SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Alsthom Atlantique SA filed Critical Alsthom Atlantique SA
Priority to FR7737465A priority Critical patent/FR2411897A2/en
Publication of FR2411897A2 publication Critical patent/FR2411897A2/en
Application granted granted Critical
Publication of FR2411897B2 publication Critical patent/FR2411897B2/fr
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/505—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges
    • C23C16/509—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges using internal electrodes
    • C23C16/5096—Flat-bed apparatus
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/24—Deposition of silicon only
FR7737465A 1977-12-13 1977-12-13 RF sputtering of thin semiconductor films - using polarisation impedance and gas pressure gradient to give high deposition rate Granted FR2411897A2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
FR7737465A FR2411897A2 (en) 1977-12-13 1977-12-13 RF sputtering of thin semiconductor films - using polarisation impedance and gas pressure gradient to give high deposition rate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR7737465A FR2411897A2 (en) 1977-12-13 1977-12-13 RF sputtering of thin semiconductor films - using polarisation impedance and gas pressure gradient to give high deposition rate

Publications (2)

Publication Number Publication Date
FR2411897A2 FR2411897A2 (en) 1979-07-13
FR2411897B2 true FR2411897B2 (en) 1980-08-22

Family

ID=9198769

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7737465A Granted FR2411897A2 (en) 1977-12-13 1977-12-13 RF sputtering of thin semiconductor films - using polarisation impedance and gas pressure gradient to give high deposition rate

Country Status (1)

Country Link
FR (1) FR2411897A2 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0346055B1 (en) * 1988-06-06 1995-04-19 Research Development Corporation Of Japan Method for causing plasma reaction under atmospheric pressure
JPH08259386A (en) * 1995-03-20 1996-10-08 Matsushita Electric Ind Co Ltd Production of oxide thin film and chemical deposition apparatus therefor

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CH322266A (en) * 1954-10-01 1957-06-15 Ohio Commw Eng Co Process for plating a metal on an electrically conductive object, apparatus for carrying out this process and plated object obtained by this process
US4066037A (en) * 1975-12-17 1978-01-03 Lfe Corportion Apparatus for depositing dielectric films using a glow discharge

Also Published As

Publication number Publication date
FR2411897A2 (en) 1979-07-13

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