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BASF SE
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BASF SE
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Application filed by BASF SEfiledCriticalBASF SE
Publication of FR2376439A1publicationCriticalpatent/FR2376439A1/fr
Application grantedgrantedCritical
Publication of FR2376439B1publicationCriticalpatent/FR2376439B1/fr
G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
G03F7/004—Photosensitive materials
G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
Landscapes
Physics & Mathematics
(AREA)
Spectroscopy & Molecular Physics
(AREA)
General Physics & Mathematics
(AREA)
Macromonomer-Based Addition Polymer
(AREA)
Polymerisation Methods In General
(AREA)
Compositions Of Macromolecular Compounds
(AREA)
Photosensitive Polymer And Photoresist Processing
(AREA)
FR7739872A1976-12-311977-12-30Matiere photopolymerisable pour la realisation de formes d'impression en relief
GrantedFR2376439A1
(fr)