FR2368145A1 - Procede de fabrication d'un dispositif a transfert de charge - Google Patents

Procede de fabrication d'un dispositif a transfert de charge

Info

Publication number
FR2368145A1
FR2368145A1 FR7730922A FR7730922A FR2368145A1 FR 2368145 A1 FR2368145 A1 FR 2368145A1 FR 7730922 A FR7730922 A FR 7730922A FR 7730922 A FR7730922 A FR 7730922A FR 2368145 A1 FR2368145 A1 FR 2368145A1
Authority
FR
France
Prior art keywords
charge transfer
transfer device
conductive layer
manufacturing process
gate electrode
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7730922A
Other languages
English (en)
French (fr)
Other versions
FR2368145B1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sony Corp
Original Assignee
Sony Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sony Corp filed Critical Sony Corp
Publication of FR2368145A1 publication Critical patent/FR2368145A1/fr
Application granted granted Critical
Publication of FR2368145B1 publication Critical patent/FR2368145B1/fr
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D44/00—Charge transfer devices
    • H10D44/01—Manufacture or treatment
    • H10D44/041—Manufacture or treatment having insulated gates
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D44/00—Charge transfer devices
    • H10D44/40—Charge-coupled devices [CCD]
    • H10D44/45—Charge-coupled devices [CCD] having field effect produced by insulated gate electrodes 
    • H10D44/472—Surface-channel CCD
    • H10D44/474—Two-phase CCD
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/10—Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
    • H10D62/17—Semiconductor regions connected to electrodes not carrying current to be rectified, amplified or switched, e.g. channel regions
    • H10D62/213—Channel regions of field-effect devices
    • H10D62/335—Channel regions of field-effect devices of charge-coupled devices

Landscapes

  • Solid State Image Pick-Up Elements (AREA)
FR7730922A 1976-10-14 1977-10-14 Procede de fabrication d'un dispositif a transfert de charge Granted FR2368145A1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP51123189A JPS606101B2 (ja) 1976-10-14 1976-10-14 電荷転送装置の製法

Publications (2)

Publication Number Publication Date
FR2368145A1 true FR2368145A1 (fr) 1978-05-12
FR2368145B1 FR2368145B1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1982-06-04

Family

ID=14854384

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7730922A Granted FR2368145A1 (fr) 1976-10-14 1977-10-14 Procede de fabrication d'un dispositif a transfert de charge

Country Status (7)

Country Link
US (1) US4179793A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
JP (1) JPS606101B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
CA (1) CA1111138A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
DE (1) DE2746335A1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
FR (1) FR2368145A1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
GB (1) GB1578949A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
NL (1) NL188124C (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2427663A1 (fr) * 1978-06-02 1979-12-28 Sony Corp Dispositif a transfert de charges
EP0097837A3 (en) * 1982-06-02 1985-10-23 Nec Corporation Charge transfer device having improved electrodes

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5217771A (en) * 1975-07-31 1977-02-09 Sony Corp Charge transfer device
US4692993A (en) * 1978-12-05 1987-09-15 Clark Marion D Schottky barrier charge coupled device (CCD) manufacture
US4345365A (en) * 1980-10-06 1982-08-24 Ncr Corporation Method for fabricating an integrated circuit
DE3037744A1 (de) * 1980-10-06 1982-05-19 Siemens AG, 1000 Berlin und 8000 München Verfahren zum herstellen einer monolithisch integrierten zwei-transistor-speicherzelle in mos-technik
US4360963A (en) * 1981-07-31 1982-11-30 Rca Corporation Method of making CCD imagers with reduced defects
FR2578683B1 (fr) * 1985-03-08 1987-08-28 Thomson Csf Procede de fabrication d'une diode anti-eblouissement associee a un canal en surface, et systeme anti-eblouissement obtenu par ce procede
US4607429A (en) * 1985-03-29 1986-08-26 Rca Corporation Method of making a charge-coupled device image sensor
JP2508668B2 (ja) * 1986-11-10 1996-06-19 ソニー株式会社 電荷転送装置
US4910569A (en) * 1988-08-29 1990-03-20 Eastman Kodak Company Charge-coupled device having improved transfer efficiency
JP2855291B2 (ja) * 1991-03-07 1999-02-10 富士写真フイルム株式会社 固体撮像装置
DE19622276C2 (de) * 1996-06-03 1998-07-09 Siemens Ag Halbleiterstruktur für einen MOS-Transistor und Verfahren zur Herstellung der Halbleiterstruktur

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3873371A (en) * 1972-11-07 1975-03-25 Hughes Aircraft Co Small geometry charge coupled device and process for fabricating same
FR2257145B1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * 1974-01-04 1976-11-26 Commissariat Energie Atomique
US3931674A (en) * 1974-02-08 1976-01-13 Fairchild Camera And Instrument Corporation Self aligned CCD element including two levels of electrodes and method of manufacture therefor
US4035906A (en) * 1975-07-23 1977-07-19 Texas Instruments Incorporated Silicon gate CCD structure
JPS5217771A (en) * 1975-07-31 1977-02-09 Sony Corp Charge transfer device

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2427663A1 (fr) * 1978-06-02 1979-12-28 Sony Corp Dispositif a transfert de charges
EP0097837A3 (en) * 1982-06-02 1985-10-23 Nec Corporation Charge transfer device having improved electrodes

Also Published As

Publication number Publication date
JPS606101B2 (ja) 1985-02-15
DE2746335C2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1989-06-01
NL188124B (nl) 1991-11-01
JPS5347786A (en) 1978-04-28
FR2368145B1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1982-06-04
NL7711263A (nl) 1978-04-18
GB1578949A (en) 1980-11-12
CA1111138A (en) 1981-10-20
DE2746335A1 (de) 1978-04-27
NL188124C (nl) 1992-04-01
US4179793A (en) 1979-12-25

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Legal Events

Date Code Title Description
ST Notification of lapse