FR2365248A1 - INVERTER WITH AN IMPROVED LOAD LINE CHARACTERISTICS - Google Patents
INVERTER WITH AN IMPROVED LOAD LINE CHARACTERISTICSInfo
- Publication number
- FR2365248A1 FR2365248A1 FR7722463A FR7722463A FR2365248A1 FR 2365248 A1 FR2365248 A1 FR 2365248A1 FR 7722463 A FR7722463 A FR 7722463A FR 7722463 A FR7722463 A FR 7722463A FR 2365248 A1 FR2365248 A1 FR 2365248A1
- Authority
- FR
- France
- Prior art keywords
- igfet
- substrate
- source
- inverter
- load
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000758 substrate Substances 0.000 abstract 5
- 230000008033 biological extinction Effects 0.000 abstract 1
- 230000005669 field effect Effects 0.000 abstract 1
- 230000003068 static effect Effects 0.000 abstract 1
- 230000007704 transition Effects 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/04—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body
- H01L27/08—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind
- H01L27/085—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind including field-effect components only
- H01L27/088—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind including field-effect components only the components being field-effect transistors with insulated gate
- H01L27/092—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind including field-effect components only the components being field-effect transistors with insulated gate complementary MIS field-effect transistors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
- H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
- H01L21/82—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/04—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body
- H01L27/08—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind
- H01L27/085—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind including field-effect components only
- H01L27/088—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind including field-effect components only the components being field-effect transistors with insulated gate
- H01L27/0883—Combination of depletion and enhancement field effect transistors
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03K—PULSE TECHNIQUE
- H03K19/00—Logic circuits, i.e. having at least two inputs acting on one output; Inverting circuits
- H03K19/02—Logic circuits, i.e. having at least two inputs acting on one output; Inverting circuits using specified components
- H03K19/08—Logic circuits, i.e. having at least two inputs acting on one output; Inverting circuits using specified components using semiconductor devices
- H03K19/094—Logic circuits, i.e. having at least two inputs acting on one output; Inverting circuits using specified components using semiconductor devices using field-effect transistors
- H03K19/0944—Logic circuits, i.e. having at least two inputs acting on one output; Inverting circuits using specified components using semiconductor devices using field-effect transistors using MOSFET or insulated gate field-effect transistors, i.e. IGFET
- H03K19/0948—Logic circuits, i.e. having at least two inputs acting on one output; Inverting circuits using specified components using semiconductor devices using field-effect transistors using MOSFET or insulated gate field-effect transistors, i.e. IGFET using CMOS or complementary insulated gate field-effect transistors
- H03K19/09482—Logic circuits, i.e. having at least two inputs acting on one output; Inverting circuits using specified components using semiconductor devices using field-effect transistors using MOSFET or insulated gate field-effect transistors, i.e. IGFET using CMOS or complementary insulated gate field-effect transistors using a combination of enhancement and depletion transistors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/04—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body
- H01L27/06—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration
- H01L27/0611—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration integrated circuits having a two-dimensional layout of components without a common active region
- H01L27/0617—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration integrated circuits having a two-dimensional layout of components without a common active region comprising components of the field-effect type
- H01L27/0623—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration integrated circuits having a two-dimensional layout of components without a common active region comprising components of the field-effect type in combination with bipolar transistors
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computing Systems (AREA)
- General Engineering & Computer Science (AREA)
- Mathematical Physics (AREA)
- Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
- Logic Circuits (AREA)
- Semiconductor Integrated Circuits (AREA)
- Electronic Switches (AREA)
Abstract
Circuit inverseur statique à transistor à effet de champ à porte isolée IGFET. Il comprend l'IGFET actif 2 à mode d'enrichissement, et l'IGFET de charge 16 à mode d'appauvrissement Ces deux IGFET sont réalisés dans des parties du substrat 4 et 18 isolées électriquement l'une de l'autre. L'IGFET 2 reçoit le signal d'entrée sur sa porte 14 et a sa source 12 connectée à la masse et son drain 8 au noeud de sortie 10. L'IGFET 16 a sa source 24, sa porte 26 et la partie de substrat 18 où il est réalisé connectées au noeud de sortie tandis que son drain est connecté à un potentiel VDD . La partie du substrat 4 est connectée à un potentiel de substrat. L'augmentation de la tension de polarisation source-substrat du transistor de charge est éliminée pendant la transition d'extinction améliorant la caractéristique de courant de charge de l'inverseur.IGFET Insulated Gate Field Effect Transistor Static Inverter Circuit. It comprises the active IGFET 2 in enrichment mode, and the load IGFET 16 in depletion mode. These two IGFETs are produced in parts of the substrate 4 and 18 which are electrically isolated from one another. IGFET 2 receives the input signal on its gate 14 and has its source 12 connected to ground and its drain 8 to the output node 10. IGFET 16 has its source 24, its gate 26 and the substrate part. 18 where it is made connected to the output node while its drain is connected to a potential VDD. The portion of the substrate 4 is connected to a substrate potential. The increase in the source-substrate bias voltage of the load transistor is eliminated during the extinction transition improving the load current characteristic of the inverter.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US05/723,678 US4072868A (en) | 1976-09-16 | 1976-09-16 | FET inverter with isolated substrate load |
Publications (2)
Publication Number | Publication Date |
---|---|
FR2365248A1 true FR2365248A1 (en) | 1978-04-14 |
FR2365248B1 FR2365248B1 (en) | 1979-03-23 |
Family
ID=24907227
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR7722463A Granted FR2365248A1 (en) | 1976-09-16 | 1977-07-13 | INVERTER WITH AN IMPROVED LOAD LINE CHARACTERISTICS |
Country Status (5)
Country | Link |
---|---|
US (1) | US4072868A (en) |
JP (1) | JPS5336453A (en) |
DE (1) | DE2739586C2 (en) |
FR (1) | FR2365248A1 (en) |
GB (1) | GB1563863A (en) |
Families Citing this family (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4092548A (en) * | 1977-03-15 | 1978-05-30 | International Business Machines Corporation | Substrate bias modulation to improve mosfet circuit performance |
US4205330A (en) * | 1977-04-01 | 1980-05-27 | National Semiconductor Corporation | Method of manufacturing a low voltage n-channel MOSFET device |
JPS5433679A (en) * | 1977-08-22 | 1979-03-12 | Agency Of Ind Science & Technol | Semiconductor intergrated circuit on insulation substrate |
JPS5443551A (en) * | 1977-09-14 | 1979-04-06 | Hitachi Ltd | Monolithic semiconductor integrated circuit |
US4191898A (en) * | 1978-05-01 | 1980-03-04 | Motorola, Inc. | High voltage CMOS circuit |
FR2430092A1 (en) * | 1978-06-29 | 1980-01-25 | Ibm France | METHOD FOR CORRECTING THE VOLTAGE COEFFICIENT OF SEMICONDUCTOR, DIFFUSED OR IMPLANTED RESISTORS AND RESISTORS THUS OBTAINED |
US4321492A (en) * | 1979-10-15 | 1982-03-23 | Rca Corporation | Two input sense circuit |
US4420743A (en) * | 1980-02-11 | 1983-12-13 | Rca Corporation | Voltage comparator using unequal gate width FET's |
JPS56166673A (en) * | 1980-04-25 | 1981-12-21 | Hughes Aircraft Co | Charge transfer type image pickup device |
JPS58108099A (en) * | 1981-12-07 | 1983-06-28 | Fujitsu Ltd | Fuse blowing circuit |
US4675561A (en) * | 1985-11-15 | 1987-06-23 | Precision Monolithics, Inc. | FET output drive circuit with parasitic transistor inhibition |
US4717836A (en) * | 1986-02-04 | 1988-01-05 | Burr-Brown Corporation | CMOS input level shifting circuit with temperature-compensating n-channel field effect transistor structure |
US5253202A (en) * | 1991-02-05 | 1993-10-12 | International Business Machines Corporation | Word line driver circuit for dynamic random access memories |
JP3342730B2 (en) * | 1993-03-17 | 2002-11-11 | 富士通株式会社 | Nonvolatile semiconductor memory device |
US5939899A (en) * | 1997-04-23 | 1999-08-17 | Lucent Technologies Inc. | MOSFET substrate current logic |
US6833297B1 (en) * | 2002-10-04 | 2004-12-21 | Advanced Micro Devices, Inc. | Method for reducing drain induced barrier lowering in a memory device |
US20080265936A1 (en) * | 2007-04-27 | 2008-10-30 | Dsm Solutions, Inc. | Integrated circuit switching device, structure and method of manufacture |
FI20150334A (en) | 2015-01-14 | 2016-07-15 | Artto Mikael Aurola | Improved semiconductor configuration |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2443219A1 (en) * | 1974-09-10 | 1976-03-25 | Siemens Ag | Complementary MOS logic circuit has inverter with two MOSFETs - in drain-drain series and depleted types gate connected to its source |
US3980896A (en) * | 1974-04-10 | 1976-09-14 | Nippondenso Co., Ltd. | Integrated circuit device |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3461361A (en) * | 1966-02-24 | 1969-08-12 | Rca Corp | Complementary mos transistor integrated circuits with inversion layer formed by ionic discharge bombardment |
US3436621A (en) * | 1966-12-16 | 1969-04-01 | Texas Instruments Inc | Linear amplifier utilizing a pair of field effect transistors |
US3585463A (en) * | 1968-11-25 | 1971-06-15 | Gen Telephone & Elect | Complementary enhancement-type mos transistors |
US3925120A (en) * | 1969-10-27 | 1975-12-09 | Hitachi Ltd | A method for manufacturing a semiconductor device having a buried epitaxial layer |
CA945641A (en) * | 1970-04-27 | 1974-04-16 | Tokyo Shibaura Electric Co. | Logic circuit using complementary type insulated gate field effect transistors |
JPS5211199B1 (en) * | 1970-05-27 | 1977-03-29 | ||
US3775693A (en) * | 1971-11-29 | 1973-11-27 | Moskek Co | Mosfet logic inverter for integrated circuits |
JPS48101846A (en) * | 1972-04-03 | 1973-12-21 | ||
US3766637A (en) * | 1972-05-04 | 1973-10-23 | Rca Corp | Method of making mos transistors |
US3865649A (en) * | 1972-10-16 | 1975-02-11 | Harris Intertype Corp | Fabrication of MOS devices and complementary bipolar transistor devices in a monolithic substrate |
US3916430A (en) * | 1973-03-14 | 1975-10-28 | Rca Corp | System for eliminating substrate bias effect in field effect transistor circuits |
US3983572A (en) * | 1973-07-09 | 1976-09-28 | International Business Machines | Semiconductor devices |
US3920481A (en) * | 1974-06-03 | 1975-11-18 | Fairchild Camera Instr Co | Process for fabricating insulated gate field effect transistor structure |
-
1976
- 1976-09-16 US US05/723,678 patent/US4072868A/en not_active Expired - Lifetime
-
1977
- 1977-07-13 FR FR7722463A patent/FR2365248A1/en active Granted
- 1977-08-05 GB GB32956/77A patent/GB1563863A/en not_active Expired
- 1977-08-24 JP JP10068777A patent/JPS5336453A/en active Granted
- 1977-09-02 DE DE2739586A patent/DE2739586C2/en not_active Expired
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3980896A (en) * | 1974-04-10 | 1976-09-14 | Nippondenso Co., Ltd. | Integrated circuit device |
DE2443219A1 (en) * | 1974-09-10 | 1976-03-25 | Siemens Ag | Complementary MOS logic circuit has inverter with two MOSFETs - in drain-drain series and depleted types gate connected to its source |
Also Published As
Publication number | Publication date |
---|---|
JPS5628052B2 (en) | 1981-06-29 |
DE2739586C2 (en) | 1985-02-14 |
US4072868A (en) | 1978-02-07 |
GB1563863A (en) | 1980-04-02 |
DE2739586A1 (en) | 1978-03-23 |
JPS5336453A (en) | 1978-04-04 |
FR2365248B1 (en) | 1979-03-23 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
ST | Notification of lapse |