FR2355315A1 - Procede de realisation de masques photographiques - Google Patents

Procede de realisation de masques photographiques

Info

Publication number
FR2355315A1
FR2355315A1 FR7618601A FR7618601A FR2355315A1 FR 2355315 A1 FR2355315 A1 FR 2355315A1 FR 7618601 A FR7618601 A FR 7618601A FR 7618601 A FR7618601 A FR 7618601A FR 2355315 A1 FR2355315 A1 FR 2355315A1
Authority
FR
France
Prior art keywords
master
assembled
chip
photomask
subcells
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7618601A
Other languages
English (en)
Other versions
FR2355315B1 (fr
Inventor
Daniel Wassong
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Thales SA
Original Assignee
Thomson CSF SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Thomson CSF SA filed Critical Thomson CSF SA
Priority to FR7618601A priority Critical patent/FR2355315A1/fr
Priority to DE19772727190 priority patent/DE2727190A1/de
Priority to JP7195277A priority patent/JPS52155976A/ja
Publication of FR2355315A1 publication Critical patent/FR2355315A1/fr
Application granted granted Critical
Publication of FR2355315B1 publication Critical patent/FR2355315B1/fr
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70425—Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning
    • G03F7/70475—Stitching, i.e. connecting image fields to produce a device field, the field occupied by a device such as a memory chip, processor chip, CCD, flat panel display

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)

Abstract

L'invention concerne un procédé de réalisation de masques. Afin de concilier définition et champ des objectifs, on découpe dans le masque des motifs élémentaires dont la répétition par juxtaposition jointive permet de reproduire la totalité du masque, et on en fait un premier dessin à l'échelle maximale compatible avec les dimensions des objectifs utilisés; puis on procède à des réductions photographiques successives, la dernière de celles-ci étant faite - à partir du cliché de la figure 2 - dans une installation dont la plaque est portée par une table mobile dont la position est reglable avec précision. Chacun des éléments m, c, m, III, c, d, m etc. est photographié, les autres étant masqués, autant de fois que nécessaire, la position de la table étant réglée, chaque fois, de manière à obtenir la juxtaposition en question. Application à la fabrication de masques pour plaquettes de semi-conducteur de grandes dimensions (jusqu'à diamétre = 75 mm).
FR7618601A 1976-06-18 1976-06-18 Procede de realisation de masques photographiques Granted FR2355315A1 (fr)

Priority Applications (3)

Application Number Priority Date Filing Date Title
FR7618601A FR2355315A1 (fr) 1976-06-18 1976-06-18 Procede de realisation de masques photographiques
DE19772727190 DE2727190A1 (de) 1976-06-18 1977-06-16 Verfahren zur herstellung von photomasken
JP7195277A JPS52155976A (en) 1976-06-18 1977-06-17 Method of forming mask for integrated circuit pattern

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR7618601A FR2355315A1 (fr) 1976-06-18 1976-06-18 Procede de realisation de masques photographiques

Publications (2)

Publication Number Publication Date
FR2355315A1 true FR2355315A1 (fr) 1978-01-13
FR2355315B1 FR2355315B1 (fr) 1980-04-18

Family

ID=9174599

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7618601A Granted FR2355315A1 (fr) 1976-06-18 1976-06-18 Procede de realisation de masques photographiques

Country Status (3)

Country Link
JP (1) JPS52155976A (fr)
DE (1) DE2727190A1 (fr)
FR (1) FR2355315A1 (fr)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0055620B1 (fr) * 1980-12-29 1985-12-18 Fujitsu Limited Méthode pour la projection des dessins de circuits
DE3138761A1 (de) * 1981-09-29 1983-04-14 Siemens AG, 1000 Berlin und 8000 München Verfahren zur herstellung von ueberlappungsgewichteten interdigitalstrukturen
JPS60218650A (ja) * 1984-04-16 1985-11-01 Canon Inc パタ−ン露光方法
JPH0622192B2 (ja) * 1985-04-25 1994-03-23 キヤノン株式会社 表示パネル製造方法
DE19520819A1 (de) * 1995-05-30 1996-12-05 Deutsche Telekom Ag Verfahren zur Ausnutzung scheibenförmigen Ausgangsmaterials bei der Herstellung optoelektronischer Bauelemente mit Gittern variabler Gitterperiode

Also Published As

Publication number Publication date
DE2727190C3 (fr) 1980-06-12
DE2727190A1 (de) 1977-12-22
DE2727190B2 (fr) 1979-09-20
FR2355315B1 (fr) 1980-04-18
JPS52155976A (en) 1977-12-24

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Legal Events

Date Code Title Description
ST Notification of lapse