FR2337890A1 - Photopolymerisable compsns contg. heterocyclic mercaptan - as adhesion promoter and polymn. accelerator, uses as photoresistors - Google Patents

Photopolymerisable compsns contg. heterocyclic mercaptan - as adhesion promoter and polymn. accelerator, uses as photoresistors

Info

Publication number
FR2337890A1
FR2337890A1 FR7600531A FR7600531A FR2337890A1 FR 2337890 A1 FR2337890 A1 FR 2337890A1 FR 7600531 A FR7600531 A FR 7600531A FR 7600531 A FR7600531 A FR 7600531A FR 2337890 A1 FR2337890 A1 FR 2337890A1
Authority
FR
France
Prior art keywords
photopolymerisable
polymn
photoresistors
accelerator
adhesion promoter
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
FR7600531A
Other languages
French (fr)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
DYMACHEM CORP
Original Assignee
DYMACHEM CORP
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to ZA00757987A priority Critical patent/ZA757987B/en
Application filed by DYMACHEM CORP filed Critical DYMACHEM CORP
Priority to FR7600531A priority patent/FR2337890A1/en
Priority to NL7600253A priority patent/NL7600253A/en
Priority to BE163451A priority patent/BE837489A/en
Priority to JP485676A priority patent/JPS53702A/en
Priority to DE19762602409 priority patent/DE2602409A1/en
Publication of FR2337890A1 publication Critical patent/FR2337890A1/en
Withdrawn legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/085—Photosensitive compositions characterised by adhesion-promoting non-macromolecular additives
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F291/00—Macromolecular compounds obtained by polymerising monomers on to macromolecular compounds according to more than one of the groups C08F251/00 - C08F289/00
    • C08F291/18—Macromolecular compounds obtained by polymerising monomers on to macromolecular compounds according to more than one of the groups C08F251/00 - C08F289/00 on to irradiated or oxidised macromolecules
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/36—Sulfur-, selenium-, or tellurium-containing compounds
    • C08K5/45—Heterocyclic compounds having sulfur in the ring
    • C08K5/46—Heterocyclic compounds having sulfur in the ring with oxygen or nitrogen in the ring
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/38—Improvement of the adhesion between the insulating substrate and the metal
    • H05K3/389—Improvement of the adhesion between the insulating substrate and the metal by the use of a coupling agent, e.g. silane

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Engineering & Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing Of Printed Wiring (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Graft Or Block Polymers (AREA)
  • Polymerisation Methods In General (AREA)
  • Dental Preparations (AREA)

Abstract

The compsn. comprises an unsatd. ethylenic compsn. with >=2 polymerisable ethylenic terminal radicals and capable of forming a high polymer; a thermoplastic polymer binder; a polymsn. initiator, and a small amount of heterocyclic mercaptan.
FR7600531A 1975-12-23 1976-01-09 Photopolymerisable compsns contg. heterocyclic mercaptan - as adhesion promoter and polymn. accelerator, uses as photoresistors Withdrawn FR2337890A1 (en)

Priority Applications (6)

Application Number Priority Date Filing Date Title
ZA00757987A ZA757987B (en) 1975-12-23 1975-12-23 Adhesion promoters for polymerizable films
FR7600531A FR2337890A1 (en) 1975-12-23 1976-01-09 Photopolymerisable compsns contg. heterocyclic mercaptan - as adhesion promoter and polymn. accelerator, uses as photoresistors
NL7600253A NL7600253A (en) 1975-12-23 1976-01-12 PHOTOPOLYMERIZABLE UNIT.
BE163451A BE837489A (en) 1975-12-23 1976-01-12 ADHESION PROMOTERS FOR POLYMERISABLE FILMS
JP485676A JPS53702A (en) 1975-12-23 1976-01-19 Adhesion promoting agent for polymerized film
DE19762602409 DE2602409A1 (en) 1975-12-23 1976-01-23 PHOTOPOLYMERIZABLE MASS AND THEIR USE

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
ZA00757987A ZA757987B (en) 1975-12-23 1975-12-23 Adhesion promoters for polymerizable films
FR7600531A FR2337890A1 (en) 1975-12-23 1976-01-09 Photopolymerisable compsns contg. heterocyclic mercaptan - as adhesion promoter and polymn. accelerator, uses as photoresistors

Publications (1)

Publication Number Publication Date
FR2337890A1 true FR2337890A1 (en) 1977-08-05

Family

ID=26219236

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7600531A Withdrawn FR2337890A1 (en) 1975-12-23 1976-01-09 Photopolymerisable compsns contg. heterocyclic mercaptan - as adhesion promoter and polymn. accelerator, uses as photoresistors

Country Status (6)

Country Link
JP (1) JPS53702A (en)
BE (1) BE837489A (en)
DE (1) DE2602409A1 (en)
FR (1) FR2337890A1 (en)
NL (1) NL7600253A (en)
ZA (1) ZA757987B (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0107792A1 (en) * 1982-09-27 1984-05-09 Mitsubishi Kasei Corporation Photopolymerizable compositions
EP0155812A2 (en) * 1984-03-16 1985-09-25 Kuraray Co., Ltd. Dental compositions
EP0669793A2 (en) * 1994-02-25 1995-08-30 Hitachi, Ltd. A method for manufacturing printed circuit board
WO2009109391A1 (en) * 2008-03-07 2009-09-11 Atotech Deutschland Gmbh Non-etching non-resist adhesion composition and method of preparing a work piece

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US4268610A (en) * 1979-11-05 1981-05-19 Hercules Incorporated Photoresist formulations
DE3023247C2 (en) * 1980-06-21 1982-09-02 Du Pont de Nemours (Deutschland) GmbH, 4000 Düsseldorf Photosensitive recording material
DE3048490C2 (en) * 1980-12-22 1982-09-02 Du Pont de Nemours (Deutschland) GmbH, 4000 Düsseldorf Photosensitive recording material
JPS60252602A (en) * 1984-05-29 1985-12-13 Mitsui Petrochem Ind Ltd Photosetting composition
JPS61282835A (en) * 1985-06-07 1986-12-13 Sekisui Chem Co Ltd Photosensitive composition
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JPH0235454A (en) * 1988-07-25 1990-02-06 Sekisui Chem Co Ltd Photosensitive resin composition
JPH0820736B2 (en) * 1988-08-04 1996-03-04 富士写真フイルム株式会社 Photopolymerizable composition
JP2596089B2 (en) * 1988-09-21 1997-04-02 日立化成工業株式会社 Photosensitive resin composition and photosensitive resin composition laminate
DE3909003A1 (en) * 1989-03-18 1990-09-27 Basf Ag PHOTOPOLYMERIZABLE LAYER TRANSFER MATERIAL
JPH0351853A (en) * 1989-07-19 1991-03-06 Hitachi Chem Co Ltd Photosensitive resin composition and photosensitive laminate
DE3926708A1 (en) * 1989-08-12 1991-02-14 Basf Ag PHOTOPOLYMERIZABLE LAYER TRANSFER MATERIAL
US5246788A (en) * 1991-11-26 1993-09-21 Minnesota Mining And Manufacturing Company Vinyl chloride and heterocyclic thione functional polyurethane polymer blends and their use in magnetic recording media
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Cited By (9)

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Publication number Priority date Publication date Assignee Title
EP0107792A1 (en) * 1982-09-27 1984-05-09 Mitsubishi Kasei Corporation Photopolymerizable compositions
EP0155812A2 (en) * 1984-03-16 1985-09-25 Kuraray Co., Ltd. Dental compositions
EP0155812A3 (en) * 1984-03-16 1987-07-01 Kuraray Co., Ltd. Dental compositions
US5321053A (en) * 1984-03-16 1994-06-14 Kuraray Co., Ltd. Dental compositions
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ZA757987B (en) 1976-12-29
DE2602409A1 (en) 1977-07-28
JPS53702A (en) 1978-01-06
BE837489A (en) 1976-05-03
NL7600253A (en) 1977-07-14

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