FR2335043B1 - - Google Patents
Info
- Publication number
- FR2335043B1 FR2335043B1 FR7537998A FR7537998A FR2335043B1 FR 2335043 B1 FR2335043 B1 FR 2335043B1 FR 7537998 A FR7537998 A FR 7537998A FR 7537998 A FR7537998 A FR 7537998A FR 2335043 B1 FR2335043 B1 FR 2335043B1
- Authority
- FR
- France
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
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- H10P14/3444—
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/48—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating by irradiation, e.g. photolysis, radiolysis, particle radiation
- C23C16/482—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating by irradiation, e.g. photolysis, radiolysis, particle radiation using incoherent light, UV to IR, e.g. lamps
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- H10P14/2905—
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- H10P14/2917—
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- H10P14/2919—
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- H10P14/2921—
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- H10P14/3411—
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- H10P14/3432—
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- H10P14/3436—
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- H10P14/3442—
Landscapes
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR7537998A FR2335043A1 (fr) | 1975-12-11 | 1975-12-11 | Procede d'obtention, par croissance, de couches epitaxiales de semi-conducteurs et dispositif pour la mise en oeuvre dudit procede |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR7537998A FR2335043A1 (fr) | 1975-12-11 | 1975-12-11 | Procede d'obtention, par croissance, de couches epitaxiales de semi-conducteurs et dispositif pour la mise en oeuvre dudit procede |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| FR2335043A1 FR2335043A1 (fr) | 1977-07-08 |
| FR2335043B1 true FR2335043B1 (OSRAM) | 1978-05-12 |
Family
ID=9163639
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| FR7537998A Granted FR2335043A1 (fr) | 1975-12-11 | 1975-12-11 | Procede d'obtention, par croissance, de couches epitaxiales de semi-conducteurs et dispositif pour la mise en oeuvre dudit procede |
Country Status (1)
| Country | Link |
|---|---|
| FR (1) | FR2335043A1 (OSRAM) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58177469A (ja) * | 1982-04-09 | 1983-10-18 | Fujitsu Ltd | 半導体基板の加熱方法及び加熱装置 |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2359004C3 (de) * | 1972-11-29 | 1983-05-19 | Applied Materials, Inc., 95051 Santa Clara, Calif. | Vorrichtung zur Erwärmung von aus einkristallinem Material bestehenden Substraten |
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1975
- 1975-12-11 FR FR7537998A patent/FR2335043A1/fr active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| FR2335043A1 (fr) | 1977-07-08 |
Similar Documents
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| ST | Notification of lapse |