FR2319396B1 - - Google Patents

Info

Publication number
FR2319396B1
FR2319396B1 FR7623490A FR7623490A FR2319396B1 FR 2319396 B1 FR2319396 B1 FR 2319396B1 FR 7623490 A FR7623490 A FR 7623490A FR 7623490 A FR7623490 A FR 7623490A FR 2319396 B1 FR2319396 B1 FR 2319396B1
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR7623490A
Other languages
French (fr)
Other versions
FR2319396A1 (fr
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Honeywell International Inc
Original Assignee
Allied Chemical Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Allied Chemical Corp filed Critical Allied Chemical Corp
Publication of FR2319396A1 publication Critical patent/FR2319396A1/fr
Application granted granted Critical
Publication of FR2319396B1 publication Critical patent/FR2319396B1/fr
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor
    • G03F7/422—Stripping or agents therefor using liquids only
    • G03F7/426—Stripping or agents therefor using liquids only containing organic halogen compounds; containing organic sulfonic acids or salts thereof; containing sulfoxides

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
FR7623490A 1975-08-01 1976-07-30 Solution a base d'acide arylsulfonique pour l'enlevement de substances polymeres organiques a partir de substrats mineraux Granted FR2319396A1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US60157475A 1975-08-01 1975-08-01

Publications (2)

Publication Number Publication Date
FR2319396A1 FR2319396A1 (fr) 1977-02-25
FR2319396B1 true FR2319396B1 (enrdf_load_stackoverflow) 1980-03-14

Family

ID=24408019

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7623490A Granted FR2319396A1 (fr) 1975-08-01 1976-07-30 Solution a base d'acide arylsulfonique pour l'enlevement de substances polymeres organiques a partir de substrats mineraux

Country Status (6)

Country Link
JP (1) JPS5220101A (enrdf_load_stackoverflow)
CA (1) CA1074219A (enrdf_load_stackoverflow)
DE (1) DE2632949A1 (enrdf_load_stackoverflow)
FR (1) FR2319396A1 (enrdf_load_stackoverflow)
GB (1) GB1551143A (enrdf_load_stackoverflow)
IT (1) IT1125196B (enrdf_load_stackoverflow)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4165295A (en) * 1976-10-04 1979-08-21 Allied Chemical Corporation Organic stripping compositions and method for using same
US4242218A (en) * 1976-11-08 1980-12-30 Allied Chemical Corporation Phenol-free photoresist stripper
US4165294A (en) 1976-11-08 1979-08-21 Allied Chemical Corporation Phenol-free and chlorinated hydrocarbon-free photoresist stripper comprising surfactant and hydrotropic aromatic sulfonic acids
CA1116059A (en) * 1978-05-22 1982-01-12 Allied Corporation Phenol-free and chlorinated hydrocarbon-free photoresist stripper
US4187191A (en) * 1978-07-26 1980-02-05 General Motors Corporation Photoresist stripper with dodecylsulfonic acid and chlorinated solvents
JPH0212154A (ja) * 1988-04-13 1990-01-17 Siemens Ag 金属伝導層上のフオトレジスト層の除去方法
US4971715A (en) * 1988-11-18 1990-11-20 International Business Machines Corporation Phenolic-free stripping composition and use thereof
US8614053B2 (en) * 2009-03-27 2013-12-24 Eastman Chemical Company Processess and compositions for removing substances from substrates

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1419726A (fr) * 1963-10-04 1965-12-03 Kalle Ag Solutions détersives pour formes d'imprimerie planes
US3582401A (en) * 1967-11-15 1971-06-01 Mallinckrodt Chemical Works Photosensitive resist remover compositions and methods

Also Published As

Publication number Publication date
GB1551143A (en) 1979-08-22
FR2319396A1 (fr) 1977-02-25
JPS5220101A (en) 1977-02-15
CA1074219A (en) 1980-03-25
IT1125196B (it) 1986-05-14
DE2632949C2 (enrdf_load_stackoverflow) 1987-11-19
DE2632949A1 (de) 1977-02-17

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Legal Events

Date Code Title Description
CD Change of name or company name
TP Transmission of property
ST Notification of lapse