FR2315168B1 - - Google Patents

Info

Publication number
FR2315168B1
FR2315168B1 FR7519363A FR7519363A FR2315168B1 FR 2315168 B1 FR2315168 B1 FR 2315168B1 FR 7519363 A FR7519363 A FR 7519363A FR 7519363 A FR7519363 A FR 7519363A FR 2315168 B1 FR2315168 B1 FR 2315168B1
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR7519363A
Other languages
French (fr)
Other versions
FR2315168A1 (fr
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Radiotechnique Compelec RTC SA
Original Assignee
Radiotechnique Compelec RTC SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Radiotechnique Compelec RTC SA filed Critical Radiotechnique Compelec RTC SA
Priority to FR7519363A priority Critical patent/FR2315168A1/fr
Publication of FR2315168A1 publication Critical patent/FR2315168A1/fr
Application granted granted Critical
Publication of FR2315168B1 publication Critical patent/FR2315168B1/fr
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F77/00Constructional details of devices covered by this subclass
    • H10F77/10Semiconductor bodies
    • H10F77/16Material structures, e.g. crystalline structures, film structures or crystal plane orientations
    • H10F77/162Non-monocrystalline materials, e.g. semiconductor particles embedded in insulating materials
    • H10F77/164Polycrystalline semiconductors
    • H10F77/1642Polycrystalline semiconductors including only Group IV materials
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B11/00Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method
    • C30B11/008Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method using centrifugal force to the charge
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B29/00Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
    • C30B29/02Elements
    • C30B29/06Silicon
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00Energy generation through renewable energy sources
    • Y02E10/50Photovoltaic [PV] energy
    • Y02E10/546Polycrystalline silicon PV cells

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Photovoltaic Devices (AREA)
FR7519363A 1975-06-20 1975-06-20 Procede de fabrication de corps lamellaires polycristallins notamment semi-conducteurs Granted FR2315168A1 (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
FR7519363A FR2315168A1 (fr) 1975-06-20 1975-06-20 Procede de fabrication de corps lamellaires polycristallins notamment semi-conducteurs

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR7519363A FR2315168A1 (fr) 1975-06-20 1975-06-20 Procede de fabrication de corps lamellaires polycristallins notamment semi-conducteurs

Publications (2)

Publication Number Publication Date
FR2315168A1 FR2315168A1 (fr) 1977-01-14
FR2315168B1 true FR2315168B1 (enrdf_load_stackoverflow) 1978-03-17

Family

ID=9156807

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7519363A Granted FR2315168A1 (fr) 1975-06-20 1975-06-20 Procede de fabrication de corps lamellaires polycristallins notamment semi-conducteurs

Country Status (1)

Country Link
FR (1) FR2315168A1 (enrdf_load_stackoverflow)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AU562656B2 (en) * 1981-04-30 1987-06-18 Hoxan Corp. Fabricating polycrystalline silicon wafers

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1230227B (de) * 1964-11-12 1966-12-08 Consortium Elektrochem Ind Verfahren zur Herstellung von homogenen Koerpern aus Germanium-Silicium-Legierungen

Also Published As

Publication number Publication date
FR2315168A1 (fr) 1977-01-14

Similar Documents

Publication Publication Date Title
JPS555402Y2 (enrdf_load_stackoverflow)
JPS5741048B2 (enrdf_load_stackoverflow)
JPS5637440B2 (enrdf_load_stackoverflow)
JPS5287012U (enrdf_load_stackoverflow)
FR2315168B1 (enrdf_load_stackoverflow)
JPS5249597U (enrdf_load_stackoverflow)
JPS5240094U (enrdf_load_stackoverflow)
JPS5350393Y2 (enrdf_load_stackoverflow)
FR2332712B1 (enrdf_load_stackoverflow)
JPS51149473U (enrdf_load_stackoverflow)
JPS5261025U (enrdf_load_stackoverflow)
CH602379A5 (enrdf_load_stackoverflow)
CH588370A5 (enrdf_load_stackoverflow)
CH605343A5 (enrdf_load_stackoverflow)
CH590465A5 (enrdf_load_stackoverflow)
CH588700A5 (enrdf_load_stackoverflow)
CH605294A5 (enrdf_load_stackoverflow)
CH605234A5 (enrdf_load_stackoverflow)
CH604670A5 (enrdf_load_stackoverflow)
CH604330A5 (enrdf_load_stackoverflow)
CH604323A5 (enrdf_load_stackoverflow)
CH603154A5 (enrdf_load_stackoverflow)
CH603104A5 (enrdf_load_stackoverflow)
CH602844A5 (enrdf_load_stackoverflow)
CH597714A5 (enrdf_load_stackoverflow)

Legal Events

Date Code Title Description
ST Notification of lapse