FR2312799A1 - Nouvelle composition photosensible comprenant des quinones-diazides - Google Patents

Nouvelle composition photosensible comprenant des quinones-diazides

Info

Publication number
FR2312799A1
FR2312799A1 FR7615320A FR7615320A FR2312799A1 FR 2312799 A1 FR2312799 A1 FR 2312799A1 FR 7615320 A FR7615320 A FR 7615320A FR 7615320 A FR7615320 A FR 7615320A FR 2312799 A1 FR2312799 A1 FR 2312799A1
Authority
FR
France
Prior art keywords
diazides
composition including
photosensitive composition
new photosensitive
including quinones
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7615320A
Other languages
English (en)
French (fr)
Other versions
FR2312799B1 (enrdf_load_stackoverflow
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Eastman Kodak Co
Original Assignee
Eastman Kodak Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Eastman Kodak Co filed Critical Eastman Kodak Co
Publication of FR2312799A1 publication Critical patent/FR2312799A1/fr
Application granted granted Critical
Publication of FR2312799B1 publication Critical patent/FR2312799B1/fr
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G8/00—Condensation polymers of aldehydes or ketones with phenols only
    • C08G8/28—Chemically modified polycondensates
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L61/00—Compositions of condensation polymers of aldehydes or ketones; Compositions of derivatives of such polymers
    • C08L61/04—Condensation polymers of aldehydes or ketones with phenols only
    • C08L61/06—Condensation polymers of aldehydes or ketones with phenols only of aldehydes with phenols
    • C08L61/14—Modified phenol-aldehyde condensates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Physics & Mathematics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Phenolic Resins Or Amino Resins (AREA)
  • Materials For Photolithography (AREA)
FR7615320A 1975-05-27 1976-05-21 Nouvelle composition photosensible comprenant des quinones-diazides Granted FR2312799A1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US58084575A 1975-05-27 1975-05-27

Publications (2)

Publication Number Publication Date
FR2312799A1 true FR2312799A1 (fr) 1976-12-24
FR2312799B1 FR2312799B1 (enrdf_load_stackoverflow) 1978-11-17

Family

ID=24322804

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7615320A Granted FR2312799A1 (fr) 1975-05-27 1976-05-21 Nouvelle composition photosensible comprenant des quinones-diazides

Country Status (5)

Country Link
JP (1) JPS51145313A (enrdf_load_stackoverflow)
CA (1) CA1085212A (enrdf_load_stackoverflow)
DE (1) DE2623790C3 (enrdf_load_stackoverflow)
FR (1) FR2312799A1 (enrdf_load_stackoverflow)
GB (1) GB1546633A (enrdf_load_stackoverflow)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0021716A1 (en) * 1979-06-16 1981-01-07 Konica Corporation Condensation product and lithographic printing plates containing said product
EP0109062A1 (en) * 1982-11-10 1984-05-23 Fuji Photo Film Co., Ltd. Photosensitive compositions containing an O-quinonediazide compound
EP0110214A1 (en) * 1982-11-12 1984-06-13 Fuji Photo Film Co., Ltd. Photosensitive composition

Families Citing this family (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58152236A (ja) * 1982-03-05 1983-09-09 Toray Ind Inc 感光性組成物
JPS62123444A (ja) * 1985-08-07 1987-06-04 Japan Synthetic Rubber Co Ltd ポジ型感放射線性樹脂組成物
US4871644A (en) * 1986-10-01 1989-10-03 Ciba-Geigy Corporation Photoresist compositions with a bis-benzotriazole
JP2719912B2 (ja) * 1987-05-07 1998-02-25 コニカ株式会社 感光性平版印刷版
JPS63276047A (ja) * 1987-05-07 1988-11-14 Konica Corp 感光性組成物及び感光性平版印刷版
JP2806474B2 (ja) * 1987-07-28 1998-09-30 三菱化学株式会社 感光性組成物
KR950000482B1 (ko) * 1991-04-30 1995-01-20 가부시키가이샤 도시바 패턴형성용 레지스트
DE69714225T2 (de) 1996-04-23 2003-03-27 Kodak Polychrome Graphics Co. Ltd., Norwalk Wärmeempfindliche Zusammensetzung zur Herstellung eines lithographischen Druckformvorläufers
US6117610A (en) 1997-08-08 2000-09-12 Kodak Polychrome Graphics Llc Infrared-sensitive diazonaphthoquinone imaging composition and element containing non-basic IR absorbing material and methods of use
US5705322A (en) * 1996-09-30 1998-01-06 Eastman Kodak Company Method of providing an image using a negative-working infrared photosensitive element
US5705308A (en) * 1996-09-30 1998-01-06 Eastman Kodak Company Infrared-sensitive, negative-working diazonaphthoquinone imaging composition and element
US5858626A (en) * 1996-09-30 1999-01-12 Kodak Polychrome Graphics Method of forming a positive image through infrared exposure utilizing diazonaphthoquinone imaging composition
US6063544A (en) 1997-03-21 2000-05-16 Kodak Polychrome Graphics Llc Positive-working printing plate and method of providing a positive image therefrom using laser imaging
US6090532A (en) 1997-03-21 2000-07-18 Kodak Polychrome Graphics Llc Positive-working infrared radiation sensitive composition and printing plate and imaging method
WO1999001796A2 (en) 1997-07-05 1999-01-14 Kodak Polychrome Graphics Llc Pattern-forming methods
US6060217A (en) 1997-09-02 2000-05-09 Kodak Polychrome Graphics Llc Thermal lithographic printing plates
EP0909657B1 (en) 1997-10-17 2003-06-18 Fuji Photo Film Co., Ltd A positive type photosensitive image-forming material for an infrared laser
US6534238B1 (en) 1998-06-23 2003-03-18 Kodak Polychrome Graphics, Llc Thermal digital lithographic printing plate
US6352811B1 (en) 1998-06-23 2002-03-05 Kodak Polychrome Graphics Llc Thermal digital lithographic printing plate
US6451505B1 (en) 2000-08-04 2002-09-17 Kodak Polychrome Graphics Llc Imageable element and method of preparation thereof
US6790582B1 (en) 2003-04-01 2004-09-14 Clariant Finance Bvi Limited Photoresist compositions
US6905809B2 (en) 2003-04-01 2005-06-14 Clariant Finance (Bvi) Limited Photoresist compositions
US6939663B2 (en) 2003-07-08 2005-09-06 Kodak Polychrome Graphics Llc Sulfated phenolic resins and printing plate precursors comprising sulfated phenolic resins

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE500222A (enrdf_load_stackoverflow) * 1949-07-23
BE506677A (enrdf_load_stackoverflow) * 1950-10-31
US2990281A (en) * 1956-12-17 1961-06-27 Monsanto Chemicals Photosensitive resinous compositions and photographic elements
FR2221754A1 (en) * 1973-03-16 1974-10-11 Ibm Photoresist mask prodn. using carboxylic acid in lacquer - for short exposure and good adhesion to substrate

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0021716A1 (en) * 1979-06-16 1981-01-07 Konica Corporation Condensation product and lithographic printing plates containing said product
EP0109062A1 (en) * 1982-11-10 1984-05-23 Fuji Photo Film Co., Ltd. Photosensitive compositions containing an O-quinonediazide compound
EP0110214A1 (en) * 1982-11-12 1984-06-13 Fuji Photo Film Co., Ltd. Photosensitive composition

Also Published As

Publication number Publication date
FR2312799B1 (enrdf_load_stackoverflow) 1978-11-17
JPS51145313A (en) 1976-12-14
GB1546633A (en) 1979-05-31
DE2623790A1 (de) 1976-12-23
DE2623790C3 (de) 1984-10-25
JPS5760620B2 (enrdf_load_stackoverflow) 1982-12-20
CA1085212A (en) 1980-09-09
DE2623790B2 (de) 1978-03-09

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Legal Events

Date Code Title Description
ST Notification of lapse