FR2312112A1 - METHOD AND APPARATUS FOR DOPING SEMICONDUCTOR BODIES BY A TEMPERATURE GRADIENT ZONE FUSION METHOD - Google Patents
METHOD AND APPARATUS FOR DOPING SEMICONDUCTOR BODIES BY A TEMPERATURE GRADIENT ZONE FUSION METHODInfo
- Publication number
- FR2312112A1 FR2312112A1 FR7615029A FR7615029A FR2312112A1 FR 2312112 A1 FR2312112 A1 FR 2312112A1 FR 7615029 A FR7615029 A FR 7615029A FR 7615029 A FR7615029 A FR 7615029A FR 2312112 A1 FR2312112 A1 FR 2312112A1
- Authority
- FR
- France
- Prior art keywords
- temperature gradient
- semiconductor bodies
- doping semiconductor
- gradient zone
- zone fusion
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 238000000034 method Methods 0.000 title 1
- 238000007500 overflow downdraw method Methods 0.000 title 1
- 239000004065 semiconductor Substances 0.000 title 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B13/00—Single-crystal growth by zone-melting; Refining by zone-melting
- C30B13/06—Single-crystal growth by zone-melting; Refining by zone-melting the molten zone not extending over the whole cross-section
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B13/00—Single-crystal growth by zone-melting; Refining by zone-melting
- C30B13/08—Single-crystal growth by zone-melting; Refining by zone-melting adding crystallising materials or reactants forming it in situ to the molten zone
- C30B13/10—Single-crystal growth by zone-melting; Refining by zone-melting adding crystallising materials or reactants forming it in situ to the molten zone with addition of doping materials
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/24—Alloying of impurity materials, e.g. doping materials, electrode materials, with a semiconductor body
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Metallurgy (AREA)
- Materials Engineering (AREA)
- Crystallography & Structural Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Power Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Computer Hardware Design (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US05/578,807 US4001047A (en) | 1975-05-19 | 1975-05-19 | Temperature gradient zone melting utilizing infrared radiation |
US05/578,736 US4041278A (en) | 1975-05-19 | 1975-05-19 | Heating apparatus for temperature gradient zone melting |
Publications (1)
Publication Number | Publication Date |
---|---|
FR2312112A1 true FR2312112A1 (en) | 1976-12-17 |
Family
ID=27077566
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR7615029A Withdrawn FR2312112A1 (en) | 1975-05-19 | 1976-05-19 | METHOD AND APPARATUS FOR DOPING SEMICONDUCTOR BODIES BY A TEMPERATURE GRADIENT ZONE FUSION METHOD |
Country Status (6)
Country | Link |
---|---|
JP (1) | JPS51140803A (en) |
DE (1) | DE2621418C2 (en) |
FR (1) | FR2312112A1 (en) |
GB (1) | GB1545113A (en) |
NL (1) | NL7605260A (en) |
SE (1) | SE416597B (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0032920A1 (en) * | 1979-07-31 | 1981-08-05 | Western Electric Co | Photo-induced temperature gradient zone melting. |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2638270C2 (en) * | 1976-08-25 | 1983-01-27 | Wacker-Chemitronic Gesellschaft für Elektronik-Grundstoffe mbH, 8263 Burghausen | Process for the production of large, self-supporting plates made of silicon |
JPS5939711A (en) * | 1982-08-26 | 1984-03-05 | Ushio Inc | Method for epitaxially growing amorphous silicon or polycrystalline silicon on wafer |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2450901A1 (en) * | 1973-10-30 | 1975-05-07 | Gen Electric | SEMI-CONDUCTOR DEVICE WITH A LARGE ASPECT RATIO HAVING PN TRANSITIONS AND METHOD OF MANUFACTURING |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2054828B2 (en) * | 1970-11-07 | 1974-06-27 | Applied Materials Technology, Inc. Santa Clara, Calif. (V.St.A.) | Device and method for vapor deposition on substrates |
US3904442A (en) * | 1973-10-30 | 1975-09-09 | Gen Electric | Method of making isolation grids in bodies of semiconductor material |
-
1976
- 1976-05-14 DE DE2621418A patent/DE2621418C2/en not_active Expired
- 1976-05-17 NL NL7605260A patent/NL7605260A/en not_active Application Discontinuation
- 1976-05-18 GB GB20471/76A patent/GB1545113A/en not_active Expired
- 1976-05-19 FR FR7615029A patent/FR2312112A1/en not_active Withdrawn
- 1976-05-19 SE SE7605678A patent/SE416597B/en unknown
- 1976-05-19 JP JP51056778A patent/JPS51140803A/en active Pending
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2450901A1 (en) * | 1973-10-30 | 1975-05-07 | Gen Electric | SEMI-CONDUCTOR DEVICE WITH A LARGE ASPECT RATIO HAVING PN TRANSITIONS AND METHOD OF MANUFACTURING |
Non-Patent Citations (2)
Title |
---|
NV931/68 * |
NV931/72 * |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0032920A1 (en) * | 1979-07-31 | 1981-08-05 | Western Electric Co | Photo-induced temperature gradient zone melting. |
EP0032920A4 (en) * | 1979-07-31 | 1984-05-29 | Western Electric Co | Photo-induced temperature gradient zone melting. |
Also Published As
Publication number | Publication date |
---|---|
GB1545113A (en) | 1979-05-02 |
SE7605678L (en) | 1976-11-20 |
DE2621418C2 (en) | 1981-12-17 |
SE416597B (en) | 1981-01-19 |
DE2621418A1 (en) | 1976-12-09 |
JPS51140803A (en) | 1976-12-04 |
NL7605260A (en) | 1976-11-23 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
FR2279486A1 (en) | METHOD AND APPARATUS FOR FORMING METAL PARTS | |
FR2301288A1 (en) | PROCESS P | |
BE771005A (en) | METHOD AND APPARATUS FOR REMOVING POLLUTANT MATERIALS FROM GAS CURRENTS | |
FR2317634A1 (en) | METHOD AND APPARATUS DESIGNED FOR TRANSFERRING LIQUIDS | |
BE858174A (en) | IMPROVED PROCESS FOR DESULFURING HOT REDUCING GAS | |
BE834148A (en) | METHOD AND APPARATUS FOR MANUFACTURING PIPES | |
BE840165A (en) | METHOD AND APPARATUS FOR THE MANUFACTURE OF HEAT-REFLECTING GLASS | |
BE845697A (en) | SEMICONDUCTOR ZONE MELTING PROCESS WITH DRAFT AND APPARATUS FOR ITS EXECUTION | |
BE778229A (en) | METHOD AND APPARATUS FOR THE MANUFACTURE OF MULTICOLORED DETERGENT BREADS | |
DK135903C (en) | APPARATUS FOR IMPROVING ROADS | |
FR2312002A1 (en) | METHOD FOR THERMAL TREATMENT OF PULVERULENT MATERIAL | |
FR2312112A1 (en) | METHOD AND APPARATUS FOR DOPING SEMICONDUCTOR BODIES BY A TEMPERATURE GRADIENT ZONE FUSION METHOD | |
FR2317005A1 (en) | PROCESS AND APPARATUS FOR FORMING MONOCRISTALLINE LAYERS | |
BE808599A (en) | NEW PYRAZOLODIAZEPINES AND METHOD FOR PREPARING THEM | |
FR2328774A1 (en) | METHOD AND APPARATUS FOR RECOVERING MAGNESIUM | |
FR2275856A1 (en) | RADIO-ISOTOPE HEAT SOURCE AND PROCESS FOR FORMING IT | |
RO69457A (en) | PROCESS FOR PREPARING N- (R-TETRAHYDROFURFURYL) -NOROXYMORPHONE AND N- (S-TETRAHYDROFURFURYL) -NOROXYMORPHONE | |
BE841086A (en) | METHOD AND APPARATUS FOR THE MANUFACTURE OF HEAT-REFLECTING GLASS | |
BE837261A (en) | COMBUSTION PROCESS AND APPARATUS | |
DK145537C (en) | METHOD AND APPARATUS FOR PLANGE GLASS | |
FR2307799A1 (en) | PROCESS FOR PREPARING AROMATIC CYANOETHYLATED AMINES | |
BE848349A (en) | ANTIBIOTICS AND PROCESS FOR PREPARING THEM, | |
FR2283762A1 (en) | PROCESS AND APPARATUS FOR MANUFACTURING TILES | |
FR2301908A1 (en) | PROCESS FOR EL | |
FR2277815A1 (en) | NEW PROCESS FOR THE PREPARATION OF N (DIETHYLAMINOETHYL) 2-METHOXY 4-AMINO 5-CHLOROBENZAMIDE |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
ST | Notification of lapse |