FR2309896B1 - - Google Patents
Info
- Publication number
- FR2309896B1 FR2309896B1 FR7612538A FR7612538A FR2309896B1 FR 2309896 B1 FR2309896 B1 FR 2309896B1 FR 7612538 A FR7612538 A FR 7612538A FR 7612538 A FR7612538 A FR 7612538A FR 2309896 B1 FR2309896 B1 FR 2309896B1
- Authority
- FR
- France
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
- G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
- G03F7/0236—Condensation products of carbonyl compounds and phenolic compounds, e.g. novolak resins
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
- G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US57266275A | 1975-04-29 | 1975-04-29 |
Publications (2)
Publication Number | Publication Date |
---|---|
FR2309896A1 FR2309896A1 (fr) | 1976-11-26 |
FR2309896B1 true FR2309896B1 (it) | 1979-04-20 |
Family
ID=24288819
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR7612538A Granted FR2309896A1 (fr) | 1975-04-29 | 1976-04-28 | Matiere a copier photosensible |
Country Status (4)
Country | Link |
---|---|
BE (1) | BE841190A (it) |
DE (1) | DE2617088A1 (it) |
FR (1) | FR2309896A1 (it) |
GB (1) | GB1546971A (it) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CA1119447A (en) * | 1978-09-06 | 1982-03-09 | John P. Vikesland | Positive-acting photoresist composition containing a crosslinked urethane resin, a cured epoxy resin and a photosensitizer |
DE3023201A1 (de) * | 1980-06-21 | 1982-01-07 | Hoechst Ag, 6000 Frankfurt | Positiv arbeitendes strahlungsempfindliches gemisch |
EP0087262A1 (en) * | 1982-02-22 | 1983-08-31 | Minnesota Mining And Manufacturing Company | Positive acting photosensitive compositions |
DE3445276A1 (de) * | 1984-12-12 | 1986-06-19 | Hoechst Ag, 6230 Frankfurt | Strahlungsempfindliches gemisch, daraus hergestelltes lichtempfindliches aufzeichnungsmaterial und verfahren zur herstellung einer flachdruckform |
US5183722A (en) * | 1989-12-01 | 1993-02-02 | Tosoh Corporation | Positive photosensitive composition for forming lenses containing 1,2-naphthoquinone diazide sulfonate photosensitizer, alkali-soluble resin and thermosetting agent and process for producing the composition |
US6462107B1 (en) | 1997-12-23 | 2002-10-08 | The Texas A&M University System | Photoimageable compositions and films for printed wiring board manufacture |
EP2233288A1 (en) * | 2009-03-23 | 2010-09-29 | Founder Fine Chemical Industry Co., Ltd. | Radiation sensitive composition and method for preparing radiation sensitive composition |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR1538320A (fr) * | 1965-11-02 | 1968-09-06 | Ferrania Spa | Procédé de fabrication de matrices présensibilisées pour l'impression offset |
DE2053363C3 (de) * | 1970-10-30 | 1980-09-18 | Hoechst Ag, 6000 Frankfurt | Lichtempfindliches Gemisch |
AR205345A1 (es) * | 1973-06-20 | 1976-04-30 | Minnesota Mining & Mfg | Composicion organofilica fotosensible y placa litografica preparada con la misma |
-
1976
- 1976-04-17 DE DE19762617088 patent/DE2617088A1/de not_active Withdrawn
- 1976-04-27 BE BE166510A patent/BE841190A/xx not_active IP Right Cessation
- 1976-04-27 GB GB1703676A patent/GB1546971A/en not_active Expired
- 1976-04-28 FR FR7612538A patent/FR2309896A1/fr active Granted
Also Published As
Publication number | Publication date |
---|---|
BE841190A (fr) | 1976-10-27 |
FR2309896A1 (fr) | 1976-11-26 |
DE2617088A1 (de) | 1976-11-11 |
GB1546971A (en) | 1979-06-06 |
Similar Documents
Legal Events
Date | Code | Title | Description |
---|---|---|---|
ST | Notification of lapse |