FR2292244B1 - - Google Patents

Info

Publication number
FR2292244B1
FR2292244B1 FR7535176A FR7535176A FR2292244B1 FR 2292244 B1 FR2292244 B1 FR 2292244B1 FR 7535176 A FR7535176 A FR 7535176A FR 7535176 A FR7535176 A FR 7535176A FR 2292244 B1 FR2292244 B1 FR 2292244B1
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR7535176A
Other languages
French (fr)
Other versions
FR2292244A1 (fr
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Koninklijke Philips NV
Original Assignee
Philips Gloeilampenfabrieken NV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Philips Gloeilampenfabrieken NV filed Critical Philips Gloeilampenfabrieken NV
Publication of FR2292244A1 publication Critical patent/FR2292244A1/fr
Application granted granted Critical
Publication of FR2292244B1 publication Critical patent/FR2292244B1/fr
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/32—Holograms used as optical elements

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Holo Graphy (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
FR7535176A 1974-11-19 1975-11-18 Procede et dispositif pour la realisation de configurations de points image destines aux masques de circuits integres Granted FR2292244A1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19742454750 DE2454750C3 (de) 1974-11-19 1974-11-19 Verfahren und Anordnung zur Herstellung von Bildmustern für Masken integrierter Schaltkreise mittels aberrationsfreier Bildpunkte von Punkthologrammen

Publications (2)

Publication Number Publication Date
FR2292244A1 FR2292244A1 (fr) 1976-06-18
FR2292244B1 true FR2292244B1 (cs) 1979-10-12

Family

ID=5931206

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7535176A Granted FR2292244A1 (fr) 1974-11-19 1975-11-18 Procede et dispositif pour la realisation de configurations de points image destines aux masques de circuits integres

Country Status (4)

Country Link
JP (1) JPS5173880A (cs)
DE (1) DE2454750C3 (cs)
FR (1) FR2292244A1 (cs)
GB (1) GB1532655A (cs)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3175124D1 (en) * 1981-11-04 1986-09-18 Deere John Noise suppression device for a combustion engine, especially for public-works and agricultural engines, and machines equipped with such a device
DE69432092D1 (de) * 1993-05-24 2003-03-13 Holtronic Technologies Plc Lon Vorrichtung und Verfahren zur Veränderung des Massstabs eines gedruckten Musters
GB2293459B (en) * 1994-09-22 1997-10-01 Holtronic Technologies Ltd Method for printing of a pattern of features

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1522525C3 (de) * 1965-12-06 1975-01-16 Siemens Ag, 1000 Berlin Und 8000 Muenchen Verfahren zum Herstellen einer Photolackmaske

Also Published As

Publication number Publication date
JPS5173880A (cs) 1976-06-26
FR2292244A1 (fr) 1976-06-18
DE2454750A1 (de) 1976-05-26
GB1532655A (en) 1978-11-15
DE2454750C3 (de) 1982-03-18
DE2454750B2 (de) 1981-02-26

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Legal Events

Date Code Title Description
ST Notification of lapse