FR2288390A1 - Procede de realisation d'une structure semi-conductrice pour hyperfrequence et composant electronique ainsi obtenu - Google Patents
Procede de realisation d'une structure semi-conductrice pour hyperfrequence et composant electronique ainsi obtenuInfo
- Publication number
- FR2288390A1 FR2288390A1 FR7435143A FR7435143A FR2288390A1 FR 2288390 A1 FR2288390 A1 FR 2288390A1 FR 7435143 A FR7435143 A FR 7435143A FR 7435143 A FR7435143 A FR 7435143A FR 2288390 A1 FR2288390 A1 FR 2288390A1
- Authority
- FR
- France
- Prior art keywords
- hyperfrequency
- semi
- making
- electronic component
- conductive structure
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/26—Bombardment with radiation
- H01L21/263—Bombardment with radiation with high-energy radiation
- H01L21/265—Bombardment with radiation with high-energy radiation producing ion implantation
- H01L21/2654—Bombardment with radiation with high-energy radiation producing ion implantation in AIIIBV compounds
- H01L21/2656—Bombardment with radiation with high-energy radiation producing ion implantation in AIIIBV compounds characterised by the implantation of both electrically active and inactive species in the same semiconductor region to be doped
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/26—Bombardment with radiation
- H01L21/263—Bombardment with radiation with high-energy radiation
- H01L21/265—Bombardment with radiation with high-energy radiation producing ion implantation
- H01L21/2654—Bombardment with radiation with high-energy radiation producing ion implantation in AIIIBV compounds
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/26—Bombardment with radiation
- H01L21/263—Bombardment with radiation with high-energy radiation
- H01L21/265—Bombardment with radiation with high-energy radiation producing ion implantation
- H01L21/2654—Bombardment with radiation with high-energy radiation producing ion implantation in AIIIBV compounds
- H01L21/26546—Bombardment with radiation with high-energy radiation producing ion implantation in AIIIBV compounds of electrically active species
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/86—Types of semiconductor device ; Multistep manufacturing processes therefor controllable only by variation of the electric current supplied, or only the electric potential applied, to one or more of the electrodes carrying the current to be rectified, amplified, oscillated or switched
- H01L29/861—Diodes
- H01L29/868—PIN diodes
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR7435143A FR2288390A1 (fr) | 1974-10-18 | 1974-10-18 | Procede de realisation d'une structure semi-conductrice pour hyperfrequence et composant electronique ainsi obtenu |
US05/622,455 US4045252A (en) | 1974-10-18 | 1975-10-15 | Method of manufacturing a semiconductor structure for microwave operation, including a very thin insulating or weakly doped layer |
GB42824/75A GB1524709A (en) | 1974-10-18 | 1975-10-17 | Method of manufacturing a semiconductor structure for microwave operation including a thin insulating or weakly doped layer |
DE19752546673 DE2546673A1 (de) | 1974-10-18 | 1975-10-17 | Verfahren zur herstellung einer halbleiterstruktur |
JP50125219A JPS5166772A (fr) | 1974-10-18 | 1975-10-17 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR7435143A FR2288390A1 (fr) | 1974-10-18 | 1974-10-18 | Procede de realisation d'une structure semi-conductrice pour hyperfrequence et composant electronique ainsi obtenu |
Publications (2)
Publication Number | Publication Date |
---|---|
FR2288390A1 true FR2288390A1 (fr) | 1976-05-14 |
FR2288390B1 FR2288390B1 (fr) | 1978-07-13 |
Family
ID=9144265
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR7435143A Granted FR2288390A1 (fr) | 1974-10-18 | 1974-10-18 | Procede de realisation d'une structure semi-conductrice pour hyperfrequence et composant electronique ainsi obtenu |
Country Status (5)
Country | Link |
---|---|
US (1) | US4045252A (fr) |
JP (1) | JPS5166772A (fr) |
DE (1) | DE2546673A1 (fr) |
FR (1) | FR2288390A1 (fr) |
GB (1) | GB1524709A (fr) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0103138A2 (fr) * | 1982-08-11 | 1984-03-21 | Hitachi, Ltd. | Diode redresseuse semi-conductrice |
EP0122598A2 (fr) * | 1983-04-13 | 1984-10-24 | Hitachi, Ltd. | Diode rapide |
CH673352A5 (fr) * | 1987-03-30 | 1990-02-28 | Bbc Brown Boveri & Cie | |
EP2996152A1 (fr) * | 2014-09-15 | 2016-03-16 | ABB Technology AG | Diode de puissance à haute fréquence et sa méthode de manufacture |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4326211A (en) * | 1977-09-01 | 1982-04-20 | U.S. Philips Corporation | N+PP-PP-P+ Avalanche photodiode |
DE3276979D1 (en) * | 1981-05-06 | 1987-09-17 | Univ Illinois | Method of forming wide bandgap region within multilayer semiconductors |
US4954864A (en) * | 1988-12-13 | 1990-09-04 | The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration | Millimeter-wave monolithic diode-grid frequency multiplier |
FR2953062B1 (fr) * | 2009-11-24 | 2011-12-16 | St Microelectronics Tours Sas | Diode de protection bidirectionnelle basse tension |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB1037199A (en) * | 1964-07-14 | 1966-07-27 | Standard Telephones Cables Ltd | Improvements in or relating to transistor manufacture |
BE759057A (fr) * | 1969-11-19 | 1971-05-17 | Philips Nv | |
US3649369A (en) * | 1970-03-09 | 1972-03-14 | Hughes Aircraft Co | Method for making n-type layers in gallium arsenide at room temperatures |
US3856578A (en) * | 1972-03-13 | 1974-12-24 | Bell Telephone Labor Inc | Bipolar transistors and method of manufacture |
US3904449A (en) * | 1974-05-09 | 1975-09-09 | Bell Telephone Labor Inc | Growth technique for high efficiency gallium arsenide impatt diodes |
-
1974
- 1974-10-18 FR FR7435143A patent/FR2288390A1/fr active Granted
-
1975
- 1975-10-15 US US05/622,455 patent/US4045252A/en not_active Expired - Lifetime
- 1975-10-17 DE DE19752546673 patent/DE2546673A1/de not_active Withdrawn
- 1975-10-17 JP JP50125219A patent/JPS5166772A/ja active Pending
- 1975-10-17 GB GB42824/75A patent/GB1524709A/en not_active Expired
Non-Patent Citations (1)
Title |
---|
NEANT * |
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0103138A2 (fr) * | 1982-08-11 | 1984-03-21 | Hitachi, Ltd. | Diode redresseuse semi-conductrice |
EP0103138A3 (en) * | 1982-08-11 | 1985-09-11 | Hitachi, Ltd. | Semiconductor rectifier diode |
EP0122598A2 (fr) * | 1983-04-13 | 1984-10-24 | Hitachi, Ltd. | Diode rapide |
EP0122598A3 (en) * | 1983-04-13 | 1985-09-18 | Hitachi, Ltd. | High speed diode |
CH673352A5 (fr) * | 1987-03-30 | 1990-02-28 | Bbc Brown Boveri & Cie | |
EP2996152A1 (fr) * | 2014-09-15 | 2016-03-16 | ABB Technology AG | Diode de puissance à haute fréquence et sa méthode de manufacture |
US9553210B2 (en) | 2014-09-15 | 2017-01-24 | Abb Schweiz Ag | High frequency power diode and method for manufacturing the same |
RU2684921C2 (ru) * | 2014-09-15 | 2019-04-16 | Абб Швайц Аг | Высокочастотный силовой диод и способ его изготовления |
Also Published As
Publication number | Publication date |
---|---|
DE2546673A1 (de) | 1976-04-29 |
GB1524709A (en) | 1978-09-13 |
US4045252A (en) | 1977-08-30 |
JPS5166772A (fr) | 1976-06-09 |
FR2288390B1 (fr) | 1978-07-13 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
ST | Notification of lapse |