FR2282120B2 - - Google Patents
Info
- Publication number
- FR2282120B2 FR2282120B2 FR7521474A FR7521474A FR2282120B2 FR 2282120 B2 FR2282120 B2 FR 2282120B2 FR 7521474 A FR7521474 A FR 7521474A FR 7521474 A FR7521474 A FR 7521474A FR 2282120 B2 FR2282120 B2 FR 2282120B2
- Authority
- FR
- France
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Light Sources And Details Of Projection-Printing Devices (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19742439208 DE2439208A1 (de) | 1974-08-16 | 1974-08-16 | Belichtungsvorrichtung |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| FR2282120A2 FR2282120A2 (fr) | 1976-03-12 |
| FR2282120B2 true FR2282120B2 (enFirst) | 1977-07-22 |
Family
ID=5923274
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| FR7521474A Granted FR2282120A2 (fr) | 1974-08-16 | 1975-07-03 | Procede et dispositif d'exposition de couches sensibles a la lumiere avec suppression des lignes fantomes |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JPS5139143A (enFirst) |
| DE (1) | DE2439208A1 (enFirst) |
| FR (1) | FR2282120A2 (enFirst) |
| GB (1) | GB1500959A (enFirst) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0567558A (ja) * | 1991-09-06 | 1993-03-19 | Nikon Corp | 露光方法 |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| IT939738B (it) * | 1970-08-12 | 1973-02-10 | Rank Organisation Ltd | Dispositivo di illuminazione per la stampa fotolitografica dei componenti di microcircuiti |
-
1974
- 1974-08-16 DE DE19742439208 patent/DE2439208A1/de active Pending
-
1975
- 1975-07-03 FR FR7521474A patent/FR2282120A2/fr active Granted
- 1975-07-29 GB GB3163675A patent/GB1500959A/en not_active Expired
- 1975-07-31 JP JP50092644A patent/JPS5139143A/ja active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5139143A (enFirst) | 1976-04-01 |
| FR2282120A2 (fr) | 1976-03-12 |
| DE2439208A1 (de) | 1976-03-11 |
| GB1500959A (en) | 1978-02-15 |