FR2280924B3 - - Google Patents

Info

Publication number
FR2280924B3
FR2280924B3 FR7426951A FR7426951A FR2280924B3 FR 2280924 B3 FR2280924 B3 FR 2280924B3 FR 7426951 A FR7426951 A FR 7426951A FR 7426951 A FR7426951 A FR 7426951A FR 2280924 B3 FR2280924 B3 FR 2280924B3
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR7426951A
Other versions
FR2280924A1 (fr
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Silec Semi Conducteurs SA
Original Assignee
Silec Semi Conducteurs SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Silec Semi Conducteurs SA filed Critical Silec Semi Conducteurs SA
Priority to FR7426951A priority Critical patent/FR2280924A1/fr
Publication of FR2280924A1 publication Critical patent/FR2280924A1/fr
Application granted granted Critical
Publication of FR2280924B3 publication Critical patent/FR2280924B3/fr
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
    • G03F1/48—Protective coatings

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
FR7426951A 1974-08-02 1974-08-02 Procede de protection de masques de photogravure et masques obtenus Granted FR2280924A1 (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
FR7426951A FR2280924A1 (fr) 1974-08-02 1974-08-02 Procede de protection de masques de photogravure et masques obtenus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR7426951A FR2280924A1 (fr) 1974-08-02 1974-08-02 Procede de protection de masques de photogravure et masques obtenus

Publications (2)

Publication Number Publication Date
FR2280924A1 FR2280924A1 (fr) 1976-02-27
FR2280924B3 true FR2280924B3 (fr) 1977-06-03

Family

ID=9142054

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7426951A Granted FR2280924A1 (fr) 1974-08-02 1974-08-02 Procede de protection de masques de photogravure et masques obtenus

Country Status (1)

Country Link
FR (1) FR2280924A1 (fr)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1557064A (en) * 1976-09-09 1979-12-05 Mullard Ltd Masks suitable for use in electron image projectors
US4361643A (en) * 1981-01-05 1982-11-30 Western Electric Co., Inc. Photomask and method of using same
US4537813A (en) * 1982-09-27 1985-08-27 At&T Technologies, Inc. Photomask encapsulation
US6300042B1 (en) 1998-11-24 2001-10-09 Motorola, Inc. Lithographic printing method using a low surface energy layer
EP1128211A1 (fr) * 2000-02-21 2001-08-29 Motorola, Inc. Lithographie par contact utilisant une couche à énergie de surface basse

Also Published As

Publication number Publication date
FR2280924A1 (fr) 1976-02-27

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Legal Events

Date Code Title Description
ST Notification of lapse