FR2264299A1 - - Google Patents

Info

Publication number
FR2264299A1
FR2264299A1 FR7502835A FR7502835A FR2264299A1 FR 2264299 A1 FR2264299 A1 FR 2264299A1 FR 7502835 A FR7502835 A FR 7502835A FR 7502835 A FR7502835 A FR 7502835A FR 2264299 A1 FR2264299 A1 FR 2264299A1
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7502835A
Other versions
FR2264299B1 (fr
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Publication of FR2264299A1 publication Critical patent/FR2264299A1/fr
Application granted granted Critical
Publication of FR2264299B1 publication Critical patent/FR2264299B1/fr
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70583—Speckle reduction, e.g. coherence control or amplitude/wavefront splitting
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/201—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by an oblique exposure; characterised by the use of plural sources; characterised by the rotation of the optical device; characterised by a relative movement of the optical device, the light source, the sensitive system or the mask

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
FR7502835A 1974-03-13 1975-01-20 Expired FR2264299B1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19742411926 DE2411926A1 (de) 1974-03-13 1974-03-13 Vorrichtung zum belichten lichtempfindlicher schichten durch masken

Publications (2)

Publication Number Publication Date
FR2264299A1 true FR2264299A1 (fr) 1975-10-10
FR2264299B1 FR2264299B1 (fr) 1977-04-15

Family

ID=5909886

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7502835A Expired FR2264299B1 (fr) 1974-03-13 1975-01-20

Country Status (3)

Country Link
DE (1) DE2411926A1 (fr)
FR (1) FR2264299B1 (fr)
GB (1) GB1459719A (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0195724A2 (fr) * 1985-03-20 1986-09-24 Fujitsu Limited Masque de modulation spatiale de phase, procédé de fabrication et procédé pour la formation de réseaux de diffraction diphasés

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1022222A (ja) * 1995-12-29 1998-01-23 Hyundai Electron Ind Co Ltd 露光装置
FR2858694B1 (fr) * 2003-08-07 2006-08-18 Commissariat Energie Atomique Procede de realisation de motifs a flancs inclines par photolithographie

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0195724A2 (fr) * 1985-03-20 1986-09-24 Fujitsu Limited Masque de modulation spatiale de phase, procédé de fabrication et procédé pour la formation de réseaux de diffraction diphasés
EP0195724A3 (en) * 1985-03-20 1990-05-16 Fujitsu Limited Spatial phase modulating masks and production processes thereof, and processes for the formation of phase-shifted diffraction gratings

Also Published As

Publication number Publication date
FR2264299B1 (fr) 1977-04-15
DE2411926A1 (de) 1975-09-25
GB1459719A (en) 1976-12-31

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Legal Events

Date Code Title Description
ST Notification of lapse