FR2256260B1 - - Google Patents

Info

Publication number
FR2256260B1
FR2256260B1 FR7441634A FR7441634A FR2256260B1 FR 2256260 B1 FR2256260 B1 FR 2256260B1 FR 7441634 A FR7441634 A FR 7441634A FR 7441634 A FR7441634 A FR 7441634A FR 2256260 B1 FR2256260 B1 FR 2256260B1
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR7441634A
Other versions
FR2256260A1 (fr
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Publication of FR2256260A1 publication Critical patent/FR2256260A1/fr
Application granted granted Critical
Publication of FR2256260B1 publication Critical patent/FR2256260B1/fr
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
    • H01L21/30625—With simultaneous mechanical treatment, e.g. mechanico-chemical polishing

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Weting (AREA)
  • ing And Chemical Polishing (AREA)
FR7441634A 1973-12-28 1974-11-08 Expired FR2256260B1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US05/429,418 US3930870A (en) 1973-12-28 1973-12-28 Silicon polishing solution preparation

Publications (2)

Publication Number Publication Date
FR2256260A1 FR2256260A1 (fr) 1975-07-25
FR2256260B1 true FR2256260B1 (fr) 1982-02-05

Family

ID=23703162

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7441634A Expired FR2256260B1 (fr) 1973-12-28 1974-11-08

Country Status (7)

Country Link
US (1) US3930870A (fr)
JP (1) JPS5244736B2 (fr)
CA (1) CA1037364A (fr)
DE (1) DE2456244C3 (fr)
FR (1) FR2256260B1 (fr)
GB (1) GB1441083A (fr)
IT (1) IT1026642B (fr)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2288392A1 (fr) * 1974-10-18 1976-05-14 Radiotechnique Compelec Procede de realisation de dispositifs semiconducteurs
US4171242A (en) * 1976-12-17 1979-10-16 International Business Machines Corporation Neutral pH silicon etchant for etching silicon in the presence of phosphosilicate glass
EP0198189B1 (fr) * 1985-04-18 1990-12-05 Galileo Electro-Optics Corporation Procédé pour enlever une couche de surface d'un verre fluoré
US4769046A (en) * 1985-07-25 1988-09-06 Fujimi Kanmazai Kogyo Kabushiki Kaisha Of Japan Process for polishing surface of memory hard disc
JPS6225187A (ja) * 1985-07-25 1987-02-03 Fujimi Kenmazai Kogyo Kk メモリ−ハ−ドデイスクの研磨用組成物
US4944836A (en) * 1985-10-28 1990-07-31 International Business Machines Corporation Chem-mech polishing method for producing coplanar metal/insulator films on a substrate
US5527423A (en) * 1994-10-06 1996-06-18 Cabot Corporation Chemical mechanical polishing slurry for metal layers
US5958288A (en) * 1996-11-26 1999-09-28 Cabot Corporation Composition and slurry useful for metal CMP
WO1999053532A1 (fr) * 1998-04-10 1999-10-21 Ferro Corporation Pate servant a effectuer le polissage chimiomecanique de surfaces metalliques
CN1422314A (zh) * 2000-04-11 2003-06-04 卡伯特微电子公司 用于优先除去氧化硅的系统
CN106011864B (zh) * 2016-06-16 2019-10-08 深圳市兆新能源股份有限公司 气雾型金属去污擦亮剂及其制备方法

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2410322A (en) * 1943-09-28 1946-10-29 Sharon Steel Corp Treatment of manganese steel
BE466591A (fr) * 1945-07-13
GB693776A (en) * 1949-08-08 1953-07-08 Vaw Ver Aluminium Werke Ag Method of producing high gloss surfaces on aluminium and aluminium-base alloys
US2814589A (en) * 1955-08-02 1957-11-26 Bell Telephone Labor Inc Method of plating silicon
US3088889A (en) * 1959-06-08 1963-05-07 Gen Motors Corp Electrolytic machining of metal surfaces
DE1110982B (de) * 1960-01-13 1961-07-13 Vaw Ver Aluminium Werke Ag Glaenzbad zur Erzeugung von hochglaenzenden Oberflaechen auf Gegenstaenden aus Aluminium oder dessen Legierungen und Regenerierungsloesung fuer dieses Glaenzbad
US3436259A (en) * 1966-05-12 1969-04-01 Ibm Method for plating and polishing a silicon planar surface

Also Published As

Publication number Publication date
GB1441083A (en) 1976-06-30
JPS5097532A (fr) 1975-08-02
CA1037364A (fr) 1978-08-29
DE2456244C3 (de) 1982-02-04
JPS5244736B2 (fr) 1977-11-10
DE2456244B2 (de) 1981-05-27
US3930870A (en) 1976-01-06
FR2256260A1 (fr) 1975-07-25
IT1026642B (it) 1978-10-20
DE2456244A1 (de) 1975-07-10

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Legal Events

Date Code Title Description
ST Notification of lapse