FR2211677B1 - - Google Patents

Info

Publication number
FR2211677B1
FR2211677B1 FR7345904A FR7345904A FR2211677B1 FR 2211677 B1 FR2211677 B1 FR 2211677B1 FR 7345904 A FR7345904 A FR 7345904A FR 7345904 A FR7345904 A FR 7345904A FR 2211677 B1 FR2211677 B1 FR 2211677B1
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR7345904A
Other languages
French (fr)
Other versions
FR2211677A1 (
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Eastman Kodak Co
Original Assignee
Eastman Kodak Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Eastman Kodak Co filed Critical Eastman Kodak Co
Publication of FR2211677A1 publication Critical patent/FR2211677A1/fr
Application granted granted Critical
Publication of FR2211677B1 publication Critical patent/FR2211677B1/fr
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F8/00—Chemical modification by after-treatment

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Polymerisation Methods In General (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
FR7345904A 1972-12-22 1973-12-21 Expired FR2211677B1 ( )

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US31758572A 1972-12-22 1972-12-22

Publications (2)

Publication Number Publication Date
FR2211677A1 FR2211677A1 ( ) 1974-07-19
FR2211677B1 true FR2211677B1 ( ) 1977-08-12

Family

ID=23234356

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7345904A Expired FR2211677B1 ( ) 1972-12-22 1973-12-21

Country Status (6)

Country Link
JP (1) JPS5630849B2 ( )
BE (1) BE809031A ( )
CA (1) CA1005673A ( )
FR (1) FR2211677B1 ( )
GB (1) GB1442797A ( )
IT (1) IT1000552B ( )

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4491628A (en) * 1982-08-23 1985-01-01 International Business Machines Corporation Positive- and negative-working resist compositions with acid generating photoinitiator and polymer with acid labile groups pendant from polymer backbone
JPS61206293A (ja) * 1985-03-08 1986-09-12 日本ペイント株式会社 回路板の製造方法
US5035976A (en) * 1986-05-02 1991-07-30 Hoechst Celanese Corporation Photosensitive article having phenolic photosensitizers containing quinone diazide and acid halide substituents
US4732837A (en) * 1986-05-02 1988-03-22 Hoechst Celanese Corporation Novel mixed ester O-quinone photosensitizers
US4732836A (en) * 1986-05-02 1988-03-22 Hoechst Celanese Corporation Novel mixed ester O-quinone photosensitizers
DE3852559T2 (de) * 1987-03-12 1995-05-24 Konishiroku Photo Ind Lichtempfindliche positive Flachdruckplatte.
DE3731439A1 (de) * 1987-09-18 1989-03-30 Hoechst Ag Strahlungsempfindliches gemisch und hieraus hergestelltes kopiermaterial
JPH07119374B2 (ja) * 1987-11-06 1995-12-20 関西ペイント株式会社 ポジ型感光性カチオン電着塗料組成物

Also Published As

Publication number Publication date
GB1442797A (en) 1976-07-14
DE2364178A1 (de) 1974-07-11
BE809031A (fr) 1974-06-21
DE2364178B2 (de) 1976-01-15
IT1000552B (it) 1976-04-10
JPS5630849B2 ( ) 1981-07-17
JPS49126403A ( ) 1974-12-04
CA1005673A (en) 1977-02-22
FR2211677A1 ( ) 1974-07-19

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Legal Events

Date Code Title Description
ST Notification of lapse