FR2211677A1 - - Google Patents

Info

Publication number
FR2211677A1
FR2211677A1 FR7345904A FR7345904A FR2211677A1 FR 2211677 A1 FR2211677 A1 FR 2211677A1 FR 7345904 A FR7345904 A FR 7345904A FR 7345904 A FR7345904 A FR 7345904A FR 2211677 A1 FR2211677 A1 FR 2211677A1
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7345904A
Other languages
French (fr)
Other versions
FR2211677B1 (enrdf_load_html_response
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Eastman Kodak Co
Original Assignee
Eastman Kodak Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Eastman Kodak Co filed Critical Eastman Kodak Co
Publication of FR2211677A1 publication Critical patent/FR2211677A1/fr
Application granted granted Critical
Publication of FR2211677B1 publication Critical patent/FR2211677B1/fr
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F8/00—Chemical modification by after-treatment

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Physics & Mathematics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Polymerisation Methods In General (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
FR7345904A 1972-12-22 1973-12-21 Expired FR2211677B1 (enrdf_load_html_response)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US31758572A 1972-12-22 1972-12-22

Publications (2)

Publication Number Publication Date
FR2211677A1 true FR2211677A1 (enrdf_load_html_response) 1974-07-19
FR2211677B1 FR2211677B1 (enrdf_load_html_response) 1977-08-12

Family

ID=23234356

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7345904A Expired FR2211677B1 (enrdf_load_html_response) 1972-12-22 1973-12-21

Country Status (6)

Country Link
JP (1) JPS5630849B2 (enrdf_load_html_response)
BE (1) BE809031A (enrdf_load_html_response)
CA (1) CA1005673A (enrdf_load_html_response)
FR (1) FR2211677B1 (enrdf_load_html_response)
GB (1) GB1442797A (enrdf_load_html_response)
IT (1) IT1000552B (enrdf_load_html_response)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0102450A3 (en) * 1982-08-23 1986-10-15 International Business Machines Corporation Resist compositions
EP0194824A3 (en) * 1985-03-08 1988-01-13 Nippon Paint Co., Ltd. A method for preparing a printed circuit board
EP0243964A3 (en) * 1986-05-02 1988-09-14 Hoechst Celanese Corporation Photosensitive positive composition and photosensitive registration material prepared therefrom
EP0244762A3 (en) * 1986-05-02 1988-09-21 Hoechst Celanese Corporation Photosensitive positive composition and photosensitive registration material prepared therefrom
EP0287212A1 (en) * 1987-03-12 1988-10-19 Mitsubishi Chemical Corporation Positive photosensitive planographic printing plate
EP0307828A3 (de) * 1987-09-18 1990-05-16 Hoechst Aktiengesellschaft Strahlungsempfindliches Gemisch und hieraus hergestelltes Kopiermaterial
EP0315165A3 (en) * 1987-11-06 1990-08-01 Kansai Paint Co. Ltd. Positive-type photosensitive electrodeposition coating composition
US5035976A (en) * 1986-05-02 1991-07-30 Hoechst Celanese Corporation Photosensitive article having phenolic photosensitizers containing quinone diazide and acid halide substituents

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
PAGES 65 A 70.) *
REVUE GB 'PRODUCT LICENSING INDEX AND RESEARCH DISCLOSURES', JUIN 1973 *

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0102450A3 (en) * 1982-08-23 1986-10-15 International Business Machines Corporation Resist compositions
EP0194824A3 (en) * 1985-03-08 1988-01-13 Nippon Paint Co., Ltd. A method for preparing a printed circuit board
EP0243964A3 (en) * 1986-05-02 1988-09-14 Hoechst Celanese Corporation Photosensitive positive composition and photosensitive registration material prepared therefrom
EP0244762A3 (en) * 1986-05-02 1988-09-21 Hoechst Celanese Corporation Photosensitive positive composition and photosensitive registration material prepared therefrom
US5035976A (en) * 1986-05-02 1991-07-30 Hoechst Celanese Corporation Photosensitive article having phenolic photosensitizers containing quinone diazide and acid halide substituents
EP0287212A1 (en) * 1987-03-12 1988-10-19 Mitsubishi Chemical Corporation Positive photosensitive planographic printing plate
EP0307828A3 (de) * 1987-09-18 1990-05-16 Hoechst Aktiengesellschaft Strahlungsempfindliches Gemisch und hieraus hergestelltes Kopiermaterial
EP0315165A3 (en) * 1987-11-06 1990-08-01 Kansai Paint Co. Ltd. Positive-type photosensitive electrodeposition coating composition

Also Published As

Publication number Publication date
JPS5630849B2 (enrdf_load_html_response) 1981-07-17
GB1442797A (en) 1976-07-14
JPS49126403A (enrdf_load_html_response) 1974-12-04
DE2364178B2 (de) 1976-01-15
DE2364178A1 (de) 1974-07-11
CA1005673A (en) 1977-02-22
BE809031A (fr) 1974-06-21
FR2211677B1 (enrdf_load_html_response) 1977-08-12
IT1000552B (it) 1976-04-10

Similar Documents

Publication Publication Date Title
FR2211677B1 (enrdf_load_html_response)
BE818704A (fr) Perfectionnements aux procedes et dispositifs pour elaborer desmateriaux ameliores en feuille a partir d'une matiere thermoplastique
CH1102972A4 (enrdf_load_html_response)
BG18307A1 (enrdf_load_html_response)
BG18343A1 (enrdf_load_html_response)
CH133373A4 (enrdf_load_html_response)
CH276872A4 (enrdf_load_html_response)
CH560038A5 (enrdf_load_html_response)
CH561123A5 (enrdf_load_html_response)
CH561361A5 (enrdf_load_html_response)
CH561486A5 (enrdf_load_html_response)
CH562322A5 (enrdf_load_html_response)
CH562938A5 (enrdf_load_html_response)
CH563083A5 (enrdf_load_html_response)
CH563179A5 (enrdf_load_html_response)
CH564840A5 (enrdf_load_html_response)
CH565082A5 (enrdf_load_html_response)
CH565347A5 (enrdf_load_html_response)
CH565653A5 (enrdf_load_html_response)
CH565917A5 (enrdf_load_html_response)
CH566361A5 (enrdf_load_html_response)
CH566523A5 (enrdf_load_html_response)
CH566727A5 (enrdf_load_html_response)
CH566857A5 (enrdf_load_html_response)
CH567021A5 (enrdf_load_html_response)

Legal Events

Date Code Title Description
ST Notification of lapse