FR2196487A1 - - Google Patents

Info

Publication number
FR2196487A1
FR2196487A1 FR7321359*A FR7321359A FR2196487A1 FR 2196487 A1 FR2196487 A1 FR 2196487A1 FR 7321359 A FR7321359 A FR 7321359A FR 2196487 A1 FR2196487 A1 FR 2196487A1
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7321359*A
Other languages
French (fr)
Other versions
FR2196487B1 (enExample
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Publication of FR2196487A1 publication Critical patent/FR2196487A1/fr
Application granted granted Critical
Publication of FR2196487B1 publication Critical patent/FR2196487B1/fr
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54—Absorbers, e.g. of opaque materials
    • G03F1/58—Absorbers, e.g. of opaque materials having two or more different absorber layers, e.g. stacked multilayer absorbers

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
FR7321359A 1972-06-20 1973-05-25 Expired FR2196487B1 (enExample)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US00264653A US3815978A (en) 1972-06-20 1972-06-20 Durable see-through photoresist mask
US28465372A 1972-08-20 1972-08-20

Publications (2)

Publication Number Publication Date
FR2196487A1 true FR2196487A1 (enExample) 1974-03-15
FR2196487B1 FR2196487B1 (enExample) 1983-10-07

Family

ID=26950682

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7321359A Expired FR2196487B1 (enExample) 1972-06-20 1973-05-25

Country Status (4)

Country Link
US (1) US3815978A (enExample)
DE (1) DE2325598C2 (enExample)
FR (1) FR2196487B1 (enExample)
GB (1) GB1416899A (enExample)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2643811C2 (de) * 1975-10-28 1981-10-15 Hughes Aircraft Co., Culver City, Calif. Lithographie-Maske mit einer für Strahlung durchlässigen Membran und Verfahren zu ihrer Herstellung
US4063812A (en) * 1976-08-12 1977-12-20 International Business Machines Corporation Projection printing system with an improved mask configuration
US4536240A (en) * 1981-12-02 1985-08-20 Advanced Semiconductor Products, Inc. Method of forming thin optical membranes
US4666292A (en) * 1984-08-24 1987-05-19 Nippon Kogaku K.K. Projection optical apparatus and a photographic mask therefor
DE59309954D1 (de) * 1992-12-21 2000-03-16 Balzers Hochvakuum Optisches Bauelement, Verfahren zur Herstellung einer Schicht, Schicht bzw. Schichtsystem und Verwendung des Bauelementes
DE102008037465B4 (de) * 2008-10-17 2019-06-19 Kla-Tencor Mie Gmbh Verfahren zur Bestimmung der Position von Materialkanten auf einer Maske für die Halbleiterherstellung

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3508982A (en) * 1967-01-03 1970-04-28 Itt Method of making an ultra-violet selective template
US3561963A (en) * 1967-09-11 1971-02-09 Signetics Corp Transparent mask and method for making the same
SE349874B (enExample) * 1968-07-03 1972-10-09 Western Electric Co
US3661436A (en) * 1970-06-30 1972-05-09 Ibm Transparent fabrication masks utilizing masking material selected from the group consisting of spinels, perovskites, garnets, fluorides and oxy-fluorides

Also Published As

Publication number Publication date
FR2196487B1 (enExample) 1983-10-07
GB1416899A (en) 1975-12-10
US3815978A (en) 1974-06-11
DE2325598C2 (de) 1983-09-15
DE2325598A1 (de) 1974-01-10

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Legal Events

Date Code Title Description
ST Notification of lapse