FR2178984B1 - - Google Patents
Info
- Publication number
- FR2178984B1 FR2178984B1 FR7311706A FR7311706A FR2178984B1 FR 2178984 B1 FR2178984 B1 FR 2178984B1 FR 7311706 A FR7311706 A FR 7311706A FR 7311706 A FR7311706 A FR 7311706A FR 2178984 B1 FR2178984 B1 FR 2178984B1
- Authority
- FR
- France
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B31/00—Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor
- C30B31/02—Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor by contacting with diffusion materials in the solid state
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P32/00—Diffusion of dopants within, into or out of wafers, substrates or parts of devices
- H10P32/10—Diffusion of dopants within, into or out of semiconductor bodies or layers
- H10P32/14—Diffusion of dopants within, into or out of semiconductor bodies or layers within a single semiconductor body or layer in a solid phase; between different semiconductor bodies or layers, both in a solid phase
- H10P32/1404—Diffusion of dopants within, into or out of semiconductor bodies or layers within a single semiconductor body or layer in a solid phase; between different semiconductor bodies or layers, both in a solid phase using predeposition followed by drive-in of impurities into the semiconductor surface, e.g. predeposition from a gaseous phase
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P32/00—Diffusion of dopants within, into or out of wafers, substrates or parts of devices
- H10P32/10—Diffusion of dopants within, into or out of semiconductor bodies or layers
- H10P32/17—Diffusion of dopants within, into or out of semiconductor bodies or layers characterised by the semiconductor material
- H10P32/171—Diffusion of dopants within, into or out of semiconductor bodies or layers characterised by the semiconductor material being group IV material
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S438/00—Semiconductor device manufacturing: process
- Y10S438/914—Doping
- Y10S438/92—Controlling diffusion profile by oxidation
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Formation Of Insulating Films (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Weting (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US00241821A US3806382A (en) | 1972-04-06 | 1972-04-06 | Vapor-solid impurity diffusion process |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| FR2178984A1 FR2178984A1 (oth) | 1973-11-16 |
| FR2178984B1 true FR2178984B1 (oth) | 1978-03-03 |
Family
ID=22912318
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| FR7311706A Expired FR2178984B1 (oth) | 1972-04-06 | 1973-03-21 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US3806382A (oth) |
| JP (1) | JPS5321835B2 (oth) |
| CA (1) | CA980665A (oth) |
| DE (1) | DE2316520C3 (oth) |
| FR (1) | FR2178984B1 (oth) |
| GB (1) | GB1397684A (oth) |
| IT (1) | IT981193B (oth) |
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3972838A (en) * | 1973-11-01 | 1976-08-03 | Denki Kagaku Kogyo Kabushiki Kaisha | Composition for diffusing phosphorus |
| DE2453134C3 (de) * | 1974-11-08 | 1983-02-10 | Deutsche Itt Industries Gmbh, 7800 Freiburg | Planardiffusionsverfahren |
| NL7604986A (nl) * | 1976-05-11 | 1977-11-15 | Philips Nv | Werkwijze voor het vervaardigen van een halfgeleider- inrichting, en inrichting vervaardigd door toe- passing van de werkwijze. |
| DE2751163C3 (de) * | 1977-11-16 | 1982-02-25 | Brown, Boveri & Cie Ag, 6800 Mannheim | Verfahren zur Steuerung einer offenen Gallium-Diffusion und Vorrichtung zur Durchführung desselben |
| DE2838928A1 (de) * | 1978-09-07 | 1980-03-20 | Ibm Deutschland | Verfahren zum dotieren von siliciumkoerpern mit bor |
| US4234361A (en) * | 1979-07-05 | 1980-11-18 | Wisconsin Alumni Research Foundation | Process for producing an electrostatically deformable thin silicon membranes utilizing a two-stage diffusion step to form an etchant resistant layer |
| JPS5614139U (oth) * | 1979-07-14 | 1981-02-06 | ||
| JPS6133636Y2 (oth) * | 1981-01-29 | 1986-10-01 | ||
| JPH03158569A (ja) * | 1989-11-15 | 1991-07-08 | Misawa Homes Co Ltd | 工業化住宅の施工用転落防止構造 |
| DE102012025429A1 (de) | 2012-12-21 | 2014-06-26 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Verfahren zur Dotierung von Halbleitersubstraten sowie dotiertes Halbleitersubstrat |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE1444536C3 (de) * | 1963-05-20 | 1975-03-27 | Siemens Ag, 1000 Berlin Und 8000 Muenchen | Verfahren zum Diffusionsdotieren eines Silicium-Halbleiterkristalls |
-
1972
- 1972-04-06 US US00241821A patent/US3806382A/en not_active Expired - Lifetime
-
1973
- 1973-03-07 JP JP2623073A patent/JPS5321835B2/ja not_active Expired
- 1973-03-08 IT IT21302/73A patent/IT981193B/it active
- 1973-03-08 GB GB1138973A patent/GB1397684A/en not_active Expired
- 1973-03-13 CA CA166,915A patent/CA980665A/en not_active Expired
- 1973-03-21 FR FR7311706A patent/FR2178984B1/fr not_active Expired
- 1973-04-03 DE DE2316520A patent/DE2316520C3/de not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5321835B2 (oth) | 1978-07-05 |
| JPS4910666A (oth) | 1974-01-30 |
| DE2316520C3 (de) | 1981-12-10 |
| FR2178984A1 (oth) | 1973-11-16 |
| US3806382A (en) | 1974-04-23 |
| IT981193B (it) | 1974-10-10 |
| DE2316520B2 (de) | 1980-11-27 |
| DE2316520A1 (de) | 1973-10-11 |
| GB1397684A (en) | 1975-06-18 |
| CA980665A (en) | 1975-12-30 |
Similar Documents
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| ST | Notification of lapse |