FR2178751A1 - - Google Patents

Info

Publication number
FR2178751A1
FR2178751A1 FR7211912A FR7211912A FR2178751A1 FR 2178751 A1 FR2178751 A1 FR 2178751A1 FR 7211912 A FR7211912 A FR 7211912A FR 7211912 A FR7211912 A FR 7211912A FR 2178751 A1 FR2178751 A1 FR 2178751A1
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7211912A
Other languages
French (fr)
Other versions
FR2178751B1 (US08063081-20111122-C00044.png
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Radiotechnique Compelec RTC SA
Original Assignee
Radiotechnique Compelec RTC SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Radiotechnique Compelec RTC SA filed Critical Radiotechnique Compelec RTC SA
Priority to FR7211912A priority Critical patent/FR2178751B1/fr
Priority to US00346081A priority patent/US3852129A/en
Priority to DE2315894A priority patent/DE2315894C3/de
Priority to CA167,715A priority patent/CA984976A/en
Priority to JP48036818A priority patent/JPS525226B2/ja
Priority to IT67938/73A priority patent/IT980738B/it
Priority to GB1571073A priority patent/GB1372162A/en
Publication of FR2178751A1 publication Critical patent/FR2178751A1/fr
Application granted granted Critical
Publication of FR2178751B1 publication Critical patent/FR2178751B1/fr
Expired legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B31/00Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor
    • C30B31/06Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor by contacting with diffusion material in the gaseous state
    • C30B31/16Feed and outlet means for the gases; Modifying the flow of the gases
    • C30B31/165Diffusion sources
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/22Diffusion of impurity materials, e.g. doping materials, electrode materials, into or out of a semiconductor body, or between semiconductor regions; Interactions between two or more impurities; Redistribution of impurities
    • H01L21/223Diffusion of impurity materials, e.g. doping materials, electrode materials, into or out of a semiconductor body, or between semiconductor regions; Interactions between two or more impurities; Redistribution of impurities using diffusion into or out of a solid from or into a gaseous phase

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
FR7211912A 1972-04-05 1972-04-05 Expired FR2178751B1 (US08063081-20111122-C00044.png)

Priority Applications (7)

Application Number Priority Date Filing Date Title
FR7211912A FR2178751B1 (US08063081-20111122-C00044.png) 1972-04-05 1972-04-05
US00346081A US3852129A (en) 1972-04-05 1973-03-29 Method of carrying out diffusions with two sources
DE2315894A DE2315894C3 (de) 1972-04-05 1973-03-30 Verfahren zum Eindiffundieren von Dotierstoff in einen Halbleiterkörper
CA167,715A CA984976A (en) 1972-04-05 1973-04-02 Method of carrying out diffusions with two sources
JP48036818A JPS525226B2 (US08063081-20111122-C00044.png) 1972-04-05 1973-04-02
IT67938/73A IT980738B (it) 1972-04-05 1973-04-02 Procedimento per diffondere da due fonti materiale di drogaggio in un corpo semiconduttore
GB1571073A GB1372162A (en) 1972-04-05 1973-04-02 Doping semiconductor bodies

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR7211912A FR2178751B1 (US08063081-20111122-C00044.png) 1972-04-05 1972-04-05

Publications (2)

Publication Number Publication Date
FR2178751A1 true FR2178751A1 (US08063081-20111122-C00044.png) 1973-11-16
FR2178751B1 FR2178751B1 (US08063081-20111122-C00044.png) 1974-10-18

Family

ID=9096355

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7211912A Expired FR2178751B1 (US08063081-20111122-C00044.png) 1972-04-05 1972-04-05

Country Status (7)

Country Link
US (1) US3852129A (US08063081-20111122-C00044.png)
JP (1) JPS525226B2 (US08063081-20111122-C00044.png)
CA (1) CA984976A (US08063081-20111122-C00044.png)
DE (1) DE2315894C3 (US08063081-20111122-C00044.png)
FR (1) FR2178751B1 (US08063081-20111122-C00044.png)
GB (1) GB1372162A (US08063081-20111122-C00044.png)
IT (1) IT980738B (US08063081-20111122-C00044.png)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2409791A1 (fr) * 1977-11-25 1979-06-22 Silicium Semiconducteur Ssc Appareils de dopage par diffusion de tranches semi-conductrices

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2284982A1 (fr) * 1974-09-16 1976-04-09 Radiotechnique Compelec Procede de diffusion d'impuretes dans des corps semiconducteurs
JPS5464978U (US08063081-20111122-C00044.png) * 1977-10-17 1979-05-08
JPS584811B2 (ja) * 1978-10-31 1983-01-27 富士通株式会社 半導体装置の製造方法
US4348580A (en) * 1980-05-07 1982-09-07 Tylan Corporation Energy efficient furnace with movable end wall
US4415385A (en) * 1980-08-15 1983-11-15 Hitachi, Ltd. Diffusion of impurities into semiconductor using semi-closed inner diffusion vessel
US4742022A (en) * 1986-06-26 1988-05-03 Gte Laboratories Incorporated Method of diffusing zinc into III-V compound semiconductor material

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3279964A (en) * 1965-06-03 1966-10-18 Btu Eng Corp Method for continuous gas diffusion

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL264273A (US08063081-20111122-C00044.png) * 1960-05-02
US3305412A (en) * 1964-02-20 1967-02-21 Hughes Aircraft Co Method for preparing a gallium arsenide diode
DE1283204B (de) * 1964-06-20 1968-11-21 Siemens Ag Verfahren zum Eindiffundieren von zwei Fremdstoffen in einen einkristallinen Halbleiterkoerper
GB1054360A (US08063081-20111122-C00044.png) * 1964-12-05
GB1086660A (en) * 1964-12-22 1967-10-11 Siemens Ag A process for doping semiconductor bodies
US3617820A (en) * 1966-11-18 1971-11-02 Monsanto Co Injection-luminescent diodes
US3540952A (en) * 1968-01-02 1970-11-17 Gen Electric Process for fabricating semiconductor laser diodes
JPS4915903B1 (US08063081-20111122-C00044.png) * 1969-08-18 1974-04-18

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3279964A (en) * 1965-06-03 1966-10-18 Btu Eng Corp Method for continuous gas diffusion

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2409791A1 (fr) * 1977-11-25 1979-06-22 Silicium Semiconducteur Ssc Appareils de dopage par diffusion de tranches semi-conductrices

Also Published As

Publication number Publication date
DE2315894A1 (de) 1973-10-18
FR2178751B1 (US08063081-20111122-C00044.png) 1974-10-18
US3852129A (en) 1974-12-03
CA984976A (en) 1976-03-02
JPS4917675A (US08063081-20111122-C00044.png) 1974-02-16
GB1372162A (en) 1974-10-30
JPS525226B2 (US08063081-20111122-C00044.png) 1977-02-10
DE2315894C3 (de) 1980-10-02
IT980738B (it) 1974-10-10
DE2315894B2 (US08063081-20111122-C00044.png) 1980-02-07

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Legal Events

Date Code Title Description
ST Notification of lapse