FR2169217A1 - - Google Patents

Info

Publication number
FR2169217A1
FR2169217A1 FR7302524A FR7302524A FR2169217A1 FR 2169217 A1 FR2169217 A1 FR 2169217A1 FR 7302524 A FR7302524 A FR 7302524A FR 7302524 A FR7302524 A FR 7302524A FR 2169217 A1 FR2169217 A1 FR 2169217A1
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7302524A
Other languages
French (fr)
Other versions
FR2169217B1 (fi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Publication of FR2169217A1 publication Critical patent/FR2169217A1/fr
Application granted granted Critical
Publication of FR2169217B1 publication Critical patent/FR2169217B1/fr
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/008—Azides
    • G03F7/0085—Azides characterised by the non-macromolecular additives
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0751—Silicon-containing compounds used as adhesion-promoting additives or as means to improve adhesion

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)
  • Photoreceptors In Electrophotography (AREA)
FR7302524A 1972-01-26 1973-01-24 Expired FR2169217B1 (fi)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP47009095A JPS5119982B2 (fi) 1972-01-26 1972-01-26

Publications (2)

Publication Number Publication Date
FR2169217A1 true FR2169217A1 (fi) 1973-09-07
FR2169217B1 FR2169217B1 (fi) 1983-05-27

Family

ID=11711041

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7302524A Expired FR2169217B1 (fi) 1972-01-26 1973-01-24

Country Status (3)

Country Link
JP (1) JPS5119982B2 (fi)
FR (1) FR2169217B1 (fi)
GB (1) GB1376114A (fi)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2283461A1 (fr) * 1974-08-29 1976-03-26 Hoechst Ag Plaque d'impression presensibilisee avec un compose d'o-naphtoquinone
EP0107240A1 (en) * 1982-10-15 1984-05-02 Koninklijke Philips Electronics N.V. Method of photolithographically treating a substrate
EP0260976A2 (en) * 1986-09-17 1988-03-23 Brewer Science, Inc. Adhesion promoting product and process for treating an integrated circuit substrate therewith
EP0301827A2 (en) * 1987-07-30 1989-02-01 Minnesota Mining And Manufacturing Company Photographic element with novel subbing layer
EP0354533A1 (en) * 1988-08-10 1990-02-14 EASTMAN KODAK COMPANY (a New Jersey corporation) Thermally processable imaging element and process

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5741636A (en) * 1980-08-27 1982-03-08 Toshiba Corp Photoresist composition
US4491629A (en) * 1982-02-22 1985-01-01 Tokyo Shibaura Denki Kabushiki Kaisha Water soluble photoresist composition with bisazide, diazo, polymer and silane
JPS60147729A (ja) * 1984-01-12 1985-08-03 Toshiba Corp ホトレジスト組成物
GB8403698D0 (en) * 1984-02-13 1984-03-14 British Telecomm Semiconductor device fabrication
JPS6175304A (ja) * 1984-09-21 1986-04-17 Casio Comput Co Ltd カラ−液晶表示素子
US4812519A (en) * 1987-10-15 1989-03-14 Hercules Incorporated Crosslinking of vinyl silane and azidosilane modified thermoplastic polymers by moisture
US7977028B2 (en) 2005-06-30 2011-07-12 Toray Industries, Inc. Photosensitive resin composition and adhesion promoter

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS494851A (fi) * 1972-05-04 1974-01-17

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2283461A1 (fr) * 1974-08-29 1976-03-26 Hoechst Ag Plaque d'impression presensibilisee avec un compose d'o-naphtoquinone
EP0107240A1 (en) * 1982-10-15 1984-05-02 Koninklijke Philips Electronics N.V. Method of photolithographically treating a substrate
EP0260976A2 (en) * 1986-09-17 1988-03-23 Brewer Science, Inc. Adhesion promoting product and process for treating an integrated circuit substrate therewith
EP0260976A3 (en) * 1986-09-17 1988-08-03 Brewer Science, Inc. Adhesion promoting product and process for treating an integrated circuit substrate therewith
EP0301827A2 (en) * 1987-07-30 1989-02-01 Minnesota Mining And Manufacturing Company Photographic element with novel subbing layer
EP0301827A3 (en) * 1987-07-30 1989-07-12 Minnesota Mining And Manufacturing Company Photographic element with novel subbing layer
EP0354533A1 (en) * 1988-08-10 1990-02-14 EASTMAN KODAK COMPANY (a New Jersey corporation) Thermally processable imaging element and process

Also Published As

Publication number Publication date
FR2169217B1 (fi) 1983-05-27
JPS5119982B2 (fi) 1976-06-22
DE2303671B2 (de) 1975-10-23
JPS4879617A (fi) 1973-10-25
GB1376114A (en) 1974-12-04
DE2303671A1 (de) 1973-08-09

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Legal Events

Date Code Title Description
ST Notification of lapse