FR2156005A1 - - Google Patents

Info

Publication number
FR2156005A1
FR2156005A1 FR7235072A FR7235072A FR2156005A1 FR 2156005 A1 FR2156005 A1 FR 2156005A1 FR 7235072 A FR7235072 A FR 7235072A FR 7235072 A FR7235072 A FR 7235072A FR 2156005 A1 FR2156005 A1 FR 2156005A1
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
FR7235072A
Other languages
French (fr)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Publication of FR2156005A1 publication Critical patent/FR2156005A1/fr
Withdrawn legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24Vacuum evaporation
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14Metallic material, boron or silicon

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
FR7235072A 1971-10-07 1972-09-27 Withdrawn FR2156005A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US18747871A 1971-10-07 1971-10-07

Publications (1)

Publication Number Publication Date
FR2156005A1 true FR2156005A1 (en) 1973-05-25

Family

ID=22689163

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7235072A Withdrawn FR2156005A1 (en) 1971-10-07 1972-09-27

Country Status (4)

Country Link
JP (1) JPS4848334A (en)
DE (1) DE2248840A1 (en)
FR (1) FR2156005A1 (en)
GB (1) GB1344972A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2496703A1 (en) * 1980-12-24 1982-06-25 Labo Electronique Physique MANGANESE EVAPORATION SOURCE ON SUBSTRATE IN THE VACUUM, IN PARTICULAR ON A PHOTOSENSITIVE LAYER SUBSTRATE IN A PHOTOELECTRIC TUBE AND METHOD OF MANUFACTURING THE SAME

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7329436B2 (en) 2004-11-17 2008-02-12 United Technologies Corporation Vapor deposition of dissimilar materials
KR100611673B1 (en) * 2005-01-31 2006-08-10 삼성에스디아이 주식회사 Method for forming thin film and method for fabricating OLED

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2496703A1 (en) * 1980-12-24 1982-06-25 Labo Electronique Physique MANGANESE EVAPORATION SOURCE ON SUBSTRATE IN THE VACUUM, IN PARTICULAR ON A PHOTOSENSITIVE LAYER SUBSTRATE IN A PHOTOELECTRIC TUBE AND METHOD OF MANUFACTURING THE SAME

Also Published As

Publication number Publication date
GB1344972A (en) 1974-01-23
DE2248840A1 (en) 1973-04-12
JPS4848334A (en) 1973-07-09

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Legal Events

Date Code Title Description
ST Notification of lapse