JPS4848334A - - Google Patents

Info

Publication number
JPS4848334A
JPS4848334A JP9135272A JP9135272A JPS4848334A JP S4848334 A JPS4848334 A JP S4848334A JP 9135272 A JP9135272 A JP 9135272A JP 9135272 A JP9135272 A JP 9135272A JP S4848334 A JPS4848334 A JP S4848334A
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9135272A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPS4848334A publication Critical patent/JPS4848334A/ja
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
JP9135272A 1971-10-07 1972-09-13 Pending JPS4848334A (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US18747871A 1971-10-07 1971-10-07

Publications (1)

Publication Number Publication Date
JPS4848334A true JPS4848334A (ja) 1973-07-09

Family

ID=22689163

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9135272A Pending JPS4848334A (ja) 1971-10-07 1972-09-13

Country Status (4)

Country Link
JP (1) JPS4848334A (ja)
DE (1) DE2248840A1 (ja)
FR (1) FR2156005A1 (ja)
GB (1) GB1344972A (ja)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2496703A1 (fr) * 1980-12-24 1982-06-25 Labo Electronique Physique Source d'evaporation de manganese sur substrat dans le vide, notamment sur substrat de couche photosensible dans un tube photo-electrique et procede de fabrication
US7329436B2 (en) 2004-11-17 2008-02-12 United Technologies Corporation Vapor deposition of dissimilar materials
KR100611673B1 (ko) * 2005-01-31 2006-08-10 삼성에스디아이 주식회사 박막 형성 방법 및 유기전계발광소자의 제조 방법

Also Published As

Publication number Publication date
DE2248840A1 (de) 1973-04-12
FR2156005A1 (ja) 1973-05-25
GB1344972A (en) 1974-01-23

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