FR2152884A1 - - Google Patents

Info

Publication number
FR2152884A1
FR2152884A1 FR7232300A FR7232300A FR2152884A1 FR 2152884 A1 FR2152884 A1 FR 2152884A1 FR 7232300 A FR7232300 A FR 7232300A FR 7232300 A FR7232300 A FR 7232300A FR 2152884 A1 FR2152884 A1 FR 2152884A1
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7232300A
Other languages
French (fr)
Other versions
FR2152884B1 (enrdf_load_stackoverflow
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kimberly Clark Tissue Co
Original Assignee
Scott Paper Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Scott Paper Co filed Critical Scott Paper Co
Publication of FR2152884A1 publication Critical patent/FR2152884A1/fr
Application granted granted Critical
Publication of FR2152884B1 publication Critical patent/FR2152884B1/fr
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/016—Diazonium salts or compounds
    • G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
    • G03F7/0212—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the diazo resins or the polymeric diazonium compounds
    • G03F7/0215—Natural gums; Proteins, e.g. gelatins; Macromolecular carbohydrates, e.g. cellulose; Polyvinyl alcohol and derivatives thereof, e.g. polyvinylacetals
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F8/00—Chemical modification by after-treatment
    • C08F8/14—Esterification
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F8/00—Chemical modification by after-treatment
    • C08F8/30—Introducing nitrogen atoms or nitrogen-containing groups

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Health & Medical Sciences (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Molecular Biology (AREA)
  • General Physics & Mathematics (AREA)
  • General Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Materials For Photolithography (AREA)
FR7232300A 1971-09-13 1972-09-12 Expired FR2152884B1 (enrdf_load_stackoverflow)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US18010371A 1971-09-13 1971-09-13
US18020071A 1971-09-13 1971-09-13
US18010471A 1971-09-13 1971-09-13
US18012471A 1971-09-13 1971-09-13

Publications (2)

Publication Number Publication Date
FR2152884A1 true FR2152884A1 (enrdf_load_stackoverflow) 1973-04-27
FR2152884B1 FR2152884B1 (enrdf_load_stackoverflow) 1977-08-05

Family

ID=27497386

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7232300A Expired FR2152884B1 (enrdf_load_stackoverflow) 1971-09-13 1972-09-12

Country Status (8)

Country Link
JP (1) JPS5110121B2 (enrdf_load_stackoverflow)
BE (1) BE788679A (enrdf_load_stackoverflow)
CH (1) CH559921A5 (enrdf_load_stackoverflow)
DE (1) DE2245433C3 (enrdf_load_stackoverflow)
FR (1) FR2152884B1 (enrdf_load_stackoverflow)
GB (1) GB1396355A (enrdf_load_stackoverflow)
IT (1) IT969430B (enrdf_load_stackoverflow)
NL (1) NL158300B (enrdf_load_stackoverflow)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0216083A1 (de) * 1985-08-02 1987-04-01 Hoechst Celanese Corporation Polyvinylacetal und dieses enthaltendes lichtempfindliches Gemisch
EP0221651A1 (en) * 1985-09-27 1987-05-13 Kao Corporation Water soluble polyvinyl alcohol derivative
EP0274075A3 (en) * 1986-12-23 1990-07-04 Hoechst Aktiengesellschaft Polyvinyl acetal, light-sensitive composition containing it and reproduction material made therefrom
US5120772A (en) * 1985-08-02 1992-06-09 Walls John E Radiation-polymerizable composition and element containing a photopolymerizable mixture

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0693116B2 (ja) * 1986-01-21 1994-11-16 富士写真フイルム株式会社 感光性組成物
DE4406789A1 (de) * 1994-03-02 1995-09-07 Basf Ag Verfahren zur Herstellung von Piperid-2-on
DE19524851C2 (de) * 1995-07-07 1998-05-07 Sun Chemical Corp Acetalpolymere und Verwendung derselben in lichtempfindlichen Zusammensetzungen und für lithographische Druckplatten
DE19644515A1 (de) * 1996-10-25 1998-06-25 Sun Chemical Corp Amidosubstituierte Acetalpolymere und Verwendung derselben in photoempfindlichen Zusammensetzungen und lithographischen Druckplatten
DE10011096A1 (de) 2000-03-09 2001-10-11 Clariant Gmbh Verwendung von carboxylgruppenhaltigen Acetalpolymeren in lichtempfindlichen Zusammensetzungen und lithographischen Druckplatten
CN101421309B (zh) * 2006-04-12 2012-12-05 可乐丽股份有限公司 分散稳定剂

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0216083A1 (de) * 1985-08-02 1987-04-01 Hoechst Celanese Corporation Polyvinylacetal und dieses enthaltendes lichtempfindliches Gemisch
US5120772A (en) * 1985-08-02 1992-06-09 Walls John E Radiation-polymerizable composition and element containing a photopolymerizable mixture
EP0221651A1 (en) * 1985-09-27 1987-05-13 Kao Corporation Water soluble polyvinyl alcohol derivative
EP0274075A3 (en) * 1986-12-23 1990-07-04 Hoechst Aktiengesellschaft Polyvinyl acetal, light-sensitive composition containing it and reproduction material made therefrom

Also Published As

Publication number Publication date
DE2245433C3 (de) 1979-08-02
DE2245433A1 (de) 1973-03-29
JPS4838716A (enrdf_load_stackoverflow) 1973-06-07
NL7212376A (enrdf_load_stackoverflow) 1973-03-15
DE2245433B2 (de) 1978-11-23
GB1396355A (en) 1975-06-04
CH559921A5 (enrdf_load_stackoverflow) 1975-03-14
NL158300B (nl) 1978-10-16
FR2152884B1 (enrdf_load_stackoverflow) 1977-08-05
IT969430B (it) 1974-03-30
BE788679A (fr) 1973-03-12
JPS5110121B2 (enrdf_load_stackoverflow) 1976-04-01

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Legal Events

Date Code Title Description
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