FR2143706A1 - - Google Patents

Info

Publication number
FR2143706A1
FR2143706A1 FR7221486A FR7221486A FR2143706A1 FR 2143706 A1 FR2143706 A1 FR 2143706A1 FR 7221486 A FR7221486 A FR 7221486A FR 7221486 A FR7221486 A FR 7221486A FR 2143706 A1 FR2143706 A1 FR 2143706A1
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7221486A
Other languages
French (fr)
Other versions
FR2143706B1 (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Publication of FR2143706A1 publication Critical patent/FR2143706A1/fr
Application granted granted Critical
Publication of FR2143706B1 publication Critical patent/FR2143706B1/fr
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/46—Manufacturing multilayer circuits
    • H05K3/4644—Manufacturing multilayer circuits by building the multilayer layer by layer, i.e. build-up multilayer circuits
    • H05K3/4673—Application methods or materials of intermediate insulating layers not specially adapted to any one of the previous methods of adding a circuit layer
    • H05K3/4676—Single layer compositions

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Epoxy Resins (AREA)
  • Organic Insulating Materials (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Materials For Photolithography (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
FR7221486A 1971-06-28 1972-06-05 Expired FR2143706B1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US15762571A 1971-06-28 1971-06-28

Publications (2)

Publication Number Publication Date
FR2143706A1 true FR2143706A1 (en) 1973-02-09
FR2143706B1 FR2143706B1 (en) 1976-06-11

Family

ID=22564554

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7221486A Expired FR2143706B1 (en) 1971-06-28 1972-06-05

Country Status (5)

Country Link
JP (1) JPS5037531B1 (en)
DE (1) DE2231297A1 (en)
FR (1) FR2143706B1 (en)
GB (1) GB1330100A (en)
IT (1) IT951496B (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0425142A2 (en) * 1989-10-27 1991-05-02 Rohm And Haas Company Positive acting photoresist and method of producing same
WO1999041642A1 (en) * 1998-02-17 1999-08-19 Isola Laminate Systems Corporation Positive acting photodielectric composition

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5137216A (en) * 1974-09-26 1976-03-29 Asahi Chemical Ind
US4439517A (en) * 1982-01-21 1984-03-27 Ciba-Geigy Corporation Process for the formation of images with epoxide resin
US4663269A (en) * 1985-08-07 1987-05-05 Polytechnic Institute Of New York Method of forming highly sensitive photoresist film in the absence of water
JP2739726B2 (en) 1990-09-27 1998-04-15 インターナシヨナル・ビジネス・マシーンズ・コーポレーシヨン Multilayer printed circuit board

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0425142A2 (en) * 1989-10-27 1991-05-02 Rohm And Haas Company Positive acting photoresist and method of producing same
EP0425142A3 (en) * 1989-10-27 1991-10-16 Rohm And Haas Company Positive acting photoresist and method of producing same
WO1999041642A1 (en) * 1998-02-17 1999-08-19 Isola Laminate Systems Corporation Positive acting photodielectric composition

Also Published As

Publication number Publication date
JPS4815059A (en) 1973-02-26
JPS5037531B1 (en) 1975-12-03
IT951496B (en) 1973-06-30
GB1330100A (en) 1973-09-12
DE2231297A1 (en) 1973-01-11
FR2143706B1 (en) 1976-06-11

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Legal Events

Date Code Title Description
ST Notification of lapse