FR2129996A1 - - Google Patents
Info
- Publication number
- FR2129996A1 FR2129996A1 FR7110598A FR7110598A FR2129996A1 FR 2129996 A1 FR2129996 A1 FR 2129996A1 FR 7110598 A FR7110598 A FR 7110598A FR 7110598 A FR7110598 A FR 7110598A FR 2129996 A1 FR2129996 A1 FR 2129996A1
- Authority
- FR
- France
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/46—Sputtering by ion beam produced by an external ion source
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR7110598A FR2129996B1 (xx) | 1971-03-25 | 1971-03-25 | |
US236609A US3925187A (en) | 1971-03-25 | 1972-03-21 | Apparatus for the formation of coatings on a substratum |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR7110598A FR2129996B1 (xx) | 1971-03-25 | 1971-03-25 |
Publications (2)
Publication Number | Publication Date |
---|---|
FR2129996A1 true FR2129996A1 (xx) | 1972-11-03 |
FR2129996B1 FR2129996B1 (xx) | 1975-01-17 |
Family
ID=9074128
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR7110598A Expired FR2129996B1 (xx) | 1971-03-25 | 1971-03-25 |
Country Status (2)
Country | Link |
---|---|
US (1) | US3925187A (xx) |
FR (1) | FR2129996B1 (xx) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2352393A1 (fr) * | 1976-05-19 | 1977-12-16 | Battelle Memorial Institute | Procede pour effectuer un depot dans une decharge luminescente sur au moins un substrat, et un decapage ionique de ce substrat et dispositif pour la mise en oeuvre de ce procede |
FR2422729A1 (fr) * | 1978-04-13 | 1979-11-09 | Litton Systems Inc | Procede de realisation de revetements optiques multicouches |
US5601652A (en) * | 1989-08-03 | 1997-02-11 | United Technologies Corporation | Apparatus for applying ceramic coatings |
Families Citing this family (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4199448A (en) * | 1976-06-09 | 1980-04-22 | The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration | Reverse osmosis membrane of high urea rejection properties |
USRE32849E (en) * | 1978-04-13 | 1989-01-31 | Litton Systems, Inc. | Method for fabricating multi-layer optical films |
DE2847620C2 (de) * | 1978-11-02 | 1984-10-18 | Siemens AG, 1000 Berlin und 8000 München | Vorrichtung zur Herstellung von elektrischen Bauelementen, insbesondere Schichtkondensatoren |
CH640886A5 (de) * | 1979-08-02 | 1984-01-31 | Balzers Hochvakuum | Verfahren zum aufbringen harter verschleissfester ueberzuege auf unterlagen. |
US4305801A (en) * | 1980-04-16 | 1981-12-15 | The United States Of America As Represented By The United States Department Of Energy | Line-of-sight deposition method |
US5250327A (en) * | 1986-04-28 | 1993-10-05 | Nissin Electric Co. Ltd. | Composite substrate and process for producing the same |
FR2619247A1 (fr) * | 1987-08-05 | 1989-02-10 | Realisations Nucleaires Et | Implanteur d'ions metalliques |
DE3737142A1 (de) * | 1987-11-02 | 1989-05-11 | Christiansen Jens | Erzeugung von (duennen) schichten aus hochschmelzender bzw. sublimierender materie (leitender, halbleitender und nichtleitender) und gemischen davon mit pseudofunkenelektronenstrahlen |
US5087478A (en) * | 1989-08-01 | 1992-02-11 | Hughes Aircraft Company | Deposition method and apparatus using plasma discharge |
US5855950A (en) * | 1996-12-30 | 1999-01-05 | Implant Sciences Corporation | Method for growing an alumina surface on orthopaedic implant components |
GB2321063A (en) * | 1997-01-08 | 1998-07-15 | Oxford Plasma Technology Ltd | Reactive particle beam sputtering |
US6348113B1 (en) * | 1998-11-25 | 2002-02-19 | Cabot Corporation | High purity tantalum, products containing the same, and methods of making the same |
US6413380B1 (en) | 2000-08-14 | 2002-07-02 | International Business Machines Corporation | Method and apparatus for providing deposited layer structures and articles so produced |
JP5114812B2 (ja) * | 2006-03-07 | 2013-01-09 | キャボット コーポレイション | 変形させた金属部材の製造方法 |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3472751A (en) * | 1965-06-16 | 1969-10-14 | Ion Physics Corp | Method and apparatus for forming deposits on a substrate by cathode sputtering using a focussed ion beam |
US3484358A (en) * | 1966-09-01 | 1969-12-16 | Bell Telephone Labor Inc | Method and apparatus for reactive sputtering wherein the sputtering target is contacted by an inert gas |
US3408283A (en) * | 1966-09-15 | 1968-10-29 | Kennecott Copper Corp | High current duoplasmatron having an apertured anode positioned in the low pressure region |
GB1217685A (en) * | 1967-06-05 | 1970-12-31 | Smiths Industries Ltd | Improvements in or relating to methods and apparatus for sputtering of materials |
US3409529A (en) * | 1967-07-07 | 1968-11-05 | Kennecott Copper Corp | High current duoplasmatron having an apertured anode comprising a metal of high magnetic permeability |
-
1971
- 1971-03-25 FR FR7110598A patent/FR2129996B1/fr not_active Expired
-
1972
- 1972-03-21 US US236609A patent/US3925187A/en not_active Expired - Lifetime
Non-Patent Citations (1)
Title |
---|
NEANT * |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2352393A1 (fr) * | 1976-05-19 | 1977-12-16 | Battelle Memorial Institute | Procede pour effectuer un depot dans une decharge luminescente sur au moins un substrat, et un decapage ionique de ce substrat et dispositif pour la mise en oeuvre de ce procede |
FR2422729A1 (fr) * | 1978-04-13 | 1979-11-09 | Litton Systems Inc | Procede de realisation de revetements optiques multicouches |
US5601652A (en) * | 1989-08-03 | 1997-02-11 | United Technologies Corporation | Apparatus for applying ceramic coatings |
Also Published As
Publication number | Publication date |
---|---|
USB236609I5 (xx) | 1975-01-28 |
FR2129996B1 (xx) | 1975-01-17 |
US3925187A (en) | 1975-12-09 |
Similar Documents
Legal Events
Date | Code | Title | Description |
---|---|---|---|
ST | Notification of lapse |